Skip to Main Content
Skip Nav Destination

Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments

J. Vac. Sci. Technol. A 35, 01B140 (2017)
This article has been cited by the following articles in journals that are participating in CrossRef Cited-by Linking.
  • Zhezhe Cong
  • Xiaoli Lu
  • Yunlong He
  • Mingshuang Cai
  • Xu Wang
  • Ye Wang
  • Xiaohua Ma
  • Yue Hao
Applied Physics Letters (2023) 123 (21)
  • Emanuela Schilirò
  • Patrick Fiorenza
  • Giuseppe Greco
  • Francesca Monforte
  • Guglielmo Guido Condorelli
  • Fabrizio Roccaforte
  • Filippo Giannazzo
  • Raffaella Lo Nigro
ACS Applied Electronic Materials 4, 406 (2022)
  • Raffaella Lo Nigro
  • Patrick Fiorenza
  • Giuseppe Greco
  • Emanuela Schilirò
  • Fabrizio Roccaforte
Materials 15, 830 (2022)
  • Jhonathan Castillo-Saenz
  • Nicola Nedev
  • Benjamín Valdez-Salas
  • Mario Curiel-Alvarez
  • María Isabel Mendivil-Palma
  • Norberto Hernandez-Como
  • Marcelo Martinez-Puente
  • David Mateos
  • Oscar Perez-Landeros
  • Eduardo Martinez-Guerra
Coatings 11, 1266 (2021)
  • Yutao Cai
  • Wen Liu
  • Miao Cui
  • Ruize Sun
  • Yung C. Liang
  • Huiqing Wen
  • Li Yang
  • Siti N. Supardan
  • Ivona Z. Mitrovic
  • Stephen Taylor
  • Paul R. Chalker
  • Cezhou Zhao
Japanese Journal of Applied Physics 59, 041001 (2020)
  • Ray-Hua Horng
  • Ming-Chun Tseng
  • Dong-Sing Wuu
Crystals 9, 1 (2018)
Close Modal

or Create an Account

Close Modal
Close Modal