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Conference Collection: 15th International Symposium on Sputtering and Plasma Processes (ISSP2019)
This is a collection of papers originating from the 15th International Symposium on Sputtering and Plasma Processes (ISSP2019) meeting held June 11–14, 2019 in Kanazawa, Japan. Topics include fundamentals of sputtering and plasma processes, thin films, and applications.
Image Credit: Philipp Schulz, Andreas Pflug, and Hans-Ulrich Kricheldorf, JVST B 38(2), https://doi.org/10.1116/1.5130720 (2020).
Electronic and Optoelectronic Materials, Devices and Processing
Taisei Motomura; Tatsuo Tabaru; Masato Uehara; Yuki Fujio; Tetsuya Okuyama
Electronic and Optoelectronic Materials, Devices and Processing
Junichi Nomoto; Tomohiko Nakajima; Iwao Yamaguchi; Tetsuo Tsuchiya
Electronic and Optoelectronic Materials, Devices and Processing
Philipp Schulz; Andreas Pflug; Hans-Ulrich Kricheldorf
Nanometer Science and Technology
Anmar H. Shukor; Haider A. Alhattab; Ichiro Takano
Nanometer Science and Technology
Koki Tamekuni; Toru Harigai; Takafumi Toya; Hirofumi Takikawa; Tsuyoshi Tanimoto; Shigeki Takago; Haruyuki Yasui; Satoru Kaneko; Shinsuke Kunitsugu; Masao Kamiya; Makoto Taki; Hidenobu Gonda
Measurement and Characterization
Kazuya Kusaka; Kenta Shirasaka; Daisuke Yonekura; Yuta Tanaka
Measurement and Characterization
Kazuya Kusaka; Kenta Shirasaka; Daisuke Yonekura; Yuta Tanaka