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Area Selective Deposition
This collection features recent discoveries in fundamentals of Area Selective Deposition (ASD) as well as advances in its technological applications. Topics covered include but are not limited to: mechanisms of thin film nucleation and growth, controllable activation and/or suppression of nucleation, selective patterning using organic layers or resists, defect formation and mitigation, combinations of deposition with selective etching, surface characterization with emphasis on defects, metrology for area-selective deposition, and all applications of ASD.
Editors:
- Eray Aydil, New York University
- Erwin Kessels, Eindhoven University of Technology
Guest Editors:
- John Ekerdt, University of Texas at Austin
- Rong Chen, Huazhong University of Science and Technology
Image Credit: J. Li, I. Tezsevin, M. J. M. Merkx, J. F. W. Maas, W. M. M. Kessels, T. E. Sandoval, and A. J. M. Mackus, JVST A 40, 062409 (2022).
Atomic Layer Deposition (ALD)
Jake Soares; Wesley Jen; John D. Hues; Drew Lysne; Jesse Wensel; Steven M. Hues; Elton Graugnard
Thin Films
Kinsey L. Canova; Laurent Souqui; Gregory S. Girolami; John R. Abelson
Atomic Layer Deposition (ALD)
Kaat Van Dongen; Rachel A. Nye; Jan-Willem J. Clerix; Claudia Sixt; Danilo De Simone; Annelies Delabie
Review Articles
Laurenz Thyen; Daniel Splith; Max Kneiß; Marius Grundmann; Holger von Wenckstern
Atomic Layer Deposition (ALD)
Raphaël Feougier; Chloe Guerin; Vincent Jousseaume
Atomic Layer Deposition (ALD)
Yuxiao Lan; Yanwei Wen; Yicheng Li; Jiaqiang Yang; Kun Cao; Bin Shan; Rong Chen
Atomic Layer Deposition (ALD)
Kartik Sondhi; Rahul Sharangpani; Ramy Nashed Bassely Said; Joyeeta Nag; Michael Gribelyuk; Senaka Kanakamedala; Raghuveer S. Makala
Atomic Layer Deposition (ALD)
J. Li; I. Tezsevin; M. J. M. Merkx; J. F. W. Maas; W. M. M. Kessels; T. E. Sandoval; A. J. M. Mackus
Thin Films
Jung-Sik Kim; Hwan Oh; Gregory N. Parsons