55 Years of Metalorganic Chemical Vapor Deposition (MOCVD)

Metal organic chemical vapor deposition (MOCVD) and related techniques are a mainstay of semiconductor synthesis, spanning arsenides, anitmonides, nitrides, and complex device stacks. More recently, MOCVD has been used to create novel materials including two-dimensional materials, oxides, and chalcogenides. This special collection includes but is not limited to papers on materials synthesis by MOCVD and related techniques, MOCVD-enabled devices such as LEDs or solar cells, heterogeneous integration that includes MOCVD-grown materials, and advances in MOCVD and related technologies. See the companion collection on JVST B here.

Image credit: Laurent Souqui, Hans Högberg, and Henrik Pedersen, JVST A 41 (6), 10.1116/6.0003001, (2023).

Guest Editors:
Necmi Biyikli, University of Connecticut
Mona Ebrish, Vanderbilt University
Sriram Krishnamoorthy, University of California, Santa Barbara
Xiuling Li, University of Texas
Okhyun Nam, Technical University of Korea
Hongping Zhao, The Ohio State University

Editors:
Stephanie Law, Pennsylvania State University
Joshua Zide, University of Delaware