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Special Issue on Synchrotron Radiation and Atomic Layer Deposition for Advanced Materials
This collection includes papers from the session on the use of synchrotron radiation to advance the state-of-the-knowledge in atomic layer deposition of materials during E-MRS Fall Meeting 2017 held at Warsaw University of Technology in Poland, September 18-21, 2017.
Guest Editors: Dr. Malgorzata Kot, BTU Cottbus-Senftenberg (Germany) and Dr. Claudia Wiemer, Laboratorio MDM- IMM-CNR (Italy)
Image Credit: Alessio Lamperti, Elena Cianci, Roberta Ciprian, Luca Capasso, Eugen Weschke, and Alberto Debernardi, Journal of Vacuum Science & Technology A 36, 02D404 (2018); https://doi.org/10.1116/1.5016028

Thin Films
Compositional, structural, and optical properties of atomic layer deposited tantalum oxide for optical fiber sensor overlays
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Kamil Kosiel; Karolina Pągowska; Maciej Kozubal; Marek Guziewicz; Krystyna Lawniczak-Jablonska; Rafał Jakieła; Yevgen Syryanyy; Tomasz Gabler; Mateusz Śmietana
Thin Films
Oxygen vacancy-passivated ZnO thin film formed by atomic layer deposition using H2O2
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Yue Wang; Kyung-Mun Kang; Minjae Kim; Hyung-Ho Park
Articles
High sensitivity Rutherford backscattering spectrometry using multidetector digital pulse processing
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Grazia Laricchiuta; Wilfried Vandervorst; Ivan Zyulkov; Silvia Armini; Johan Meersschaut
Articles
Low temperature plasma enhanced deposition approach for fabrication of microcrystalline GaP/Si superlattice
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Alexander S. Gudovskikh; Alexander V. Uvarov; Ivan A. Morozov; Artem I. Baranov; Dmitriy A. Kudryashov; Kirill S. Zelentsov; Anton S. Bukatin; Konstantin P. Kotlyar
Articles
Alessio Lamperti; Elena Cianci; Roberta Ciprian; Luca Capasso; Eugen Weschke; Alberto Debernardi
Articles
Ashley R. Head; Niclas Johansson; Yuran Niu; Olesia Snezhkova; Shilpi Chaudhary; Joachim Schnadt; Hendrik Bluhm; Chaoyu Chen; José Avila; Maria-Carmen Asensio
Articles
Elucidation of ALD MgZnO deposition processes using low energy ion scattering
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Matthew Werner; Joseph W. Roberts; Richard J. Potter; Karl Dawson; Paul R. Chalker
Articles
Nicholas G. Becker; Anna L. Butterworth; Murielle Salome; Stephen R. Sutton; Vincent De Andrade; Andrey Sokolov; Andrew J. Westphal; Thomas Proslier
Articles
Initial reactions of ultrathin HfO2 films by in situ atomic layer deposition: An in situ synchrotron photoemission spectroscopy study
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Seok Hwan Kim; Wooseok Song; In Su Jeon; Sun Sook Lee; Taek-Mo Chung; Ki-Seok An
Articles
In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
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Ganna Chistiakova; Mathias Mews; Regan G. Wilks; Marcus Bär; Lars Korte