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Conference Collection: 15th International Symposium on Sputtering and Plasma Processes (ISSP2019)
This is a collection of papers originating from the 15th International Symposium on Sputtering and Plasma Processes (ISSP2019) meeting held June 11–14, 2019 in Kanazawa, Japan. Topics include fundamentals of sputtering and plasma processes, thin films, and applications.
Image Credit: Philipp Schulz, Andreas Pflug, and Hans-Ulrich Kricheldorf, JVST B 38(2), https://doi.org/10.1116/1.5130720 (2020).

Electronic and Optoelectronic Materials, Devices and Processing
Taisei Motomura; Tatsuo Tabaru; Masato Uehara; Yuki Fujio; Tetsuya Okuyama
10.1116/1.5129720
Electronic and Optoelectronic Materials, Devices and Processing
Junichi Nomoto; Tomohiko Nakajima; Iwao Yamaguchi; Tetsuo Tsuchiya
10.1116/1.5129684
Electronic and Optoelectronic Materials, Devices and Processing
Philipp Schulz; Andreas Pflug; Hans-Ulrich Kricheldorf
10.1116/1.5130720
Nanometer Science and Technology
Anmar H. Shukor; Haider A. Alhattab; Ichiro Takano
10.1116/1.5131518
Nanometer Science and Technology
Koki Tamekuni; Toru Harigai; Takafumi Toya; Hirofumi Takikawa; Tsuyoshi Tanimoto; Shigeki Takago; Haruyuki Yasui; Satoru Kaneko; Shinsuke Kunitsugu; Masao Kamiya; Makoto Taki; Hidenobu Gonda
10.1116/1.5129700
Measurement and Characterization
Kazuya Kusaka; Kenta Shirasaka; Daisuke Yonekura; Yuta Tanaka
10.1116/1.5118682
Measurement and Characterization
Kazuya Kusaka; Kenta Shirasaka; Daisuke Yonekura; Yuta Tanaka
10.1116/1.5118702