Papers from the 62nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
This collection includes papers from the 62nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication held in Puerto Rico from May 29 – June 1, 2018. The EIPBN Conference is dedicated to lithographic patterning science, nano-manufacturing process technology, and the applications these methods enable. The Conference Chair was Lawrence Muray (KLA-Tencor), and the Program Chair was Shida Tan (Intel Corporation).
Image Credit: Ivo W. Rangelow, Marcus Kaestner, Tzvetan Ivanov, Ahmad Ahmad, Steve Lenk, Claudia Lenk, Elshad Guliyev, Alexander Reum, Martin Hofmann, Christoph Reuter, and Mathias Holz, Journal of Vacuum Science & Technology B 36, 06J102 (2018); https://doi.org/10.1116/1.5048524