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Papers from the 62nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
This collection includes papers from the 62nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication held in Puerto Rico from May 29 – June 1, 2018. The EIPBN Conference is dedicated to lithographic patterning science, nano-manufacturing process technology, and the applications these methods enable. The Conference Chair was Lawrence Muray (KLA-Tencor), and the Program Chair was Shida Tan (Intel Corporation).
Image Credit: Ivo W. Rangelow, Marcus Kaestner, Tzvetan Ivanov, Ahmad Ahmad, Steve Lenk, Claudia Lenk, Elshad Guliyev, Alexander Reum, Martin Hofmann, Christoph Reuter, and Mathias Holz, Journal of Vacuum Science & Technology B 36, 06J102 (2018); https://doi.org/10.1116/1.5048524
Lithography
Claudia Lenk; Yana Krivoshapkina; Martin Hofmann; Steve Lenk; Tzvetan Ivanov; Ivo W. Rangelow; Ahmad Ahmad; Alexander Reum; Mathias Holz; Thomas Glinsner; Martin Eibelhuber; Dominik Treiblmayr; Barbara Schamberger; Mustapha Chouiki; Boon Teik Chan; Ziad el Otell; Jean-François de Marneffe
Lithography
Jiashi Shen; Ferhat Aydinoglu; Mohammad Soltani; Bo Cui
Microelectronic & Nanoelectronic Devices
Vanessa Pereira Gomes; Aline Maria Pascon; Roberto Ricardo Panepucci; Jacobus Willibrordus Swart
Lithography
Brandon L. Sharp; Hannah L. Narcross; Peter Ludovice; Laren M. Tolbert; Clifford L. Henderson
Lithography
Caleb L. Breaux; Brandon L. Sharp; Peter J. Ludovice; Clifford L. Henderson; Haibo Li; Bing Li; Mark Neisser
Lithography
Andre Mayer; Wenyang Ai; Johannes Rond; Johannes Staabs; Christian Steinberg; Marc Papenheim; Hella-Christin Scheer; Massimo Tormen; Alesandro Cian; Joachim Zajadacz; Klaus Zimmer
E Beam Lithography
Hyesung Ji; Soo-Young Lee
Advanced Lithography
Kazunori Sakai; Hong Xu; Vasiliki Kosma; Emmanuel P. Giannelis; Christopher K. Ober
Materials for Advanced Patterning
Hannah Narcross; Brandon L. Sharp; Peter J. Ludovice; Laren M. Tolbert; Clifford L. Henderson
E Beam Lithography
Gerald G. Lopez; Glen de Villafranca; Mohsen Azadi; Meredith G. Metzler; Kevin Lister; Michael Labella; Chad Eichfeld; Nikola Belic; Ulrich Hofmann
Advanced Lithography
Gian F. Lorusso; Vito Rutigliani; Frieda Van Roey; Chris A. Mack
Nanoimprint
Masaru Nakagawa; Takuya Uehara; Yuki Ozaki; Takahiro Nakamura; Shunya Ito
Charged Particle Optics
Hyung Woo Kim; Young Bok Lee; Dae-Wook Kim; Seungjoon Ahn; Tae Sik Oh; Ho Seob Kim; Young Chul Kim
Nanophotonics
Yaoze Liu; Mohammad Soltani; Ripon Kumar Dey; Bo Cui; Regina Lee; Hugh Podmore
E Beam Lithography
Soomin Moon; Soo-Young Lee; Jin Choi; Seom-Beom Kim; Chan-Uk Jeon
E Beam Lithography
Masaaki Yasuda; Masanori Koyama; Masamitsu Shirai; Hiroaki Kawata; Yoshihiko Hirai
Nanoimprint
Nikolaos Kehagias; Achille Francone; Markus Guttmann; Frank Winkler; Ariadna Fernández; Clivia M. Sotomayor Torres
Scanning Probe Lithography
Mathias Holz; Elshad Guliyev; Ahmad Ahmad; Tzvetan Ivanov; Alexander Reum; Martin Hofmann; Claudia Lenk; Marcus Kaestner; Christoph Reuter; Steve Lenk; Ivo W. Rangelow; Nikolay Nikolov
Scanning Probe Lithography
John N. Randall; James H. G. Owen; Joseph Lake; Rahul Saini; Ehud Fuchs; Mohammad Mahdavi; S. O. Reza Moheimani; Benjamin Carrion Schaefer
Scanning Probe Lithography
Claudia Lenk; Martin Hofmann; Tzvetan Ivanov; Ahmad Ahmad; Steve Lenk; Ivo W. Rangelow; Alexander Reum; Christoph Reuter; Mathias Holz; Mahmoud Behzadirad; Ashwin K. Rishinaramangalam; Daniel Feezell; Tito Busani