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Honoring John Ekerdt’s Contributions to Chemical Reaction Engineering and Surface Chemistry for Electronic Materials
This Special Topic Collection honors the important contributions of Professor John Ekerdt in both research and leadership in the area of surface and reaction chemistry of electronic and optoelectronic materials. The collection focuses on important challenges, new developments, and current understanding of various topics that John Ekerdt influenced and contributed to.
Guest Editors: Stacey F. Bent, Stanford University Jane P. Chang, University of California Los Angeles
Thin Films
Yukun Liu; Pulkita Jain; Iver J. Cleveland; Seda Sarp; Eray S. Aydil
2-D Materials
Jatin Vikram Singh; Matthew N. Disiena; S. S. Teja Nibhanupudi; Nicholas T. Watanabe; JaeHyun Ahn; Dong-Won Kim; Anupam Roy; Sanjay K. Banerjee
Atomic Layer Deposition (ALD)
Harshil Kashyap; Ping-Che Lee; Kisung Chae; Matthias Passlack; Ajay K. Yadav; Keith Wong; Srini Nemani; Ellie Yieh; Jeffrey Spiegelman; Kyeongjae Cho; Asif Islam Khan; Andrew C. Kummel
Surface Engineering and Coatings
Benjamin J. Stacy; Loc Ngo; Kara Nagasaki; Brian A. Korgel
Atomic Layer Deposition (ALD)
Jyoti Sinha; Laura Nyns; Annelies Delabie
Atomic Layer Deposition (ALD)
Nicholas M. Carroll; Gregory N. Parsons
2-D Materials
Zaoyang Lin; Sven Dekelver; Daire Cott; Benjamin Groven; Stefanie Sergeant; Thierry Conard; Xiangyu Wu; Pierre Morin; Dennis Lin; Cesar Javier Lockhart de la Rosa; Gouri Sankar Kar; Annelies Delabie
Atomic Layer Deposition (ALD)
John R. Mason; Andrew V. Teplyakov
Surfaces and Interfaces
Xiaoqiang Zhang; Yuteng Feng; Wei Zhang; Changhui Liang; Huixiang Li; Yongxin Li; Z. Conrad Zhang
Atomic Layer Etching (ALE)
Ross Edel; Ezra Alexander; Taewook Nam; Andrew S. Cavanagh; Troy Van Voorhis; Steven M. George
Surfaces and Interfaces
Sarah A. Willson; Rachael G. Farber; S. J. Sibener
Surfaces and Interfaces
Israel E. Wachs
2-D Materials
Prithvi Dake; Maria Rikaela Ilagan; Shoili Banerjee; Susannah L. Scott; James B. Rawlings
Atomic Layer Deposition (ALD)
Lanxin Guo; Yixian Wang; Zifan Pang; Xin Han; Yafeng Wang; Lipei Peng; Xin Gao; Chunlei Pei; Tuo Wang; Jinlong Gong
Atomic Layer Deposition (ALD)
Amnon Rothman; Seunggi Seo; Jacob Woodruff; Hyungjun Kim; Stacey F. Bent