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Journal Articles

Role of sputtered atom and ion energy distribution in films deposited by physical vapor deposition: A molecular dynamics approach

Soumya Atmane, Alexandre Maroussiak, Amaël Caillard, Anne-Lise Thomann, Movaffaq Kateb, Jon Tomas Gudmundsson, Pascal Brault
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 060401 (2024)
https://doi.org/10.1116/6.0004134
Published: November 2024
View article titled, Role of sputtered atom and ion energy distribution in films deposited by physical vapor deposition: A molecular dynamics approach
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Journal Articles

Probing trade-off between critical size and velocity in cold-pray: An atomistic simulation

Mahyar Ghasemi, Alireza Seifi, Movaffaq Kateb, Jon Tomas Gudmundsson, Pascal Brault, Pirooz Marashi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063108 (2024)
https://doi.org/10.1116/6.0003968
Published: November 2024
View article titled, Probing trade-off between critical size and velocity in cold-pray: An atomistic simulation
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Journal Articles

Etch-stop mechanisms in plasma-enhanced atomic layer etching of silicon nitride: A molecular dynamics study

Jomar U. Tercero, Michiro Isobe, Kazuhiro Karahashi, Magdaleno R. Vasquez, Jr., Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 052603 (2024)
https://doi.org/10.1116/6.0003750
Published: August 2024
View article titled, Etch-stop mechanisms in plasma-enhanced atomic layer etching of silicon nitride: A molecular dynamics study
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Journal Articles

Amine plasma polymers deposited on porous hydroxyapatite artificial bone with bipolar pulsed discharges

Anjar Anggraini Harumningtyas, Tomoko Ito, Hidekazu Kita, Joe Kodama, Takashi Kaito, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053004 (2024)
https://doi.org/10.1116/6.0003724
Published: July 2024
View article titled, Amine plasma polymers deposited on porous hydroxyapatite artificial bone with bipolar pulsed discharges
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Journal Articles

Reactor wall effects in Si–Cl2–Ar atomic layer etching

Joseph R. Vella, Mahmoud A. I. Elgarhy, Qinzhen Hao, Vincent M. Donnelly, David B. Graves
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 042604 (2024)
https://doi.org/10.1116/6.0003651
Published: June 2024
View article titled, Reactor wall effects in Si–Cl<sub>2</sub>–Ar atomic layer etching
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Journal Articles

Mechanism study of H2-plasma assisted Si3N4 layered etch

Editor’s Pick
Ying Rui, Sumeet Pandey, Chenmeng Hsie, Lan Li
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 042603 (2024)
https://doi.org/10.1116/6.0003653
Published: June 2024
View article titled, Mechanism study of H<sub>2</sub>-plasma assisted Si<sub>3</sub>N<sub>4</sub> layered etch
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Journal Articles

Density functional theory and molecular dynamics study on the growth of graphene by chemical vapor deposition on copper substrate

Qihang Li, Jinping Luo, Zaoyang Li, Mark H. Rummeli, Lijun Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 042202 (2024)
https://doi.org/10.1116/6.0003667
Published: June 2024
View article titled, Density functional theory and molecular dynamics study on the growth of graphene by chemical vapor deposition on copper substrate
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Journal Articles

Computational study and ion diffusion analyses of native defects and indium alloying in β-Ga2O3 structures

Nathan Rabelo Martins, Luiz Augusto Ferreira de Campos Viana, Alan Antônio das Graças Santos, Daiane Damasceno Borges, Eric Welch, Pablo Damasceno Borges, Luisa Scolfaro
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032801 (2024)
https://doi.org/10.1116/6.0003435
Published: March 2024
View article titled, Computational study and ion diffusion analyses of native defects and indium alloying in <em>β</em>-Ga<sub>2</sub>O<sub>3</sub> structures
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Includes: Supplementary data
Journal Articles

An examination of the performance of molecular dynamics force fields: Silicon and silicon dioxide reactive ion etching

Editor’s Pick
Seungbo Shim, Joseph R. Vella, Jack S. Draney, Donghyeon Na, David B. Graves
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023207 (2024)
https://doi.org/10.1116/6.0003425
Published: February 2024
View article titled, An examination of the performance of molecular dynamics force fields: Silicon and silicon dioxide reactive ion etching
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Includes: Supplementary data
Journal Articles

Diffusion and magnetization of metal adatoms on single-layer molybdenum disulfide at elevated temperatures

