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Area Selective Deposition

This collection features recent discoveries in fundamentals of Area Selective Deposition (ASD) as well as advances in its technological applications. Topics covered include but are not limited to: mechanisms of thin film nucleation and growth, controllable activation and/or suppression of nucleation, selective patterning using organic layers or resists, defect formation and mitigation, combinations of deposition with selective etching, surface characterization with emphasis on defects, metrology for area-selective deposition, and all applications of ASD.

Guest Editor: Eray Aydil, New York University

Image Credit: J. Li, I. Tezsevin, M. J. M. Merkx, J. F. W. Maas, W. M. M. Kessels, T. E. Sandoval, and A. J. M. Mackus, JVST A 40, 062409 (2022).

Special Collection Image
Jake Soares; Wesley Jen; John D. Hues; Drew Lysne; Jesse Wensel; Steven M. Hues; Elton Graugnard
10.1116/6.0002811
Kinsey L. Canova; Laurent Souqui; Gregory S. Girolami; John R. Abelson
10.1116/6.0002413
Kaat Van Dongen; Rachel A. Nye; Jan-Willem J. Clerix; Claudia Sixt; Danilo De Simone; Annelies Delabie
10.1116/6.0002347
Laurenz Thyen; Daniel Splith; Max Kneiß; Marius Grundmann; Holger von Wenckstern
10.1116/6.0002275
Raphaël Feougier; Chloe Guerin; Vincent Jousseaume
10.1116/6.0002248
Yuxiao Lan; Yanwei Wen; Yicheng Li; Jiaqiang Yang; Kun Cao; Bin Shan; Rong Chen
10.1116/6.0002173
Kartik Sondhi; Rahul Sharangpani; Ramy Nashed Bassely Said; Joyeeta Nag; Michael Gribelyuk; Senaka Kanakamedala; Raghuveer S. Makala
10.1116/6.0002148
J. Li; I. Tezsevin; M. J. M. Merkx; J. F. W. Maas; W. M. M. Kessels; T. E. Sandoval; A. J. M. Mackus
10.1116/6.0002096
Jung-Sik Kim; Hwan Oh; Gregory N. Parsons
10.1116/6.0002036
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