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Atomic Layer Etching (ALE)

Each year, the Journal of Vacuum Science and Technology A publishes a collection of articles covering the most recent developments and experimental studies in ALE. The Collection features articles dedicated to the science and technology of atomic layer etching.

Image Credit: Xifeng Wang, Mingmei Wang, Peter Biolsi, and Mark J. Kushner, JVST A 39 (3), 10.1116/6.0000941, (2021).

Plasma Science and Technology

Scaling of atomic layer etching of SiO₂ in fluorocarbon plasmas: Transient etching and surface roughness

Xifeng Wang; Mingmei Wang; Peter Biolsi; Mark J. Kushner

https://doi.org/10.1116/6.0000941

Review Articles

Thermal atomic layer etching: A review

Andreas Fischer; Aaron Routzahn; Steven M. George; Thorsten Lill

https://doi.org/10.1116/6.0000894

Atomic Layer Etching (ALE)

In silico design of a thermal atomic layer etch process of cobalt

Suresh Kondati Natarajan; Michael Nolan; Patrick Theofanis; Charles Mokhtarzadeh; Scott B. Clendenning

https://doi.org/10.1116/6.0000804

Atomic Layer Etching (ALE)

Thermal atomic layer etching of germanium-rich SiGe using an oxidation and “conversion-etch” mechanism

Aziz I. Abdulagatov; Varun Sharma; Jessica A. Murdzek; Andrew S. Cavanagh; Steven M. George

https://doi.org/10.1116/6.0000834

Atomic Layer Etching (ALE)

Atomic layer etching of GaN using Cl₂ and He or Ar plasma

Simon Ruel; Patricia Pimenta-Barros; Frédéric Le Roux; Nicolas Chauvet; Michel Massardier; Philippe Thoueille; Shirley Tan; Daniel Shin; François Gaucher; Nicolas Posseme

https://doi.org/10.1116/6.0000830

Atomic Layer Etching (ALE)