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Conference Collection: The 63rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 2019)
This collection includes papers from the 63rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication held in Minneapolis, Minnesota, from May 28-31, 2019. The EIPBN Conference is dedicated to lithographic patterning science, nano-manufacturing process technology, and the applications these methods enable. The Conference Chair was Aaron Stein, (Brookhaven National Laboratory) and the Program Chair was Regina Luttge (Eindhoven University of Technology).
Guest Editor: Program Chair, Regina Luttge

Lithography
Daiki Sato; Tomohiro Nishitani; Yoshio Honda; Hiroshi Amano
10.1116/1.5120417
Electronic and Optoelectronic Materials, Devices and Processing
Effects of mask material conductivity on lateral undercut etching in silicon nano-pillar fabrication
Ripon Kumar Dey; Huseyin Ekinci; Bo Cui
10.1116/1.5123601
Nanometer Science and Technology
Ferhat Aydinoglu; Aixi Pan; Chenxu Zhu; Bo Cui
10.1116/1.5122822
Electronic and Optoelectronic Materials, Devices and Processing
Yulin Geng; Karina Jeronimo; Muhammad Ammar Bin Che Mahzan; Peter Lomax; Enrico Mastropaolo; Rebecca Cheung
10.1116/1.5131363
Lithography
Sertac Guneri Yazgi; Tzvetan Ivanov; Mathias Holz; Ivo W. Rangelow; Burhanettin Erdem Alaca
10.1116/1.5122675
Lithography
Venu S. Jonnalagadda; Navjot S. Randhawa; Apeksha Awale; Pratik Motwani; John C. Wolfe
10.1116/1.5124838
Electronic and Optoelectronic Materials, Devices and Processing
Junao Cheng; Hao Yang; Caiyu Wang; Nick Combs; Chris Freeze; Omor Shoron; Wangzhou Wu; Nidhin Kurian Kalarickal; Hareesh Chandrasekar; Susanne Stemmer; Siddharth Rajan; Wu Lu
10.1116/1.5122667
Nanometer Science & Technology
Rimjhim Chaudhary; Gyuseok Kim; Hiromichi Yamamoto; George Patrick Watson
10.1116/1.5123622
Nanometer Science & Technology
Mathias Holz; Frances I. Allen; Christoph Reuter; Ahmad Ahmad; Martin Hofmann; Alexander Reum; Tzvetan Ivanov; Ivo W. Rangelow
10.1116/1.5123287
Lithography (all types)
Md Nabid Hasan; Soo-Young Lee; Byung-Sup Ahn; Jin Choi; Seom-Beom Kim; Chan-Uk Jeon
10.1116/1.5121798
MEMS & NEMS
Lane G. Huston; Emily A. Kooistra-Manning; Jack L. Skinner; Jessica M. Andriolo
10.1116/1.5122659
MEMS & NEMS
Huseyin Ekinci; Ripon K. Dey; Bo Cui
10.1116/1.5123530
Plasmonics
Jessica M. Andriolo; McKenzie L. Joseph; Mark H. Griep; Jack L. Skinner
10.1116/1.5122693
Measurement and Characterization
Jungki Song; Ralf K. Heilmann; Alexander R. Bruccoleri; Mark L. Schattenburg
10.1116/1.5119713
Lithography (all types)
Yi-An Chen; I-Te Chen; Chih-Hao Chang
10.1116/1.5119388
Lithography (all types)
John N. Randall; James H. G. Owen; Joseph Lake; Ehud Fuchs
10.1116/1.5119392
Lithography (all types)
Ningzhi Xie; David Jones; Gerald Lopez
10.1116/1.5122660
Letters
Zhuofei Gan; Jingxuan Cai; Chuwei Liang; Liyang Chen; Siyi Min; Xing Cheng; Dehu Cui; Wen-Di Li
10.1116/1.5123220
Nanometer Science & Technology
Miriam Leifels; Andre Mayer; Hella-Christin Scheer
10.1116/1.5119691
Nanometer Science & Technology
Moshe Dolejsi; Priya Moni; Cody T. Bezik; Chun Zhou; Juan J. de Pablo; Karen K. Gleason; Paul F. Nealey
10.1116/1.5121541