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Journal Articles

Robustness of semimetallic transport properties of TaAs against off-stoichiometric disorder

A. Kawasuso, M. Suda, H. Murakawa, M. Komada, C. Suzuki, H. Amada, K. Michishio, M. Maekawa, A. Miyashita, N. Seko, S. Yamamoto, N. Oshima, S. Seki, N. Hanasaki
Journal: Journal of Applied Physics
J. Appl. Phys. 133, 223903 (2023)
https://doi.org/10.1063/5.0147663
Published: June 2023
View article titled, Robustness of semimetallic transport properties of TaAs against off-stoichiometric disorder
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Journal Articles

E–H transitions in Ar/O2 and Ar/Cl2 inductively coupled plasmas: Antenna geometry and operating conditions

Tugba Piskin, Yuchen Qian, Patrick Pribyl, Walter Gekelman, Mark J. Kushner
Journal: Journal of Applied Physics
J. Appl. Phys. 133, 173302 (2023)
https://doi.org/10.1063/5.0146168
Published: May 2023
View article titled, E–H transitions in Ar/O<sub>2</sub> and Ar/Cl<sub>2</sub> inductively coupled plasmas: Antenna geometry and operating conditions
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Journal Articles

Cryogenic etching of silicon compounds using a CHF3 based plasma

R. Dussart, R. Ettouri, J. Nos, G. Antoun, T. Tillocher, P. Lefaucheux
Journal: Journal of Applied Physics
J. Appl. Phys. 133, 113306 (2023)
https://doi.org/10.1063/5.0142056
Published: March 2023
View article titled, Cryogenic etching of silicon compounds using a CHF<sub>3</sub> based plasma
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Journal Articles

Optimization of overshoot in the pulsed radio frequency inductively coupled argon plasma by step waveform modulation

Xiang-Yun Lv, Quan-Zhi Zhang, Ke Jiang, Fei Gao, You-Nian Wang
Journal: Journal of Applied Physics
J. Appl. Phys. 133, 043301 (2023)
https://doi.org/10.1063/5.0130054
Published: January 2023
View article titled, Optimization of overshoot in the pulsed radio frequency inductively coupled argon plasma by step waveform modulation
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Journal Articles

Response to “Comment on ‘The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor’” [J. Appl. Phys. 132, 156101 (2022)]

M. A. Sobolewski, J.-H. Kim
Journal: Journal of Applied Physics
J. Appl. Phys. 132, 156102 (2022)
https://doi.org/10.1063/5.0109603
Published: October 2022
View article titled, Response to “Comment on ‘The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor’” [J. Appl. Phys. 132, 156101 (2022)]
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Journal Articles

Comment on “The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor” [J. Appl. hys. 102, 113302 (2007)]

M. Q. Du, Z. F. Ding
Journal: Journal of Applied Physics
J. Appl. Phys. 132, 156101 (2022)
https://doi.org/10.1063/5.0101636
Published: October 2022
View article titled, Comment on “The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor” [J. Appl. hys. 102, 113302 (2007)]
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Journal Articles

Pulsed power to control growth of silicon nanoparticles in low temperature flowing plasmas

Steven J. Lanham, Jordyn Polito, Zichang Xiong, Uwe R. Kortshagen, Mark J. Kushner
Journal: Journal of Applied Physics
J. Appl. Phys. 132, 073301 (2022)
https://doi.org/10.1063/5.0100380
Published: August 2022
View article titled, Pulsed power to control growth of silicon nanoparticles in low temperature flowing plasmas
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Journal Articles

Measurement of neutral gas temperature in inductively coupled Ar and Ar/O2 plasmas

Peng-Cheng Du, Fang-Jie Zhou, Kai Zhao, Yong-Xin Liu, Fei Gao, You-Nian Wang
Journal: Journal of Applied Physics
J. Appl. Phys. 132, 043302 (2022)
https://doi.org/10.1063/5.0079966
Published: July 2022
View article titled, Measurement of neutral gas temperature in inductively coupled Ar and Ar/O<sub>2</sub> plasmas
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Journal Articles

External charge compensation in etched gallium nitride measured by x-ray photoelectron spectroscopy

Kevin A. Hatch, Daniel C. Messina, Houqiang Fu, Kai Fu, Yuji Zhao, Robert J. Nemanich
Journal: Journal of Applied Physics
J. Appl. Phys. 131, 185301 (2022)
https://doi.org/10.1063/5.0085529
Published: May 2022
View article titled, External charge compensation in etched gallium nitride measured by x-ray photoelectron spectroscopy
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Journal Articles

Measurement of plasma flow and electron energy probability function in radio frequency plasma thruster with a magnetic cusp

T. Furukawa, Y. Yarita, H. Aoyagi, H. Nishida
Journal: Journal of Applied Physics
J. Appl. Phys. 131, 173302 (2022)
https://doi.org/10.1063/5.0071606
Published: May 2022
View article titled, Measurement of plasma flow and electron energy probability function in radio frequency plasma thruster with a magnetic cusp
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Journal Articles

