Skip Nav Destination
Atomic Layer Deposition (ALD)
Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting, the Journal of Vacuum Science and Technology A publishes a collection of articles covering the most recent developments and experimental studies in ALD. This ALD Special Topic Collection includes papers presented at the ALD 2021 conferences held virtually on June 27-30, 2021, as well as other ALD research articles that were not presented at the conference but were submitted to the call for the special collection. The Collection features articles dedicated to the science and technology of atomic layer controlled deposition.
Image credit: Antony Premkumar Peter et al., JVST A 39(4), 10.1116/6.0000821 (2021).

Atomic Layer Deposition (ALD)
Woo-Jae Lee; Ohhun Kwon; Renjing Huang; Chao Lin; Raymond J. Gorte; John M. Vohs
10.1116/6.0001679
Atomic Layer Deposition (ALD)
Kazuki Yoshida; Issei Nagata; Kentaro Saito; Masanori Miura; Kensaku Kanomata; Bashir Ahmmad; Shigeru Kubota; Fumihiko Hirose
10.1116/6.0001622
Atomic Layer Deposition (ALD)
Atilla C. Varga; Seán T. Barry
10.1116/6.0001595
Atomic Layer Deposition (ALD)
Su Min Hwang; Harrison Sejoon Kim; Dan N. Le; Akshay Sahota; Jaebeom Lee; Yong Chan Jung; Sang Woo Kim; Si Joon Kim; Rino Choi; Jinho Ahn; Byung Keun Hwang; Xiaobing Zhou; Jiyoung Kim
10.1116/6.0001519
Atomic Layer Deposition (ALD)
Beibei Ge; Daisuke Ohori; Yi-Ho Chen; Takuya Ozaki; Kazuhiko Endo; Yiming Li; Jenn-Hwan Tarng; Seiji Samukawa
10.1116/6.0001607
Atomic Layer Deposition (ALD)
Nese Gungor; Mustafa Alevli
10.1116/6.0001498
Atomic Layer Deposition (ALD)
Pauline Dill; Xiang Ren; Helen Hintersatz; Mathias Franz; Doreen Dentel; Christoph Tegenkamp; Susann Ebert
10.1116/6.0001514
Atomic Layer Deposition (ALD)
Elisa Atosuo; Kenichiro Mizohata; Miika Mattinen; Miia Mäntymäki; Marko Vehkamäki; Markku Leskelä; Mikko Ritala
10.1116/6.0001629
Atomic Layer Deposition (ALD)
Heta-Elisa Nieminen; Mikko Ritala
10.1116/6.0001624
Atomic Layer Deposition (ALD)
Ayush Arunachalam; S. Novia Berriel; Corbin Feit; Udit Kumar; Sudipta Seal; Kanad Basu; Parag Banerjee
10.1116/6.0001482
Atomic Layer Deposition (ALD)
Daniel C. Messina; Brianna S. Eller; Paul A. Scowen; Robert J. Nemanich
10.1116/6.0001468
Atomic Layer Deposition (ALD)
Toshihide Nabatame; Erika Maeda; Mari Inoue; Masafumi Hirose; Yoshihiro Irokawa; Akihiko Ohi; Naoki Ikeda; Takashi Onaya; Koji Shiozaki; Ryota Ochi; Tamotsu Hashizume; Yasuo Koide
10.1116/6.0001334
Atomic Layer Deposition (ALD)
Angel Yanguas-Gil; Joseph A. Libera; Jeffrey W. Elam
10.1116/6.0001212
Atomic Layer Deposition (ALD)
Harm C. M. Knoops; Karsten Arts; Jan W. Buiter; Luca Matteo Martini; Richard Engeln; Dilini Tania Hemakumara; Michael Powell; Wilhelmus M. M. (Erwin) Kessels; Chris J. Hodson; Aileen O’Mahony
10.1116/6.0001318
Atomic Layer Deposition (ALD)
Andreas Werbrouck; Kevin Van de Kerckhove; Diederik Depla; Dirk Poelman; Philippe F. Smet; Jolien Dendooven; Christophe Detavernier
10.1116/6.0001094
Atomic Layer Deposition (ALD)
Ka-Te Chen; Chia-Hsun Hsu; Fang-Bin Ren; Can Wang; Peng Gao; Wan-Yu Wu; Shui-Yang Lien; Wen-Zhang Zhu
10.1116/6.0001191
Atomic Layer Deposition (ALD)
Hanno Kröncke; Florian Maudet; Sourish Banerjee; Jürgen Albert; Sven Wiesner; Veeresh Deshpande; Catherine Dubourdieu
10.1116/6.0001207
Atomic Layer Deposition (ALD)
Yi Li; Mark D. Losego
10.1116/6.0001198
Thin Films
Md. Istiaque Chowdhury; Mark Sowa; Kylie E. Van Meter; Tomas F. Babuska; Tomas Grejtak; Alexander C. Kozen; Brandon A. Krick; Nicholas C. Strandwitz
10.1116/6.0001175
Atomic Layer Deposition (ALD)
Pauline Dill; Florian Pachel; Christian Militzer; Alexander Held; Georg Puchas; Stefan Knohl; Walter Krenkel; Christoph Tegenkamp; Werner Andreas Goedel
10.1116/6.0001193