Functionalizing and patterning of the silicon surface can be realized simultaneously by the chemomechanical method. The oxide-coated crystalline silicon (100) surface is scratched with a diamond tool in the presence of aryldiazonium salt (C6H5N2BF4). Scratching activates the silicon surface by removing the passivation oxide layer to expose fresh Si atoms. The surface morphologies before and after chemomechanical reaction are characterized with atomic force microscopy. Time-of-flight secondary ion mass spectroscopy confirms the presence of C6H5 and provides evidence for the formation of self-assembled monolayer (SAM) on silicon surface via Si—C covalent bonds by scratching the silicon in the presence of C6H5N2BF4.C6H5 groups further bond with surface Si atoms via Si—C covalent bonds as confirmed from infrared spectroscopy results. We propose that chemomechanical reaction, which occurred during scratching the silicon surface, produce C6H5 groups from aryldiazonium salt. The relevant adhesion of SAM is measured. It is found that SAM can reduce the adhesion of silicon. The monolayer can be used as anti-adhesion monolayer for micro/nanoelectromechanical systems components under different environments and operating conditions.
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December 2011
Research Article|
December 01 2011
Preparation of Aryldiazonium Salt Monolayers on Si(100) Surface by Chemomechanical Method
Li-qiu Shi;
Li-qiu Shi
1College of Mechanical Engineering, Jiamusi University, Jiamusi 154007
China
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Lin Zhang;
Lin Zhang
1College of Mechanical Engineering, Jiamusi University, Jiamusi 154007
China
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Feng Yu;
Feng Yu
1College of Mechanical Engineering, Jiamusi University, Jiamusi 154007
China
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Yong-da Yan;
Yong-da Yan
2Center for Precision Engineering, Harbin Institute of Technology, Harbin 150001
China
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Tao Sun;
Tao Sun
2Center for Precision Engineering, Harbin Institute of Technology, Harbin 150001
China
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Shen Dong
Shen Dong
2Center for Precision Engineering, Harbin Institute of Technology, Harbin 150001
China
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Chin. J. Chem. Phys. 24, 741–744 (2011)
Article history
Received:
May 30 2011
Accepted:
August 01 2011
Citation
Li-qiu Shi, Lin Zhang, Feng Yu, Yong-da Yan, Tao Sun, Shen Dong; Preparation of Aryldiazonium Salt Monolayers on Si(100) Surface by Chemomechanical Method. Chin. J. Chem. Phys. 1 December 2011; 24 (6): 741–744. https://doi.org/10.1088/1674-0068/24/06/741-744
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