Atomic Layer Etching (ALE)

Each year, in concert with the annual Atomic Layer Etching (ALE) workshop, the Journal of Vacuum Science and Technology A publishes a collection of articles covering the most recent developments and experimental studies in ALE. This ALE Special Topic Collection includes papers presented at the ALE 2021 workshop held virtually on June 27-30, 2021, as well as other ALE research articles that were not presented at the workshop but were submitted to the call for the special collection. The Collection features articles dedicated to the science and technology of atomic layer controlled etching.

Image Credit: Yebin Lee, Yongjae Kim, Jiwon Son, and Heeyeop Chae, JVST A 40(2), 10.1116/6.0001603 (2022).