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Atomic Layer Deposition (ALD)
Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting and Atomic Layer Etching (ALE) Workshop, the Journal of Vacuum Science & Technology A publishes collections of articles covering the most recent developments and experimental studies in ALD and ALE. This Special Topic Collection will include papers presented at ALD 2024 which took place August 4-7, 2024 in Helsinki, Finland, as well as other ALD research articles that were not presented at the conference but are submitted to the collection. The collection features articles dedicated to the science and technology of atomic layer controlled deposition.
Atomic Layer Deposition (ALD)
Ju Eun Kang; Sang Jeen Hong
Atomic Layer Deposition (ALD)
Yousra Traouli; Ufuk Kilic; Sema G. Kilic; Matthew Hilfiker; Daniel Schmidt; Stefan Schoeche; Eva Schubert; Mathias Schubert