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Atomic Layer Etching (ALE)

Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting and Atomic Layer Etching (ALE) Workshop, the Journal of Vacuum Science & Technology A publishes collections of articles covering the most recent developments and experimental studies in ALD and ALE. This Special Topic Collection includes papers presented at ALE 2024 which took place August 4-7, 2024 in Helsinki, Finland, as well as other ALE research articles that were not presented at the conference but are submitted to the collection. The collection features articles dedicated to the science and technology of atomic layer controlled etching.

Joseph R. Vella; Mahmoud A. I. Elgarhy; Qinzhen Hao; Vincent M. Donnelly; David B. Graves
Qinzhen Hao; Mahmoud A. I. Elgarhy; Pilbum Kim; Sang Ki Nam; Song-Yun Kang; Vincent M. Donnelly
Takayoshi Tsutsumi; Atsuki Asano; Hiroki Kondo; Kenji Ishikawa; Makoto Sekine; Masaru Hori
Xue Wang; Ryan J. Gasvoda; Eric A. Hudson; Prabhat Kumar; Sumit Agarwal
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