Skip to Main Content
Skip Nav Destination

Low-k dielectric etch challenges at the 7 nm logic node and beyond: Continuous-wave versus quasiatomic layer plasma etching performance review

J. Vac. Sci. Technol. A 37, 011001 (2019)
This article has been cited by the following articles in journals that are participating in CrossRef Cited-by Linking.
  • Y S Lee
  • S J Kim
  • J J Lee
  • C H Cho
  • I H Seong
  • S J You
Journal of Physics D: Applied Physics 55, 365203 (2022)
  • Xinghua Sun
  • Yann Mignot
  • Christopher Cole
  • Eric Liu
  • Daniel Santos
  • Angelique Raley
  • Jennifer Church
  • Luciana Meli
  • Stuart A. Sieg
  • Peter Biolsi
Journal of Vacuum Science & Technology B (2022) 40 (2)
Close Modal

or Create an Account

Close Modal
Close Modal