Atomic Layer Etching (ALE)

Each year, in concert with the annual AVS International Atomic Layer Etching (ALE) Workshop, the Journal of Vacuum Science and Technology A publishes a collection of articles covering the most recent developments and experimental studies in ALE. The collection includes papers presented at the ALE 2022 workshop held on June 26-29, 2022 in Ghent, Belgium, as well as other ALE research articles that were not presented at the conference but were submitted to the collection. The collection features articles dedicated to the science and technology of atomic layer controlled etching.

Image Credit: Nobuya Miyoshi, Nicholas McDowell, and Hiroyuki Kobayashi, JVST A 40, 032601 (2022).