2019 Special Collection on Atomic Layer Etching (ALE)

Each year, in concert with the annual Atomic Layer Etching (ALE) Workshop, the Journal of Vacuum Science and Technology A, publishes a group of papers covering the most recent developments and experimental studies in ALE. This ALE Special Topic Collection was planned in collaboration with ALD 2018 and the ALE 2018 Workshop held in Incheon, South Korea from July 29–August 1, 2018. The Collection features articles dedicated to the science and technology of atomic layer controlled etching. Articles in this Collection include papers originating from talks presented at ALE 2018 Workshop as well as other ALE research articles that were not presented at this workshop.

Image Credit: Mahsa Konh, Chuan He, Xi Lin, Xiangyu Guo, Venkateswara Pallem, Robert L. Opila, Andrew V. Teplyakov, Zijian Wang, and Bo Yuan, Journal of Vacuum Science & Technology A 37, 021004 (2019); [2]https://doi.org/10.1116/1.5082187