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Papers from the 62nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

This collection includes papers from the 62nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication held in Puerto Rico from May 29 – June 1, 2018. The EIPBN Conference is dedicated to lithographic patterning science, nano-manufacturing process technology, and the applications these methods enable. The Conference Chair was Lawrence Muray (KLA-Tencor), and the Program Chair was Shida Tan (Intel Corporation).

Image Credit: Ivo W. Rangelow, Marcus Kaestner, Tzvetan Ivanov, Ahmad Ahmad, Steve Lenk, Claudia Lenk, Elshad Guliyev, Alexander Reum, Martin Hofmann, Christoph Reuter, and Mathias Holz, Journal of Vacuum Science & Technology B 36, 06J102 (2018); https://doi.org/10.1116/1.5048524

Lithography

High-throughput process chain for single electron transistor devices based on field-emission scanning probe lithography and Smart Nanoimprint lithography technology

Claudia Lenk; Yana Krivoshapkina; Martin Hofmann; Steve Lenk; Tzvetan Ivanov; Ivo W. Rangelow; Ahmad Ahmad; Alexander Reum; Mathias Holz; Thomas Glinsner; Martin Eibelhuber; Dominik Treiblmayr; Barbara Schamberger; Mustapha Chouiki; Boon Teik Chan; Ziad el Otell; Jean-François de Marneffe

10.1116/1.5067269

Lithography

E-beam lithography using dry powder resist of hydrogen silsesquioxane having long shelf life

Jiashi Shen; Ferhat Aydinoglu; Mohammad Soltani; Bo Cui

10.1116/1.5079657

Microelectronic & Nanoelectronic Devices

Maskless production of neural-recording graphene microelectrode arrays

Vanessa Pereira Gomes; Aline Maria Pascon; Roberto Ricardo Panepucci; Jacobus Willibrordus Swart

10.1116/1.5048216

Lithography

Structural effects on the performance of epoxide-based negative-tone molecular resists

Brandon L. Sharp; Hannah L. Narcross; Peter Ludovice; Laren M. Tolbert; Clifford L. Henderson

10.1116/1.5057741

Lithography

Synthesis and self-assembly of high-χ poly(4-tertbutylstyrene)-block-poly(2-hydroxyethylmethacrylate)

Caleb L. Breaux; Brandon L. Sharp; Peter J. Ludovice; Clifford L. Henderson; Haibo Li; Bing Li; Mark Neisser

10.1116/1.5056256

Lithography

Electrically-assisted nanoimprint of block copolymers

Andre Mayer; Wenyang Ai; Johannes Rond; Johannes Staabs; Christian Steinberg; Marc Papenheim; Hella-Christin Scheer; Massimo Tormen; Alesandro Cian; Joachim Zajadacz; Klaus Zimmer

10.1116/1.5048204

E Beam Lithography

Designing an anisotropic noise filter for measuring critical dimension and line edge roughness from scanning electron microscope images

Hyesung Ji; Soo-Young Lee

10.1116/1.5048077

Advanced Lithography

Progress in metal organic cluster EUV photoresists

Kazunori Sakai; Hong Xu; Vasiliki Kosma; Emmanuel P. Giannelis; Christopher K. Ober

10.1116/1.5050942

Materials for Advanced Patterning

Phenol-functionalized polymerization control additives for negative tone epoxide crosslinking molecular resists

Hannah Narcross; Brandon L. Sharp; Peter J. Ludovice; Laren M. Tolbert; Clifford L. Henderson

10.1116/1.5057442

E Beam Lithography

On the trends and application of pattern density dependent isofocal dose of positive resists for 100 keV electron beam lithography

Gerald G. Lopez; Glen de Villafranca; Mohsen Azadi; Meredith G. Metzler; Kevin Lister; Michael Labella; Chad Eichfeld; Nikola Belic; Ulrich Hofmann

10.1116/1.5048206

Advanced Lithography

Unbiased roughness measurements: Subtracting out SEM effects, part 2

Gian F. Lorusso; Vito Rutigliani; Frieda Van Roey; Chris A. Mack

10.1116/1.5046477

Nanoimprint

Visualization of organic/inorganic hybridization of UV-cured films with trimethylaluminum by scanning transmission electron microscopy and energy dispersive x-ray spectroscopy

Masaru Nakagawa; Takuya Uehara; Yuki Ozaki; Takahiro Nakamura; Shunya Ito

10.1116/1.5047822

Charged Particle Optics

Variations of the field of view depending on the Si deflector shape in a microcolumn

Hyung Woo Kim; Young Bok Lee; Dae-Wook Kim; Seungjoon Ahn; Tae Sik Oh; Ho Seob Kim; Young Chul Kim

10.1116/1.5048128

Nanophotonics

Moth-eye antireflection nanostructure on glass for CubeSats

Yaoze Liu; Mohammad Soltani; Ripon Kumar Dey; Bo Cui; Regina Lee; Hugh Podmore

10.1116/1.5050986

E Beam Lithography

Effects of lithographic parameters in massively parallel electron-beam systems

Soomin Moon; Soo-Young Lee; Jin Choi; Seom-Beom Kim; Chan-Uk Jeon

10.1116/1.5048084

Nanoimprint

Fabrication and replication of re-entrant structures by nanoimprint lithography methods

Nikolaos Kehagias; Achille Francone; Markus Guttmann; Frank Winkler; Ariadna Fernández; Clivia M. Sotomayor Torres

10.1116/1.5048241

E Beam Lithography

Stochastic simulation of pattern formation in electron beam lithography

Masaaki Yasuda; Masanori Koyama; Masamitsu Shirai; Hiroaki Kawata; Yoshihiko Hirai

10.1116/1.5049757

Scanning Probe Lithography

Field-emission scanning probe lithography tool for 150 mm wafer

Mathias Holz; Elshad Guliyev; Ahmad Ahmad; Tzvetan Ivanov; Alexander Reum; Martin Hofmann; Claudia Lenk; Marcus Kaestner; Christoph Reuter; Steve Lenk; Ivo W. Rangelow; Nikolay Nikolov

10.1116/1.5048357

Scanning Probe Lithography

Highly parallel scanning tunneling microscope based hydrogen depassivation lithography

John N. Randall; James H. G. Owen; Joseph Lake; Rahul Saini; Ehud Fuchs; Mohammad Mahdavi; S. O. Reza Moheimani; Benjamin Carrion Schaefer

10.1116/1.5047939

Scanning Probe Lithography

Sharp GaN nanowires used as field emitter on active cantilevers for scanning probe lithography

Claudia Lenk; Martin Hofmann; Tzvetan Ivanov; Ahmad Ahmad; Steve Lenk; Ivo W. Rangelow; Alexander Reum; Christoph Reuter; Mathias Holz; Mahmoud Behzadirad; Ashwin K. Rishinaramangalam; Daniel Feezell; Tito Busani

10.1116/1.5048190

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Papers from the 62nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

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Papers from the 62nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

Resources

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pubs.aip.org

Connect with AIP Publishing

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