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64th International Conference on Electron, Ion, And Photon Beam Technology and Nanofabrication, EIPBN 2021

This collection includes papers from the 64th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication held virtually on June 1-4, 2021. The EIPBN Conference is dedicated to lithographic patterning science, nano-manufacturing process technology, and the applications these methods enable. The Conference Chair was Gerald Lopez (University of Pennsylvania, Singh Center for Nanotechnology), and the Program Chair was Martha I. Sanchez (LytEn Inc.).

Guest Editors: Program Chair: Martha I. Sanchez

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Review Articles
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Nanofabricating neural networks: Strategies, advances, and challenges
Regina Luttge
https://doi.org/10.1116/6.0001649
MEMS and NEMS
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Fabrication of ultrathin suspended membranes from atomic layer deposition films
Michael J. Elowson; Rohan Dhall; Adam Schwartzberg; Stephanie Y. Chang; Vittoria Tommasini; Sardar B. Alam; Emory M. Chan; Stefano Cabrini; Shaul Aloni
https://doi.org/10.1116/6.0001309
Lithography
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Hybrid cross correlation and line-scan alignment strategy for CMOS chips electron-beam lithography processing
Raphaël Dawant; Robyn Seils; Serge Ecoffey; Rainer. Schmid; Dominique Drouin
https://doi.org/10.1116/6.0001278
Nanoscale Science and Technology
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Investigating the pattern transfer fidelity of Norland Optical Adhesive 81 for nanogrooves by microtransfer molding
Rahman Sabahi-Kaviani; Regina Luttge
https://doi.org/10.1116/6.0001333
MEMS and NEMS
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Neural optoelectrodes merging semiconductor scalability with polymeric-like bendability for low damage acute in vivo neuron readout and stimulation
Vittorino Lanzio; Vanessa Gutierrez; John Hermiz; Kristofer Bouchard; Stefano Cabrini
https://doi.org/10.1116/6.0001269
Lithography
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Multiple criteria optimization of electrostatic electron lenses using multiobjective genetic algorithms
Neda Hesam Mahmoudi Nezhad; Mohamad Ghaffarian Niasar; Ali Mohammadi Gheidari; Pieter Kruit; Cornelis Wouter Hagen
https://doi.org/10.1116/6.0001274
Lithography
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Identifying extreme ultraviolet lithography attenuated phase shifting mask absorber materials using effective media approximation modeling
Rajiv Sejpal; Bruce Smith
https://doi.org/10.1116/6.0001298
Electronic and Optoelectronic Materials, Devices and Processing
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Multiple electron beam generation from InGaN photocathode
Daiki Sato; Haruka Shikano; Atsushi Koizumi; Tomohiro Nishitani; Yoshio Honda; Hiroshi Amano
https://doi.org/10.1116/6.0001272
Nanoscale Science and Technology
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Bridging the gap: Perspectives of nanofabrication technologies for application-oriented research
Mario Baum; Christoph Meinecke; Thomas Blaudeck; Christian Helke; Danny Reuter; Karla Hiller; Sascha Hermann; Stefan E. Schulz; Harald Kuhn
https://doi.org/10.1116/6.0001299
Nanoscale Science and Technology
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100 keV vacuum sealed field emission gun for high resolution electron microscopy
Mohamed M. El-Gomati; Torquil Wells; Xiaoping Zha; Richard Sykes; Christopher J. Russo; Richard Henderson; Greg McMullan
https://doi.org/10.1116/6.0001275
Electronic and Optoelectronic Materials, Devices and Processing
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Stress reduction and wafer bow accommodation for the fabrication of thin film lithium niobate on oxidized silicon
Karan Prabhakar; Ryan J. Patton; Ronald M. Reano
https://doi.org/10.1116/6.0001283
Nanoscale Science and Technology
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Intermetallic compound formation inhibiting electromigration-based micro/nanowire growth
Yasuhiro Kimura; Yang Ju
https://doi.org/10.1116/6.0001271
Lithography
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Optimized ultraviolet grayscale process for high vertical resolution applied to spectral imagers
Nadine Gerges; Camille Petit-Etienne; Marie Panabière; Jumana Boussey; Yann Ferrec; Cécile Gourgon
https://doi.org/10.1116/6.0001273
Plasmonics
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Subradiant resonances in Au and Ag bipartite lattices in the visible spectrum
Aran Warren; Maan M. Alkaisi; Ciaran P. Moore
https://doi.org/10.1116/6.0001270
Electronic and Optoelectronic Materials, Devices and Processing
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Surface wetting on micromilled and laser-etched aluminum with ion-beam postprocessing
Kirill Misiiuk; Sam Lowrey; Richard Blaikie; Josselin Juras; Andrew Sommers; Jérôme Leveneur
https://doi.org/10.1116/6.0001282
Measurement and Characterization
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Using block-copolymer nanolithography as a tool to sensitively evaluate variation in chemical dry etching rates of semiconductor materials with sub-5 nm resolution
Elizabeth M. Ashley; Peter J. Duda, III; Paul F. Nealey
https://doi.org/10.1116/6.0001287
Microelectronic and Nanoelectronic Devices
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Planar figure-8 coils for ultra-focal and directional micromagnetic brain stimulation
Hongbae Jeong; Jiangdong Deng; Giorgio Bonmassar
https://doi.org/10.1116/6.0001281
Measurement and Characterization
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Long-term brain-on-chip: Multielectrode array recordings in 3D neural cell cultures
Yagmur Demircan Yalcin; Alex J. Bastiaens; Jean-Philippe Frimat; Regina Luttge
https://doi.org/10.1116/6.0001297
Nanoscale Science and Technology
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Lithographically patterned stretchable metallic microwiring on electrospun nanofiber mats
Yutika Badhe; Pedro E. Rocha-Flores; Walter E. Voit; David Remer; Lauren Costella; Alexandra Joshi-Imre
https://doi.org/10.1116/6.0001279
Measurement and Characterization
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Virtual metrology modeling of reactive ion etching based on statistics-based and dynamics-inspired spectral features
Kun-Chieh Chien; Chih-Hao Chang; Dragan Djurdjanovic
https://doi.org/10.1116/6.0001277

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