Special Topic Collection on Atomic Layer Deposition (ALD)

Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting, the Journal of Vacuum Science and Technology A, publishes a collection of articles covering the most recent developments and experimental studies in ALD. This ALD Special Topic Collection includes papers presented at the ALD 2019 Workshops held in Bellevue, Washington, July 21-24, 2019 as well as other ALD research articles that were not presented at this conference but submitted to the call for the special collection. The Collection features articles dedicated to the science and technology of atomic layer controlled deposition.

Image Credit: Margaret Wolf, Veronica Hayes, Cynthia R. Gerber, Philip G. Quardokus, Jose J. Ortiz-Garcia, Casey Plummer and Rebecca C. Quardokus, JVST A 38(2), 10.1116/1.5139672, (2020).