Atomic Layer Deposition (ALD)
Each year, in concert with the annual AVS International Conference on Atomic Layer Deposition (ALD), the Journal of Vacuum Science and Technology A publishes a collection of articles covering the most recent developments and experimental studies in ALD. The collection includes papers presented at the ALD 2022 meeting held on June 26-29, 2022 in Ghent, Belgium, as well as other ALD research articles that were not presented at the conference but were submitted to the collection. The collection features articles dedicated to the science and technology of atomic layer controlled deposition.
Image credit: Zecheng Wu, Yu Zhang, Shiqiang Lu, Rongxu Bai, Na Gao, Kai Huang, Hao Zhu, Shen Hu, Qingqing Sun, David Wei Zhang, Xingwei Ding, Jack C. Lee, and Li Ji, JVST A 40, 042402 (2022).