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2018 Special Collection on Atomic Layer Etching (ALE)

Each year, in concert with the annual Atomic Layer Etching (ALE) Workshop, held jointly with the ALD Meeting, the Journal of Vacuum Science and Technology A, publishes a papers covering the most recent developments and research in ALE. This ALE Special Topic Collection includes ALE papers published in 2018. Papers are from ALE 2017 Workshop held in Denver, CO, July 15-18, 2017 and some (those published in 2018) are from ALE 2018 Workshop held in Incheon, South Korea from July 29 – August 1, 2018. The Collection features articles dedicated to the science and technology of atomic layer etching.

Special Collection Image
Chad M. Huard; Saravanapriyan Sriraman; Alex Paterson; Mark J. Kushner
Xi Lin; Meixi Chen; Anderson Janotti; Robert Opila
Kyongbeom Koh; Yongjae Kim; Chang-Koo Kim; Heeyeop Chae
Ivan L. Berry; Keren J. Kanarik; Thorsten Lill; Samantha Tan; Vahid Vahedi; Richard A. Gottscho
Woo-Hee Kim; Dougyong Sung; Sejin Oh; Jehun Woo; Seungkyu Lim; Hyunju Lee; Stacey F. Bent
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