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Festschrift Honoring Dr. Steve Rossnagel

This is a collection of articles by invited authors to honor the seminal and interdisciplinary contributions by Dr. Steve Rossnagel to Thin Films and Plasma fields on the occasion of his 65th Birthday. This Special Collection focuses on important challenges, new developments, and current understanding in a wide range outstanding research in the many fields Steve Rossnagel influenced and participated in. The collection caters to both scientists and professionals in industry, connecting fundamental research with practical applications.

Guest Editors: Joe Greene, Eray Aydil, Jim Fitz-Gerald, Ivan Petrov, Eric Joseph and Jerrold Anthony Floro

Review Articles

Beyond point of care diagnostics: Low-dimensional nanomaterials for electronic virus sensing

C. Muratore; M. K. Muratore

https://doi.org/10.1116/6.0000368

2-D Materials

Pulsed laser annealing of amorphous two-dimensional transition metal dichalcogenides

Rachel H. Rai; Argelia Pérez-Pacheco; Rosa Quispe-Siccha; Nicholas R. Glavin; Christopher Muratore

https://doi.org/10.1116/6.0000253

Review Articles

Self-healing ceramic coatings that operate in extreme environments: A review

Samir M. Aouadi; Jingjing Gu; Diana Berman

https://doi.org/10.1116/6.0000350

Thin Films

Role of high aspect-ratio thin-film metal deposition in Cu back-end-of-line technology

Andrew Simon; Oscar van der Straten; Nicholas A. Lanzillo; Chih-Chao Yang; Takeshi Nogami; Daniel C. Edelstein

https://doi.org/10.1116/6.0000170

Thin Films

Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects

Fırat Anğay; Lukas Löfler; Florent Tetard; Dominique Eyidi; Philippe Djemia; David Holec; Gregory Abadias

https://doi.org/10.1116/6.0000292

Review Articles

Thin film deposition research and its impact on microelectronics scaling

Cyril Cabral, Jr.; Christian Lavoie; Conal Murray; Adam Pyzyna; Ken Rodbell

https://doi.org/10.1116/6.0000230

Thin Films

High power impulse magnetron sputtering of diamond-like carbon coatings

Tomas Kubart; Asim Aijaz; Joakim Andersson; Fabio Ferreira; João Carlos Oliveira; Arcadie Sobetkii; Anca Constantina Parau; Catalin Vitelaru

https://doi.org/10.1116/6.0000070

Thin Films

Manipulation of thin silver film growth on weakly interacting silicon dioxide substrates using oxygen as a surfactant

Nikolaos Pliatsikas; Andreas Jamnig; Martin Konpan; Andreas Delimitis; Gregory Abadias; Kostas Sarakinos

https://doi.org/10.1116/6.0000244

Plasma Science and Technology

Directionally resolved measurements of momentum transport in sputter plumes as a critical test for simulations

Mathis Klette; Manuel Maas; Thomas Trottenberg; Holger Kersten

https://doi.org/10.1116/6.0000109

Thin Films

Slowing DNA translocation through a solid-state nanopore by applying hydrophobic microchannel-guided walls

Jae-Hyun Kang; Kidan Lee; Hyun-Mi Kim; Ki-Bum Kim

https://doi.org/10.1116/6.0000182

Review Articles

Atomic layer deposition of a uniform thin film on two-dimensional transition metal dichalcogenides

Taewook Nam; Seunggi Seo; Hyungjun Kim

https://doi.org/10.1116/6.0000068

Photovoltaics and Energy

Fundamentals, impedance, and performance of solid-state Li-metal microbatteries

John Collins; Joel P. de Souza; Yun Seog Lee; Adele Pacquette; John M. Papalia; Douglas M. Bishop; Teodor Todorov; Mahadevaiyer Krishnan; Eric Joseph; John Rozen; Devendra Sadana

https://doi.org/10.1116/6.0000097

Plasma Science and Technology

Properties of secondary particles for ion beam sputtering of silicon using low-energy oxygen ions

Kyunghwan Oh; Dmitry Kalanov; André Anders; Carsten Bundesmann

https://doi.org/10.1116/6.0000037

Thin Films

Nb-doped TiO₂ coatings developed by high power impulse magnetron sputtering-chemical vapor deposition hybrid deposition process

Justyna Kulczyk-Malecka; David Donaghy; Brice Delfour-Peyrethon; Matthew Werner; Paul R. Chalker; James W. Bradley; Peter J. Kelly

https://doi.org/10.1116/6.0000118

Thin Films

Bixbyite-Ta₂N₂O film prepared by HiPIMS and postdeposition annealing: Structure and properties

J. Čapek; Š. Batková; M. Matas; Š. Kos; T. Kozák; S. Haviar; J. Houška; J. Schusser; J. Minár; F. Dvořák; P. Zeman

https://doi.org/10.1116/6.0000066

Plasma Science and Technology

Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength

Nils Brenning; Alexandre Butler; Hamidreza Hajihoseini; Martin Rudolph; Michael A. Raadu; Jon Tomas Gudmundsson; Tiberiu Minea; Daniel Lundin

https://doi.org/10.1116/6.0000079

Plasma Science and Technology

Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering

Hamidreza Hajihoseini; Martin Čada; Zdenek Hubička; Selen Ünaldi; Michael A. Raadu; Nils Brenning; Jon Tomas Gudmundsson; Daniel Lundin

https://doi.org/10.1116/1.5145292

Thin Films

Epitaxial metals for interconnects beyond Cu

Katayun Barmak; Sameer Ezzat; Ryan Gusley; Atharv Jog; Sit Kerdsongpanya; Asim Khaniya; Erik Milosevic; William Richardson; Kadir Sentosun; Amirali Zangiabadi; Daniel Gall; William E. Kaden; Eduardo R. Mucciolo; Patrick K. Schelling; Alan C. West; Kevin R. Coffey

https://doi.org/10.1116/6.0000018

Review Articles