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Atomic Layer Etching (ALE)

Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting and Atomic Layer Etching (ALE) Workshop, the Journal of Vacuum Science & Technology A publishes collections of articles covering the most recent developments and experimental studies in ALD and ALE. This Special Topic Collection includes papers presented at ALE 2024 which took place August 4-7, 2024 in Helsinki, Finland, as well as other ALE research articles that were not presented at the conference but are submitted to the collection. The collection features articles dedicated to the science and technology of atomic layer controlled etching.

Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions

Andreas Kounis-Melas; Joseph R. Vella; Athanassios Z. Panagiotopoulos; David B. Graves

https://doi.org/10.1116/6.0004027

Atomic Layer Etching (ALE)

Investigating the effects of etching systems and low-temperature thermal processing on hafnium zirconium oxide thin film properties

Wen-Hsi Lee; Edward Kuo; Chia-Nung Hung; Tai-Chen Kuo

https://doi.org/10.1116/6.0004040

Atomic Layer Etching (ALE)

Comparisons of atomic layer etching of silicon in Cl₂ and HBr-containing plasmas

Mahmoud A. I. Elgarhy; Qinzhen Hao; Heejung Kim; Sang Ki Nam; Song-Yun Kang; Vincent M. Donnelly

https://doi.org/10.1116/6.0004092

Plasma Science and Technology

Dynamic global model of Cl₂/Ar plasmas: Applicability to atomic layer etching processes

T. Rasoanarivo; C. Mannequin; F. Roqueta; M. Boufnichel; A. Rhallabi

https://doi.org/10.1116/6.0003932

Atomic Layer Etching (ALE)

Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H₂ and SF₆/Ar plasmas

Ivy I. Chen; Jennifer Solgaard; Ryoto Sekine; Azmain A. Hossain; Anthony Ardizzi; David S. Catherall; Alireza Marandi; James R. Renzas; Frank Greer; Austin J. Minnich

https://doi.org/10.1116/6.0003962

Atomic Layer Etching (ALE)