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Journal Articles
Modeling the charging effect of the hardmask and silicon substrate during plasma etching in advanced nodes
Open Access
Journal:
Journal of Applied Physics
J. Appl. Phys. 137, 063302 (2025)
Published: February 2025
Journal Articles
Journal Articles
Photonic crystal enhanced light emitting diodes fabricated by single pulse laser interference lithography
Open Access
Journal:
Journal of Applied Physics
J. Appl. Phys. 136, 123104 (2024)
Published: September 2024
Journal Articles
Journal Articles
Influence of Xe+ and Ga+ milling species on the cathodoluminescence of wurtzite and zincblende GaN
Open Access
Journal:
Journal of Applied Physics
J. Appl. Phys. 136, 045702 (2024)
Published: July 2024
Journal Articles
Journal Articles
Robustness of semimetallic transport properties of TaAs against off-stoichiometric disorder
Available to PurchaseA. Kawasuso, M. Suda, H. Murakawa, M. Komada, C. Suzuki, H. Amada, K. Michishio, M. Maekawa, A. Miyashita, N. Seko, S. Yamamoto, N. Oshima, S. Seki, N. Hanasaki
Journal:
Journal of Applied Physics
J. Appl. Phys. 133, 223903 (2023)
Published: June 2023
Journal Articles
E–H transitions in Ar/O2 and Ar/Cl2 inductively coupled plasmas: Antenna geometry and operating conditions
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 133, 173302 (2023)
Published: May 2023
Journal Articles
Cryogenic etching of silicon compounds using a CHF3 based plasma
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 133, 113306 (2023)
Published: March 2023
Journal Articles
Optimization of overshoot in the pulsed radio frequency inductively coupled argon plasma by step waveform modulation
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 133, 043301 (2023)
Published: January 2023
Journal Articles
Journal Articles
Journal Articles
Pulsed power to control growth of silicon nanoparticles in low temperature flowing plasmas
Journal:
Journal of Applied Physics
J. Appl. Phys. 132, 073301 (2022)
Published: August 2022
Journal Articles
Measurement of neutral gas temperature in inductively coupled Ar and Ar/O2 plasmas
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 132, 043302 (2022)
Published: July 2022
Journal Articles
External charge compensation in etched gallium nitride measured by x-ray photoelectron spectroscopy
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 131, 185301 (2022)
Published: May 2022
Journal Articles
Measurement of plasma flow and electron energy probability function in radio frequency plasma thruster with a magnetic cusp
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Journal:
Journal of Applied Physics
J. Appl. Phys. 131, 173302 (2022)
Published: May 2022
Journal Articles
Power transfer efficiency and the power threshold for E–H mode transition in inductively coupled plasmas
Journal:
Journal of Applied Physics
J. Appl. Phys. 131, 133301 (2022)
Published: April 2022
Journal Articles
Modulating power delivery in a pulsed ICP discharge via the incorporation of negative feedback mechanisms
Available to Purchase
Journal:
Journal of Applied Physics
J. Appl. Phys. 130, 163304 (2021)
Published: October 2021
Journal Articles
Journal Articles
Secondary electron emission due to multi-species iodine ion bombardment of different target materials
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Journal:
Journal of Applied Physics
J. Appl. Phys. 129, 153302 (2021)
Published: April 2021
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