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Journal Articles

Modeling the charging effect of the hardmask and silicon substrate during plasma etching in advanced nodes

Open Access
Yuxuan Zhai, Rui Ge, Ziyi Hu, Junjie Li, Hua Shao, Jiawei Cheng, Lado Filipovic, Rui Chen
Journal: Journal of Applied Physics
J. Appl. Phys. 137, 063302 (2025)
https://doi.org/10.1063/5.0243470
Published: February 2025
View articletitled, Modeling the charging effect of the hardmask and silicon substrate during plasma etching in advanced nodes
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Journal Articles

Investigating the effect of termination capacitor on E–H mode transition in radio frequency inductively coupled plasma

Open Access
Xin-Jie Wang, Xiang-Yun Lyu, Li-Yue Gong, Fei Gao, You-Nian Wang
Journal: Journal of Applied Physics
J. Appl. Phys. 137, 053301 (2025)
https://doi.org/10.1063/5.0233687
Published: February 2025
View articletitled, Investigating the effect of termination capacitor on E–H mode transition in radio frequency inductively coupled plasma
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Journal Articles

Photonic crystal enhanced light emitting diodes fabricated by single pulse laser interference lithography

Open Access
Zhiheng Lin, Yaoxun Wang, Yun-Ran Wang, Im Sik Han, Mark Hopkinson
Journal: Journal of Applied Physics
J. Appl. Phys. 136, 123104 (2024)
https://doi.org/10.1063/5.0215529
Published: September 2024
View articletitled, Photonic crystal enhanced light emitting diodes fabricated by single pulse laser interference lithography
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Journal Articles

Numerical investigation of plasma properties in Ar/SiH4 inductively coupled plasmas considering electron energy distribution functions

Open Access
Ji-Hoon Kim, Min-Young Yoon, Gwan Kim, Deuk-Chul Kwon, Hyo-Chang Lee, Jung-Hyung Kim, Hee-Hwan Choe
Journal: Journal of Applied Physics
J. Appl. Phys. 136, 093303 (2024)
https://doi.org/10.1063/5.0223700
Published: September 2024
View articletitled, Numerical investigation of plasma properties in Ar/SiH4 inductively coupled plasmas considering electron energy distribution functions
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Journal Articles

Influence of Xe+ and Ga+ milling species on the cathodoluminescence of wurtzite and zincblende GaN

Open Access
K. Loeto, S. M. Fairclough, I. Griffiths, G. Kusch, S. Ghosh, M. J. Kappers, N. Young, R. A. Oliver
Journal: Journal of Applied Physics
J. Appl. Phys. 136, 045702 (2024)
https://doi.org/10.1063/5.0211529
Published: July 2024
View articletitled, Influence of Xe+ and Ga+ milling species on the cathodoluminescence of wurtzite and zincblende GaN
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Journal Articles

Plasma assisted remediation of SiC surfaces

Editor’s PickOpen Access
M. A. Mathews, Jr., A. R. Graves, D. R. Boris, S. G. Walton, C. D. Stinespring
Journal: Journal of Applied Physics
J. Appl. Phys. 135, 153301 (2024)
https://doi.org/10.1063/5.0203539
Published: April 2024
View articletitled, Plasma assisted remediation of SiC surfaces
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Journal Articles

Robustness of semimetallic transport properties of TaAs against off-stoichiometric disorder

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A. Kawasuso, M. Suda, H. Murakawa, M. Komada, C. Suzuki, H. Amada, K. Michishio, M. Maekawa, A. Miyashita, N. Seko, S. Yamamoto, N. Oshima, S. Seki, N. Hanasaki
Journal: Journal of Applied Physics
J. Appl. Phys. 133, 223903 (2023)
https://doi.org/10.1063/5.0147663
Published: June 2023
View articletitled, Robustness of semimetallic transport properties of TaAs against off-stoichiometric disorder
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Journal Articles

E–H transitions in Ar/O2 and Ar/Cl2 inductively coupled plasmas: Antenna geometry and operating conditions

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Tugba Piskin, Yuchen Qian, Patrick Pribyl, Walter Gekelman, Mark J. Kushner
Journal: Journal of Applied Physics
J. Appl. Phys. 133, 173302 (2023)
https://doi.org/10.1063/5.0146168
Published: May 2023
View articletitled, E–H transitions in Ar/O2 and Ar/Cl2 inductively coupled plasmas: Antenna geometry and operating conditions
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Journal Articles

Cryogenic etching of silicon compounds using a CHF3 based plasma

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R. Dussart, R. Ettouri, J. Nos, G. Antoun, T. Tillocher, P. Lefaucheux
Journal: Journal of Applied Physics
J. Appl. Phys. 133, 113306 (2023)
https://doi.org/10.1063/5.0142056
Published: March 2023
View articletitled, Cryogenic etching of silicon compounds using a CHF3 based plasma
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Journal Articles

Optimization of overshoot in the pulsed radio frequency inductively coupled argon plasma by step waveform modulation

