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Journal Articles

Improvement of memory storage capacity and prolongation of endurance/retention through H2 plasma treatment of IGZO/HZO structure

Cheng-Rui Liu, Yu-Tzu Tsai, Yu-Ting Chen, Zheng-Kai Chen, Zi-Rong Huang, Sheng-Min Wang, Chia-Shuo Pai, Ying-Tsan Tang
Journal: Journal of Applied Physics
J. Appl. Phys. 136, 084102 (2024)
https://doi.org/10.1063/5.0214983
Published: August 2024
View article titled, Improvement of memory storage capacity and prolongation of endurance/retention through H<sub>2</sub> plasma treatment of IGZO/HZO structure
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Journal Articles

The effect of activated water on lentil seed germination utilizing several plasma reactors and a hydrogen injection system

S. Mansory, M. Bahreini
Journal: Journal of Applied Physics
J. Appl. Phys. 136, 043302 (2024)
https://doi.org/10.1063/5.0211139
Published: July 2024
View article titled, The effect of activated water on lentil seed germination utilizing several plasma reactors and a hydrogen injection system
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Journal Articles

Striations in a radio frequency hydrogen discharge tube: Optical emission plasma diagnostics and Raman analysis of in situ graphite probes

Szetsen Lee, Jr-Wei Peng
Journal: Journal of Applied Physics
J. Appl. Phys. 135, 223306 (2024)
https://doi.org/10.1063/5.0203255
Published: June 2024
View article titled, Striations in a radio frequency hydrogen discharge tube: Optical emission plasma diagnostics and Raman analysis of <em>in situ</em> graphite probes
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Journal Articles

Diamond-like carbon conversion surfaces for space applications

Justyna M. Sokół, Jianliang Lin, Stephen A. Fuselier, Travis Eliason, John E. Gomez, Benjamin Rodriguez, John N Pham, Clark Schiferl, Christopher Rincon, Cedric Bernier, Caden Andersson, Felicia Mendoza, Jonathan Gasser, Peter Wurz, André Galli, Eric Hertzberg, Nathan A. Schwadron
Journal: Journal of Applied Physics
J. Appl. Phys. 135, 185301 (2024)
https://doi.org/10.1063/5.0203686
Published: May 2024
View article titled, Diamond-like carbon conversion surfaces for space applications
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Journal Articles

Impact of the recessed gate depth on the GaN metal-oxide-semiconductor high electron mobility transistor performances: New insights on mobility extraction

C. Piotrowicz, B. Mohamad, N. Malbert, S. Bécu, S. Ruel, C. Le Royer
Journal: Journal of Applied Physics
J. Appl. Phys. 135, 175701 (2024)
https://doi.org/10.1063/5.0205840
Published: May 2024
View article titled, Impact of the recessed gate depth on the GaN metal-oxide-semiconductor high electron mobility transistor performances: New insights on mobility extraction
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Journal Articles

Effects of UV/O3 and O2 plasma surface treatments on the band-bending of ultrathin ALD-Al2O3 coated Ga-polar GaN

Jiarui Gong, Xin Su, Shuoyang Qiu, Jie Zhou, Yang Liu, Yiran Li, Donghyeok Kim, Tsung-Han Tsai, Tien Khee Ng, Boon S. Ooi, Zhenqiang Ma
Journal: Journal of Applied Physics
J. Appl. Phys. 135, 115303 (2024)
https://doi.org/10.1063/5.0188768
Published: March 2024
View article titled, Effects of UV/O<sub>3</sub> and O<sub>2</sub> plasma surface treatments on the band-bending of ultrathin ALD-Al<sub>2</sub>O<sub>3</sub> coated Ga-polar GaN
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Journal Articles

Optical emission spectroscopy of vanadium cathodic arc plasma at different nitrogen pressure

Yu. V. Kovtun, A. S. Kuprin, A. N. Shapoval, S. A. Leonov, R. L. Vasilenko, Yu. A. Besedina
Journal: Journal of Applied Physics
J. Appl. Phys. 134, 243301 (2023)
https://doi.org/10.1063/5.0177931
Published: December 2023
View article titled, Optical emission spectroscopy of vanadium cathodic arc plasma at different nitrogen pressure
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Journal Articles

