Direct tunneling stress-induced leakage current in ultrathin HfO2∕SiO2 gate dielectric stacks

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Direct tunneling stress-induced leakage current in ultrathin $Hf O_{2} ∕ Si O_{2}$ gate dielectric stacks

J. Appl. Phys. 100, 094507 (2006)

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Direct tunneling stress-induced leakage current in ultrathin $Hf O_{2} ∕ Si O_{2}$ gate dielectric stacks

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Direct tunneling stress-induced leakage current in ultrathin $Hf O_{2} ∕ Si O_{2}$ gate dielectric stacks