Mohammad Zarshenas, Davide G. Sangiovanni, Kostas Sarakinos
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023409 (2024)
https://doi.org/10.1116/6.0003207
Published: January 2024
View article titled, Diffusion and magnetization of metal adatoms on single-layer molybdenum disulfide at elevated temperatures
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Journal Articles

Thermal transport of defective β-Ga2O3 and B(In)GaO3 alloys from atomistic simulations

Xiaoning Zhang, Haoyu Dong, Chao Yang, Xi Liang, Xing Li, Jia-Yue Yang, Linhua Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023101 (2024)
https://doi.org/10.1116/6.0003214
Published: January 2024
View article titled, Thermal transport of defective <em>β</em>-Ga<sub>2</sub>O<sub>3</sub> and B(In)GaO<sub>3</sub> alloys from atomistic simulations
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Includes: Supplementary data
Journal Articles

Effects of the growth parameters on the surface quality of InN films

Peng Su, Junhong Pei, Jinping Luo, Guangyu Zheng, Yukang Sun, Lijun Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 013410 (2024)
https://doi.org/10.1116/6.0003205
Published: January 2024
View article titled, Effects of the growth parameters on the surface quality of InN films
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Journal Articles

Active learning with moment tensor potentials to predict material properties: Ti0.5Al0.5N at elevated temperature

Featured
F. Bock, F. Tasnádi, I. A. Abrikosov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 013412 (2024)
https://doi.org/10.1116/6.0003260
Published: January 2024
View article titled, Active learning with moment tensor potentials to predict material properties: Ti<sub>0.5</sub>Al<sub>0.5</sub>N at elevated temperature
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Journal Articles

Enhancing laser-driven flyer velocity by optimizing of modulation period of Al/Ti reactive multilayer films

Weilong Gao, Ruizhi Zhang, Jin Wang, Zihao Huang, Zhiguo Li, Yajun Fu, Guoqiang Luo, Rong Tu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063414 (2023)
https://doi.org/10.1116/6.0003066
Published: November 2023
View article titled, Enhancing laser-driven flyer velocity by optimizing of modulation period of Al/Ti reactive multilayer films
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Journal Articles

Dynamics of plasma atomic layer etching: Molecular dynamics simulations and optical emission spectroscopy

Joseph R. Vella, Qinzhen Hao, Vincent M. Donnelly, David B. Graves
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062602 (2023)
https://doi.org/10.1116/6.0003011
Published: November 2023
View article titled, Dynamics of plasma atomic layer etching: Molecular dynamics simulations and optical emission spectroscopy
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Includes: Supplementary data
Journal Articles

Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicals

Anjar Anggraini Harumningtyas, Tomoko Ito, Michiro Isobe, Lenka Zajíčková, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063007 (2023)
https://doi.org/10.1116/6.0002978
Published: October 2023
View article titled, Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicals
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Includes: Supplementary data
Journal Articles

Near-surface damage and mixing in Si-Cl2-Ar atomic layer etching processes: Insights from molecular dynamics simulations

Editor’s Pick
Joseph R. Vella, David B. Graves
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042601 (2023)
https://doi.org/10.1116/6.0002719
Published: June 2023
View article titled, Near-surface damage and mixing in Si-Cl<sub>2</sub>-Ar atomic layer etching processes: Insights from molecular dynamics simulations
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Journal Articles

Inert-gas ion scattering at grazing incidence on smooth and rough Si and SiO2 surfaces

Charisse Marie D. Cagomoc, Michiro Isobe, Eric A. Hudson, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023003 (2023)
https://doi.org/10.1116/6.0002381
Published: February 2023
View article titled, Inert-gas ion scattering at grazing incidence on smooth and rough Si and SiO<sub>2</sub> surfaces
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Journal Articles

Molecular dynamics study of SiO2 nanohole etching by fluorocarbon ions

Charisse Marie D. Cagomoc, Michiro Isobe, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023001 (2023)
https://doi.org/10.1116/6.0002380
Published: February 2023
View article titled, Molecular dynamics study of SiO<sub>2</sub> nanohole etching by fluorocarbon ions
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Includes: Supplementary data
Journal Articles

Molecular dynamics simulation of oxide-nitride bilayer etching with energetic fluorocarbon ions

Charisse Marie D. Cagomoc, Michiro Isobe, Eric A. Hudson, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063006 (2022)
https://doi.org/10.1116/6.0002182
Published: November 2022
View article titled, Molecular dynamics simulation of oxide-nitride bilayer etching with energetic fluorocarbon ions
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