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Area Selective Deposition
This collection features recent discoveries in fundamentals of Area Selective Deposition (ASD) as well as advances in its technological applications. Topics covered include but are not limited to: mechanisms of thin film nucleation and growth, controllable activation and/or suppression of nucleation, selective patterning using organic layers or resists, defect formation and mitigation, combinations of deposition with selective etching, surface characterization with emphasis on defects, metrology for area-selective deposition, and all applications of ASD.
Editors:
- Eray Aydil, New York University
- Erwin Kessels, Eindhoven University of Technology
Guest Editors:
- John Ekerdt, University of Texas at Austin
- Rong Chen, Huazhong University of Science and Technology
Image Credit: J. Li, I. Tezsevin, M. J. M. Merkx, J. F. W. Maas, W. M. M. Kessels, T. E. Sandoval, and A. J. M. Mackus, JVST A 40, 062409 (2022).