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Conference Collection: The 63rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 2019)

This collection includes papers from the 63rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication held in Minneapolis, Minnesota, from May 28-31, 2019. The EIPBN Conference is dedicated to lithographic patterning science, nano-manufacturing process technology, and the applications these methods enable. The Conference Chair was Aaron Stein, (Brookhaven National Laboratory) and the Program Chair was Regina Luttge (Eindhoven University of Technology).

Guest Editor: Program Chair, Regina Luttge

Lithography

Recovery of quantum efficiency on Cs/O-activated GaN and GaAs photocathodes by thermal annealing in vacuum

Daiki Sato; Tomohiro Nishitani; Yoshio Honda; Hiroshi Amano

https://doi.org/10.1116/1.5120417

Electronic and Optoelectronic Materials, Devices and Processing

Effects of mask material conductivity on lateral undercut etching in silicon nano-pillar fabrication

Ripon Kumar Dey; Huseyin Ekinci; Bo Cui

https://doi.org/10.1116/1.5123601

Nanometer Science and Technology

Effect of oxygen plasma cleaning on nonswitching pseudo-Bosch etching of high aspect ratio silicon pillars

Ferhat Aydinoglu; Aixi Pan; Chenxu Zhu; Bo Cui

https://doi.org/10.1116/1.5122822

Electronic and Optoelectronic Materials, Devices and Processing

Simplified patterning process for the selective 1D ZnO nanorods growth

Yulin Geng; Karina Jeronimo; Muhammad Ammar Bin Che Mahzan; Peter Lomax; Enrico Mastropaolo; Rebecca Cheung

https://doi.org/10.1116/1.5131363

Lithography

Line edge roughness metrology software

Sertac Guneri Yazgi; Tzvetan Ivanov; Mathias Holz; Ivo W. Rangelow; Burhanettin Erdem Alaca

https://doi.org/10.1116/1.5122675

Lithography

High-brightness source of energetic He atoms

Venu S. Jonnalagadda; Navjot S. Randhawa; Apeksha Awale; Pratik Motwani; John C. Wolfe

https://doi.org/10.1116/1.5124838

Electronic and Optoelectronic Materials, Devices and Processing

Nanoscale etching of perovskite oxides for field effect transistor applications

Junao Cheng; Hao Yang; Caiyu Wang; Nick Combs; Chris Freeze; Omor Shoron; Wangzhou Wu; Nidhin Kurian Kalarickal; Hareesh Chandrasekar; Susanne Stemmer; Siddharth Rajan; Wu Lu

https://doi.org/10.1116/1.5122667

Nanometer Science & Technology