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64th International Conference on Electron, Ion, And Photon Beam Technology and Nanofabrication, EIPBN 2021

This collection includes papers from the 64th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication held virtually on June 1-4, 2021. The EIPBN Conference is dedicated to lithographic patterning science, nano-manufacturing process technology, and the applications these methods enable. The Conference Chair was Gerald Lopez (University of Pennsylvania, Singh Center for Nanotechnology), and the Program Chair was Martha I. Sanchez (LytEn Inc.).

Guest Editors: Program Chair: Martha I. Sanchez

Review Articles

Nanofabricating neural networks: Strategies, advances, and challenges

Regina Luttge

10.1116/6.0001649

MEMS and NEMS

Fabrication of ultrathin suspended membranes from atomic layer deposition films

Michael J. Elowson; Rohan Dhall; Adam Schwartzberg; Stephanie Y. Chang; Vittoria Tommasini; Sardar B. Alam; Emory M. Chan; Stefano Cabrini; Shaul Aloni

10.1116/6.0001309

Lithography

Hybrid cross correlation and line-scan alignment strategy for CMOS chips electron-beam lithography processing

Raphaël Dawant; Robyn Seils; Serge Ecoffey; Rainer. Schmid; Dominique Drouin

10.1116/6.0001278

Nanoscale Science and Technology

Investigating the pattern transfer fidelity of Norland Optical Adhesive 81 for nanogrooves by microtransfer molding

Rahman Sabahi-Kaviani; Regina Luttge

10.1116/6.0001333

MEMS and NEMS

Neural optoelectrodes merging semiconductor scalability with polymeric-like bendability for low damage acute in vivo neuron readout and stimulation

Vittorino Lanzio; Vanessa Gutierrez; John Hermiz; Kristofer Bouchard; Stefano Cabrini

10.1116/6.0001269

Lithography

Multiple criteria optimization of electrostatic electron lenses using multiobjective genetic algorithms

Neda Hesam Mahmoudi Nezhad; Mohamad Ghaffarian Niasar; Ali Mohammadi Gheidari; Pieter Kruit; Cornelis Wouter Hagen

10.1116/6.0001274

Lithography

Identifying extreme ultraviolet lithography attenuated phase shifting mask absorber materials using effective media approximation modeling

Rajiv Sejpal; Bruce Smith

10.1116/6.0001298

Electronic and Optoelectronic Materials, Devices and Processing

Multiple electron beam generation from InGaN photocathode

Daiki Sato; Haruka Shikano; Atsushi Koizumi; Tomohiro Nishitani; Yoshio Honda; Hiroshi Amano

10.1116/6.0001272

Nanoscale Science and Technology

Bridging the gap: Perspectives of nanofabrication technologies for application-oriented research

Mario Baum; Christoph Meinecke; Thomas Blaudeck; Christian Helke; Danny Reuter; Karla Hiller; Sascha Hermann; Stefan E. Schulz; Harald Kuhn

10.1116/6.0001299

Electronic and Optoelectronic Materials, Devices and Processing

Stress reduction and wafer bow accommodation for the fabrication of thin film lithium niobate on oxidized silicon

Karan Prabhakar; Ryan J. Patton; Ronald M. Reano

10.1116/6.0001283

Nanoscale Science and Technology

100 keV vacuum sealed field emission gun for high resolution electron microscopy

Mohamed M. El-Gomati; Torquil Wells; Xiaoping Zha; Richard Sykes; Christopher J. Russo; Richard Henderson; Greg McMullan

10.1116/6.0001275

Nanoscale Science and Technology

Intermetallic compound formation inhibiting electromigration-based micro/nanowire growth

Yasuhiro Kimura; Yang Ju

10.1116/6.0001271

Lithography

Optimized ultraviolet grayscale process for high vertical resolution applied to spectral imagers

Nadine Gerges; Camille Petit-Etienne; Marie Panabière; Jumana Boussey; Yann Ferrec; Cécile Gourgon

10.1116/6.0001273

Plasmonics

Subradiant resonances in Au and Ag bipartite lattices in the visible spectrum

Aran Warren; Maan M. Alkaisi; Ciaran P. Moore

10.1116/6.0001270

Electronic and Optoelectronic Materials, Devices and Processing

Surface wetting on micromilled and laser-etched aluminum with ion-beam postprocessing

Kirill Misiiuk; Sam Lowrey; Richard Blaikie; Josselin Juras; Andrew Sommers; Jérôme Leveneur

10.1116/6.0001282

Measurement and Characterization

Using block-copolymer nanolithography as a tool to sensitively evaluate variation in chemical dry etching rates of semiconductor materials with sub-5 nm resolution

Elizabeth M. Ashley; Peter J. Duda, III; Paul F. Nealey

10.1116/6.0001287

Nanoscale Science and Technology

Lithographically patterned stretchable metallic microwiring on electrospun nanofiber mats

Yutika Badhe; Pedro E. Rocha-Flores; Walter E. Voit; David Remer; Lauren Costella; Alexandra Joshi-Imre

10.1116/6.0001279

Microelectronic and Nanoelectronic Devices

Planar figure-8 coils for ultra-focal and directional micromagnetic brain stimulation

Hongbae Jeong; Jiangdong Deng; Giorgio Bonmassar

10.1116/6.0001281

Measurement and Characterization

Long-term brain-on-chip: Multielectrode array recordings in 3D neural cell cultures

Yagmur Demircan Yalcin; Alex J. Bastiaens; Jean-Philippe Frimat; Regina Luttge

10.1116/6.0001297

Measurement and Characterization

Virtual metrology modeling of reactive ion etching based on statistics-based and dynamics-inspired spectral features

Kun-Chieh Chien; Chih-Hao Chang; Dragan Djurdjanovic

10.1116/6.0001277

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64th International Conference on Electron, Ion, And Photon Beam Technology and Nanofabrication, EIPBN 2021

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64th International Conference on Electron, Ion, And Photon Beam Technology and Nanofabrication, EIPBN 2021

Resources

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pubs.aip.org

Connect with AIP Publishing

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