Air stable plasma passivation of GaAs at room temperature

Christoffer Kauppinen
Journal: Journal of Applied Physics
J. Appl. Phys. 134, 235705 (2023)
https://doi.org/10.1063/5.0165867
Published: December 2023
View article titled, Air stable plasma passivation of GaAs at room temperature
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Journal Articles

Prediction by a hybrid machine learning model for high-mobility amorphous In2O3: Sn films fabricated by RF plasma sputtering deposition using a nitrogen-mediated amorphization method

Kunihiro Kamataki, Hirohi Ohtomo, Naho Itagaki, Chawarambawa Fadzai Lesly, Daisuke Yamashita, Takamasa Okumura, Naoto Yamashita, Kazunori Koga, Masaharu Shiratani
Journal: Journal of Applied Physics
J. Appl. Phys. 134, 163301 (2023)
https://doi.org/10.1063/5.0160228
Published: October 2023
View article titled, Prediction by a hybrid machine learning model for high-mobility amorphous In<sub>2</sub>O<sub>3</sub>: Sn films fabricated by RF plasma sputtering deposition using a nitrogen-mediated amorphization method
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Journal Articles

Isotropic atomic layer etching of GaN using SF6 plasma and Al(CH3)3

Nicholas J. Chittock, Yi Shu, Simon D. Elliott, Harm C. M. Knoops, W. M. M. (Erwin). Kessels, Adriaan J. M. Mackus
Journal: Journal of Applied Physics
J. Appl. Phys. 134, 075302 (2023)
https://doi.org/10.1063/5.0158129
Published: August 2023
View article titled, Isotropic atomic layer etching of GaN using SF<sub>6</sub> plasma and Al(CH<sub>3</sub>)<sub>3</sub>
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Includes: Supplementary data
Journal Articles

Surface defect compensation of Ga2O3 thin films N-doped by nitrogen plasma for enhanced electrical performance and luminescence effect

Xueqiang Ji, Xiaohui Qi, Jianying Yue, JinJin Wang, Zuyong Yan, Shan Li, Zeng Liu, Weihua Tang, Peigang Li
Journal: Journal of Applied Physics
J. Appl. Phys. 134, 013301 (2023)
https://doi.org/10.1063/5.0150390
Published: July 2023
View article titled, Surface defect compensation of Ga<sub>2</sub>O<sub>3</sub> thin films N-doped by nitrogen plasma for enhanced electrical performance and luminescence effect
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Includes: Supplementary data
Journal Articles

Remote plasma-enhanced chemical vapor deposition of GeSn on Si: Material and defect characterization

S. Q. Lim, L. Q. Huston, L. A. Smillie, G. J. Grzybowski, X. Huang, J. S. Williams, B. B. Claflin
Journal: Journal of Applied Physics
J. Appl. Phys. 133, 235302 (2023)
https://doi.org/10.1063/5.0149483
Published: June 2023
View article titled, Remote plasma-enhanced chemical vapor deposition of GeSn on Si: Material and defect characterization
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Journal Articles

Modeling of discharge characteristics and plasma chemistry in atmospheric CO2 pulsed plasmas employing deep neural network

Xu-Cheng Wang, Yuan-Tao Zhang
Journal: Journal of Applied Physics
J. Appl. Phys. 133, 143301 (2023)
https://doi.org/10.1063/5.0143741
Published: April 2023
View article titled, Modeling of discharge characteristics and plasma chemistry in atmospheric CO<sub>2</sub> pulsed plasmas employing deep neural network
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Journal Articles

Cryogenic etching of silicon compounds using a CHF3 based plasma

R. Dussart, R. Ettouri, J. Nos, G. Antoun, T. Tillocher, P. Lefaucheux
Journal: Journal of Applied Physics
J. Appl. Phys. 133, 113306 (2023)
https://doi.org/10.1063/5.0142056
Published: March 2023
View article titled, Cryogenic etching of silicon compounds using a CHF<sub>3</sub> based plasma
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Journal Articles

Understanding the influence of fluid flow regime on plasma morphology and dose delivery at the plasma–liquid interface

R. Z. Walker, J. E. Foster
Journal: Journal of Applied Physics
J. Appl. Phys. 133, 093301 (2023)
https://doi.org/10.1063/5.0141059
Published: March 2023