Skip Nav Destination

Atomic Layer Deposition (ALD)

Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting and Atomic Layer Etching (ALE) Workshop, the Journal of Vacuum Science & Technology A publishes collections of articles covering the most recent developments and experimental studies in ALD and ALE. This Special Topic Collection includes papers presented at ALD 2023 which took place July 23-26, 2023 in Bellevue, Washington, as well as other ALD research articles that were not presented at the conference but are submitted to the collections. The collection features articles dedicated to the science and technology of atomic layer controlled deposition.

Image Credit: Ha Young Lee, Jeong Hwan Han, Byung Joon Choi, JVST A 42, 022405 (2024).

Plasma Science and Technology

Remote inductively coupled plasmas in Ar/N₂ mixtures and implications for plasma enhanced ALD

David R. Boris; Michael J. Johnson; Jeffrey M. Woodward; Virginia D. Wheeler; Scott G. Walton

https://doi.org/10.1116/6.0003538

Atomic Layer Deposition (ALD)

Surface treatment of TaN for sub-2 nm, smooth, and conducting atomic layer deposition Ru films

Corbin Feit; Udit Kumar; Md. Rafiqul Islam; Luis Tomar; S. Novia Berriel; John T. Gaskins; Patrick E. Hopkins; Sudipta Seal; Parag Banerjee

https://doi.org/10.1116/6.0003440

Atomic Layer Deposition (ALD)

Comparison of three titanium-precursors for atomic-layer-deposited TiO₂ for passivating contacts on silicon

Daniel Hiller; Frans Munnik; Julian López-Vidrier; Dmytro Solonenko; Johanna Reif; Martin Knaut; Oliver Thimm; Nicholas E. Grant

https://doi.org/10.1116/6.0003309

Photovoltaics and Energy

Fine tuning of Nb-incorporated TiO₂ thin films by atomic layer deposition and application as efficient electron transport layer in perovskite solar cells

Thomas Vincent; Damien Coutancier; Pia Dally; Mirella Al Katrib; Mathieu Frégnaux; Stefania Cacovich; Frédérique Donsanti; Armelle Yaïche; Karim Medjoubi; Thomas Guillemot; Marion Provost; Jean Rousset; Muriel Bouttemy; Nathanaelle Schneider

https://doi.org/10.1116/6.0003351

Atomic Layer Deposition (ALD)

Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO₂Cl₂ as precursor

So Young Kim; Chunghee Jo; Hyerin Shin; Dongmin Yoon; Donghyuk Shin; Min-ho Cheon; Kyu-beom Lee; Dong-won Seo; Jae-wook Choi; Heungsoo Park; Dae-Hong Ko

https://doi.org/10.1116/6.0003361

Atomic Layer Deposition (ALD)

High-performance of ZnO/TiO₂ heterostructured thin-film photocatalyst fabricated via atomic layer deposition

Ji Young Park; Jeong Hwan Han; Byung Joon Choi

https://doi.org/10.1116/6.0003348

Atomic Layer Deposition (ALD)

Robust ultrablack film deposited on large-curvature magnesium alloy by atomic layer deposition

Jianfei Jin; Lin Lv; Lu Yan; Ying Li; Yunzhen Cao

https://doi.org/10.1116/6.0003305

Atomic Layer Deposition (ALD)

Inhibition of atomic layer deposition of TiO₂ by functionalizing silicon surface with 4-fluorophenylboronic acid

Dhamelyz Silva-Quinones; John R. Mason; Robert Norden; Andrew V. Teplyakov

https://doi.org/10.1116/6.0003316

Atomic Layer Deposition (ALD)

Nucleation of highly uniform AlN thin films by high volume batch ALD on 200 mm platform

Partha Mukhopadhyay; Ivan Fletcher; Zuriel Caribe Couvertier; Brent Schwab; John Gumpher; Winston V. Schoenfeld; Jon Kretzschmar; Anton deVilliers; Jim Fulford

https://doi.org/10.1116/6.0003405

Atomic Layer Deposition (ALD)

Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition

Ha Young Lee; Jeong Hwan Han; Byung Joon Choi

https://doi.org/10.1116/6.0003319

Atomic Layer Deposition (ALD)

High enhancement, low cost, large area surface enhanced Raman scattering substrates all by atomic layer deposition on porous filter paper

Feng Niu; Yimin Hu; Stephen LeKarz; Wei Lu

https://doi.org/10.1116/6.0003352

Atomic Layer Deposition (ALD)

Operando study of HfO₂ atomic layer deposition on partially hydroxylated Si(111)

Rosemary Jones; Giulio D’Acunto; Payam Shayesteh; Indiana Pinsard; François Rochet; Fabrice Bournel; Jean-Jacques Gallet; Ashley Head; Joachim Schnadt

https://doi.org/10.1116/6.0003349

Atomic Layer Deposition (ALD)

Atomic layer deposition of ZnO thin films using a liquid cyclopentadienyl-based precursor

Fumikazu Mizutani; Makoto Mizui; Nobutaka Takahashi; Mari Inoue; Toshihide Nabatame

https://doi.org/10.1116/6.0003178

Atomic Layer Deposition (ALD)

High throughput multiplexing reactor design for rapid screening of atomic/molecular layer deposition processes

Yuri Choe; Duncan Reece; David S. Bergsman

https://doi.org/10.1116/6.0003354

2-D Materials

Growth of p-doped 2D- Mo S 2 on A l 2 O 3 from spatial atomic layer deposition

André Maas; Kissan Mistry; Stephan Sleziona; Abdullah H. Alshehri; Hatameh Asgarimoghaddam; Kevin P. Musselman; Marika Schleberger

https://doi.org/10.1116/6.0003248

Atomic Layer Deposition (ALD)

Area-selective atomic layer deposition of palladium

Himamshu C. Nallan; Xin Yang; Brennan M. Coffey; Andrei Dolocan; John G. Ekerdt

https://doi.org/10.1116/6.0003261

Atomic Layer Deposition (ALD)

Sequential infiltration of two-photon polymerized 3D photonic crystals for mid-IR spectroscopic applications

Anuj Singhal; Ralu Divan; Anandvinod Dalmiya; Liliana Stan; Arian Ghiacy; Patrick T. Lynch; Igor Paprotny

https://doi.org/10.1116/6.0003271

Atomic Layer Deposition (ALD)

Conformal coating of macroscopic nanoparticle compacts with ZnO via atomic layer deposition

Benjamin L. Greenberg; Kevin P. Anderson; Alan G. Jacobs; Austin J. Cendejas; Jenifer R. Hajzus; Eric A. Patterson; James A. Wollmershauser; Boris N. Feigelson

https://doi.org/10.1116/6.0003182

Atomic Layer Deposition (ALD)