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Xiang-Yun Lv, Quan-Zhi Zhang, Ke Jiang, Fei Gao, You-Nian Wang
Journal: Journal of Applied Physics
J. Appl. Phys. 133, 043301 (2023)
https://doi.org/10.1063/5.0130054
Published: January 2023
View articletitled, Optimization of overshoot in the pulsed radio frequency inductively coupled argon plasma by step waveform modulation
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Journal Articles

Response to “Comment on ‘The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor’” [J. Appl. Phys. 132, 156101 (2022)]

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M. A. Sobolewski, J.-H. Kim
Journal: Journal of Applied Physics
J. Appl. Phys. 132, 156102 (2022)
https://doi.org/10.1063/5.0109603
Published: October 2022
View articletitled, Response to “Comment on ‘The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor’” [J. Appl. Phys. 132, 156101 (2022)]
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Journal Articles

Comment on “The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor” [J. Appl. hys. 102, 113302 (2007)]

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M. Q. Du, Z. F. Ding
Journal: Journal of Applied Physics
J. Appl. Phys. 132, 156101 (2022)
https://doi.org/10.1063/5.0101636
Published: October 2022
View articletitled, Comment on “The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor” [J. Appl. hys. 102, 113302 (2007)]
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Journal Articles

Pulsed power to control growth of silicon nanoparticles in low temperature flowing plasmas

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Steven J. Lanham, Jordyn Polito, Zichang Xiong, Uwe R. Kortshagen, Mark J. Kushner
Journal: Journal of Applied Physics
J. Appl. Phys. 132, 073301 (2022)
https://doi.org/10.1063/5.0100380
Published: August 2022
View articletitled, Pulsed power to control growth of silicon nanoparticles in low temperature flowing plasmas
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Journal Articles

Measurement of neutral gas temperature in inductively coupled Ar and Ar/O2 plasmas

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Peng-Cheng Du, Fang-Jie Zhou, Kai Zhao, Yong-Xin Liu, Fei Gao, You-Nian Wang
Journal: Journal of Applied Physics
J. Appl. Phys. 132, 043302 (2022)
https://doi.org/10.1063/5.0079966
Published: July 2022
View articletitled, Measurement of neutral gas temperature in inductively coupled Ar and Ar/O2 plasmas
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Journal Articles

External charge compensation in etched gallium nitride measured by x-ray photoelectron spectroscopy

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Kevin A. Hatch, Daniel C. Messina, Houqiang Fu, Kai Fu, Yuji Zhao, Robert J. Nemanich
Journal: Journal of Applied Physics
J. Appl. Phys. 131, 185301 (2022)
https://doi.org/10.1063/5.0085529
Published: May 2022
View articletitled, External charge compensation in etched gallium nitride measured by x-ray photoelectron spectroscopy
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Journal Articles

Measurement of plasma flow and electron energy probability function in radio frequency plasma thruster with a magnetic cusp

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T. Furukawa, Y. Yarita, H. Aoyagi, H. Nishida
Journal: Journal of Applied Physics
J. Appl. Phys. 131, 173302 (2022)
https://doi.org/10.1063/5.0071606
Published: May 2022
View articletitled, Measurement of plasma flow and electron energy probability function in radio frequency plasma thruster with a magnetic cusp
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Journal Articles

Power transfer efficiency and the power threshold for E–H mode transition in inductively coupled plasmas

Editor’s PickAvailable to Purchase
Peng-Cheng Du, Ming-Liang Zhao, Hong Li, Fei Gao, You-Nian Wang
Journal: Journal of Applied Physics
J. Appl. Phys. 131, 133301 (2022)
https://doi.org/10.1063/5.0077769
Published: April 2022
View articletitled, Power transfer efficiency and the power threshold for E–H mode transition in inductively coupled plasmas
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Journal Articles

Modulating power delivery in a pulsed ICP discharge via the incorporation of negative feedback mechanisms

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Carl L. Smith, Sang Ki Nam, Kiho Bae, Jang-Yeob Lee, Steven Shannon
Journal: Journal of Applied Physics
J. Appl. Phys. 130, 163304 (2021)
https://doi.org/10.1063/5.0060240
Published: October 2021
View articletitled, Modulating power delivery in a pulsed ICP discharge via the incorporation of negative feedback mechanisms
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Journal Articles

Scaling of silicon nanoparticle growth in low temperature flowing plasmas

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Steven J. Lanham, Jordyn Polito, Xuetao Shi, Paolo Elvati, Angela Violi, Mark J. Kushner
Journal: Journal of Applied Physics
J. Appl. Phys. 130, 163302 (2021)
https://doi.org/10.1063/5.0062255
Published: October 2021
View articletitled, Scaling of silicon nanoparticle growth in low temperature flowing plasmas
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Journal Articles

Secondary electron emission due to multi-species iodine ion bombardment of different target materials

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L. Habl, D. Rafalskyi, T. Lafleur
Journal: Journal of Applied Physics
J. Appl. Phys. 129, 153302 (2021)
https://doi.org/10.1063/5.0048447
Published: April 2021
View articletitled, Secondary electron emission due to multi-species iodine ion bombardment of different target materials
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