Power transfer efficiency and the power threshold for E–H mode transition in inductively coupled plasmas

Peng-Cheng Du, Ming-Liang Zhao, Hong Li, Fei Gao, You-Nian Wang
Journal: Journal of Applied Physics
J. Appl. Phys. 131, 133301 (2022)
https://doi.org/10.1063/5.0077769
Published: April 2022
View article titled, Power transfer efficiency and the power threshold for E–H mode transition in inductively coupled plasmas
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Journal Articles

Modulating power delivery in a pulsed ICP discharge via the incorporation of negative feedback mechanisms

Carl L. Smith, Sang Ki Nam, Kiho Bae, Jang-Yeob Lee, Steven Shannon
Journal: Journal of Applied Physics
J. Appl. Phys. 130, 163304 (2021)
https://doi.org/10.1063/5.0060240
Published: October 2021
View article titled, Modulating power delivery in a pulsed ICP discharge via the incorporation of negative feedback mechanisms
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Journal Articles

Scaling of silicon nanoparticle growth in low temperature flowing plasmas

Steven J. Lanham, Jordyn Polito, Xuetao Shi, Paolo Elvati, Angela Violi, Mark J. Kushner
Journal: Journal of Applied Physics
J. Appl. Phys. 130, 163302 (2021)
https://doi.org/10.1063/5.0062255
Published: October 2021
View article titled, Scaling of silicon nanoparticle growth in low temperature flowing plasmas
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Journal Articles

Secondary electron emission due to multi-species iodine ion bombardment of different target materials

L. Habl, D. Rafalskyi, T. Lafleur
Journal: Journal of Applied Physics
J. Appl. Phys. 129, 153302 (2021)
https://doi.org/10.1063/5.0048447
Published: April 2021
View article titled, Secondary electron emission due to multi-species iodine ion bombardment of different target materials
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Journal Articles

Control of the spatial distribution of ion flux in dual inductively coupled plasmas

Sung-Won Cho, Jun-Hyeon Moon, Aixian Zhang, Chin-Wook Chung
Journal: Journal of Applied Physics
J. Appl. Phys. 129, 103305 (2021)
https://doi.org/10.1063/5.0026248
Published: March 2021
View article titled, Control of the spatial distribution of ion flux in dual inductively coupled plasmas
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Journal Articles

Enhancing CO2 plasma conversion using metal grid catalysts

E. J. Devid, M. Ronda-Lloret, D. Zhang, E. Schuler, D. Wang, C.-H. Liang, Q. Huang, G. Rothenberg, N. R. Shiju, A. W. Kleyn
Journal: Journal of Applied Physics
J. Appl. Phys. 129, 053306 (2021)
https://doi.org/10.1063/5.0033212
Published: February 2021
View article titled, Enhancing CO<sub>2</sub> plasma conversion using metal grid catalysts
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Includes: Supplementary data
Journal Articles

RF discharge diagnostics: Some problems and their resolution

Valery Godyak
Journal: Journal of Applied Physics
J. Appl. Phys. 129, 041101 (2021)
https://doi.org/10.1063/5.0024258
Published: January 2021
View article titled, RF discharge diagnostics: Some problems and their resolution
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Journal Articles

Numerical study of plasma-fluid characteristics and thrust performance of a low-power argon inductively coupled plasma electrothermal thruster

T. Fujino, M. Yamauchi
Journal: Journal of Applied Physics
J. Appl. Phys. 128, 173302 (2020)
https://doi.org/10.1063/5.0022018
Published: November 2020
View article titled, Numerical study of plasma-fluid characteristics and thrust performance of a low-power argon inductively coupled plasma electrothermal thruster
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Journal Articles

Optimization of discharge antenna turn and modulation of EEPFs and plasma parameters in dual-frequency cylindrical ICP source at different gas pressures

Yue Hua, Zeyu Hao, Chunsheng Ren, Jian Song
Journal: Journal of Applied Physics
J. Appl. Phys. 128, 013301 (2020)
https://doi.org/10.1063/5.0006646
Published: July 2020
View article titled, Optimization of discharge antenna turn and modulation of EEPFs and plasma parameters in dual-frequency cylindrical ICP source at different gas pressures
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Journal Articles

Plasmonic nitridation of SiO2/Si(100) surface covered with gold nanoparticles via nitrogen plasma-produced radicals and light

Takeshi Kitajima, Machiko Miyake, Kohei Honda, Toshiki Nakano
Journal: Journal of Applied Physics
J. Appl. Phys. 127, 243302 (2020)
https://doi.org/10.1063/5.0006841
Published: June 2020
View article titled, Plasmonic nitridation of SiO<sub>2</sub>/Si(100) surface covered with gold nanoparticles via nitrogen plasma-produced radicals and light
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