Skip Nav Destination
2018 Special Collection on Atomic Layer Deposition (ALD)
Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting, the Journal of Vacuum Science and Technology A, publishes a large group of papers covering the most recent developments and research in ALD. This ALD Special Topic Collection includes ALD papers published in 2018. Papers are from ALD 2017 held in Denver, CO, July 15-18, 2017 and some (those published in 2018) are from ALD 2018 held in Incheon, South Korea from July 29 – August 1, 2018. The Collection features articles dedicated to the science and technology of atomic layer controlled deposition.

Special Issue on Atomic Layer Deposition (ALD)
Eric C. Stevens; Moataz Bellah M. Mousa; Gregory N. Parsons
10.1116/1.5055212
Special Issue on Atomic Layer Deposition (ALD)
Igor Krylov; Xianbin Xu; Ekaterina Zoubenko; Kamira Weinfeld; Santiago Boyeras; Felix Palumbo; Moshe Eizenberg; Dan Ritter
10.1116/1.5057761
Special Issue on Atomic Layer Deposition (ALD)
Shinya Iwashita; Tsuyoshi Moriya; Akira Uedono
10.1116/1.5043309
Special Issue on Atomic Layer Deposition (ALD)
Mark J. Sowa; Ling Ju; Alexander C. Kozen; Nicholas C. Strandwitz; Guosong Zeng; Tomas F. Babuska; Zakaria Hsain; Brandon A. Krick
10.1116/1.5037463
Special Issue on Atomic Layer Deposition (ALD)
Violeta Prodanovic´; Hong Wah Chan; Anil U. Mane; Jeffrey W. Elam; Matthias M. Minjauw; Christophe Detavernier; Harry van der Graaf; Pasqualina M. Sarro
10.1116/1.5040813
Special Issue on Atomic Layer Deposition (ALD)
Jaron A. Kropp; Yuhang Cai; Zihan Yao; Wenjuan Zhu; Theodosia Gougousi
10.1116/1.5043621
Thin Films
Perttu Sippola; Alexander Pyymaki Perros; Oili M. E. Ylivaara; Helena Ronkainen; Jaakko Julin; Xuwen Liu; Timo Sajavaara; Jarkko Etula; Harri Lipsanen; Riikka L. Puurunen
10.1116/1.5038856
Special Issue on Atomic Layer Deposition (ALD)
Lauri Kilpi; Oili M. E. Ylivaara; Antti Vaajoki; Xuwen Liu; Ville Rontu; Sakari Sintonen; Eero Haimi; Jari Malm; Markus Bosund; Marko Tuominen; Timo Sajavaara; Harri Lipsanen; Simo-Pekka Hannula; Riikka L. Puurunen; Helena Ronkainen
10.1116/1.5003729
Special Issue on Atomic Layer Deposition (ALD)
Alexander S. Yersak; Kashish Sharma; Jasmine M. Wallas; Arrelaine A. Dameron; Xuemin Li; Yongan Yang; Katherine E. Hurst; Chunmei Ban; Robert C. Tenent; Steven M. George
10.1116/1.5006670
Special Issue on Atomic Layer Deposition (ALD)
Pascal Düngen; Mark Greiner; Karl-Heinz Böhm; Ioannis Spanos; Xing Huang; Alexander A. Auer; Robert Schlögl; Saskia Heumann
10.1116/1.5006783
Special Issue on Atomic Layer Deposition (ALD)
Nicolaie Moldovan; Ralu Divan; Hongjun Zeng; Leonidas E. Ocola; Vincent De Andrade; Michael Wojcik
10.1116/1.5003412
Special Issue on Atomic Layer Deposition (ALD)
Anil U. Mane; Steven Letourneau; David J. Mandia; Jian Liu; Joseph A. Libera; Yu Lei; Qing Peng; Elton Graugnard; Jeffrey W. Elam
10.1116/1.5003423
Special Issue on Atomic Layer Deposition (ALD)
Siliang Chang; Christos G. Takoudis
10.1116/1.5004993
Special Issue on Atomic Layer Deposition (ALD)
Martha A. Botzakaki; George Skoulatakis; Nikolaos Xanthopoulos; Violetta Gianneta; Anastasios Travlos; Stella Kennou; Spyridon Ladas; Christos Tsamis; Eleni Makarona; Stavroula N. Georga; Christoforos A. Krontiras
10.1116/1.5003375
Special Issue on Atomic Layer Deposition (ALD)
Jae-Min Park; Seongyoon Kim; June Hwang; Won Seok Han; Wonyong Koh; Won-Jun Lee
10.1116/1.5003388
Special Issue on Atomic Layer Deposition (ALD)
Jaclyn K. Sprenger; Huaxing Sun; Andrew S. Cavanagh; Steven M. George
10.1116/1.5006696
Special Issue on Atomic Layer Deposition (ALD)
Daniel J. Higgs; Jaime W. DuMont; Kashish Sharma; Steven M. George
10.1116/1.5004041
Special Issue on Atomic Layer Deposition (ALD)
Evan Oudot; Mickael Gros-Jean; Kristell Courouble; Francois Bertin; Romain Duru; Névine Rochat; Christophe Vallée
10.1116/1.4999561
Special Issue on Atomic Layer Deposition (ALD)
Lukas Hoffmann; Detlef Theirich; Daniel Schlamm; Tim Hasselmann; Sven Pack; Kai Oliver Brinkmann; Detlef Rogalla; Sven Peters; André Räupke; Hassan Gargouri; Thomas Riedl
10.1116/1.5006781
Special Issue on Atomic Layer Deposition (ALD)
Jakob Kuhs; Zeger Hens; Christophe Detavernier
10.1116/1.5003339