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Atomic Layer Deposition (ALD)
Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting and Atomic Layer Etching (ALE) Workshop, the Journal of Vacuum Science & Technology A publishes collections of articles covering the most recent developments and experimental studies in ALD and ALE. This Special Topic Collection will include papers presented at ALD 2023 which took place July 23-26, 2023 in Bellevue, Washington, as well as other ALD research articles that were not presented at the conference but are submitted to the collections. The collection features articles dedicated to the science and technology of atomic layer controlled deposition.
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Surfaces and Interfaces
Partha Sarathi Padhi; R. S. Ajimsha; S. K. Rai; Sushmita Bhartiya; Aniruddha Bose; Bidyadhar Das; Manoj Kumar Tiwari; Pankaj Misra
10.1116/6.0002849
Atomic Layer Deposition (ALD)
Kees van der Zouw; Bernhard Y. van der Wel; Antonius A. I. Aarnink; Rob A. M. Wolters; Dirk J. Gravesteijn; Alexey Y. Kovalgin
10.1116/6.0002804
Review Articles
Nicholas A. Strnad; Daniel M. Potrepka; Brendan M. Hanrahan; Glen R. Fox; Ronald G. Polcawich; Jeffrey S. Pulskamp; Ryan R. Knight; Ryan Q. Rudy
10.1116/6.0002431
Atomic Layer Deposition (ALD)
Marco Lisker; Mamathamba Kalishettyhalli Mahadevaiah; Keerthi Dorai Swamy Reddy
10.1116/6.0002424
Atomic Layer Deposition (ALD)
Jonas C. Gertsch; Zachary C. Sobell; Andrew S. Cavanagh; Harsono Simka; Steven M. George
10.1116/6.0002726
Atomic Layer Deposition (ALD)
Petros Abi Younes; Ashok-Kumar Yadav; Medet Zhukush; Van-Hoan Le; Hervé Roussel; Marie-Ingrid Richard; Clément Camp; Kai Szeto; Gianluca Ciatto; Nathanaelle Schneider; Elsje Alessandra Quadrelli; Hubert Renevier; Nicolas Gauthier
10.1116/6.0002448
Atomic Layer Deposition (ALD)
Sen Chen; Jiaxuan Ren; Douhao Yang; Lijun Sang; Bowen Liu; Qiang Chen; Zhongwei Liu
10.1116/6.0002484
Atomic Layer Deposition (ALD)
Renee T. M. van Limpt; Marek Lavorenti; Marcel A. Verheijen; Mihalis N. Tsampas; Mariadriana Creatore
10.1116/6.0002414