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Plasma Processing for Advanced Microelectronics

Plasma processing is a critical tool for the microelectronics industry, whose products and systems enable technologies across a wide range of economic sectors, with plasmas used in 40–45% of the fabrication steps in leading microchip manufacturing. Such utilization requires a thorough understanding of the plasma environment and plasma–surface interactions. This Special Topic Collection on Plasma Processing for Advanced Microelectronics features articles dedicated to the science and technology of plasma processing associated with enhanced material and device performance, the development of novel materials and device architectures, and process control and development in semiconductor, memory and novel or advanced electronic device fabrication.

Guest Editors: Sebastian Engelmann (IBM), Keren Kanarik (Lam Research Corporation), and Scott Walton (Naval Research Laboratory)

Image Credit: Kazunori Shinoda, Nobuya Miyoshi, Hiroyuki Kobayashi, Yuko Hanaoka, Masaru Izawa, Kenji Ishikawa, and Masaru Hori, JVST B 40, 022201 (2022); https://doi.org/10.1116/6.0001660

Special Collection Image
David R. Boris; Michael J. Johnson; Charles R. Eddy, Jr.; Scott G. Walton
10.1116/6.0001840
Se-Jin Oh
10.1116/6.0001883
Filip Schleicher; Sara Paolillo; Stefan Decoster; Chen Wu; Victor Vega-Gonzalez; Mahmudul Hasan; Christophe Beral; Frédéric Lazzarino
10.1116/6.0001757
Katie Lutker-Lee; Jennifer Church; Eric Miller; Angelique Raley; Luciana Meli
10.1116/6.0001665
Shahid Rauf; Peng Tian; Jason Kenney; Leonid Dorf
10.1116/6.0001732
Linfeng Du; Paul Ruchhoeft; Demetre J. Economou; Vincent M. Donnelly
10.1116/6.0001709
Dahee Shim; Jihyun Kim; Yongjae Kim; Heeyeop Chae
10.1116/6.0001602
Linfeng Du; Demetre J. Economou; Vincent M. Donnelly
10.1116/6.0001710
Xinghua Sun; Yann Mignot; Christopher Cole; Eric Liu; Daniel Santos; Angelique Raley; Jennifer Church; Luciana Meli; Stuart A. Sieg; Peter Biolsi
10.1116/6.0001671
Dmitry Levko; Chandrasekhar Shukla; Kenta Suzuki; Laxminarayan L. Raja
10.1116/6.0001631
Joseph R. Vella; David Humbird; David B. Graves
10.1116/6.0001681
Kazunori Shinoda; Nobuya Miyoshi; Hiroyuki Kobayashi; Yuko Hanaoka; Masaru Izawa; Kenji Ishikawa; Masaru Hori
10.1116/6.0001660
Michael Klick; Hans-Peter Maucher
10.1116/6.0001477
Tobias Gergs; Borislav Borislavov; Jan Trieschmann
10.1116/6.0001485
Yu-Hao Tsai; Mingmei Wang
10.1116/6.0001455
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