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Atomic Layer Deposition (ALD)

Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting, the Journal of Vacuum Science and Technology A publishes a collection of articles covering the most recent developments and experimental studies in ALD. This ALD Special Topic Collection includes papers presented at the ALD 2021 conferences held virtually on June 27-30, 2021, as well as other ALD research articles that were not presented at the conference but were submitted to the call for the special collection. The Collection features articles dedicated to the science and technology of atomic layer controlled deposition.

Image credit: Antony Premkumar Peter et al., JVST A 39(4), 10.1116/6.0000821 (2021).

Flexible atomic layer deposition system for coating porous materials

Woo-Jae Lee; Ohhun Kwon; Renjing Huang; Chao Lin; Raymond J. Gorte; John M. Vohs

https://doi.org/10.1116/6.0001679

Atomic Layer Deposition (ALD)

Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon

Kazuki Yoshida; Issei Nagata; Kentaro Saito; Masanori Miura; Kensaku Kanomata; Bashir Ahmmad; Shigeru Kubota; Fumihiko Hirose

https://doi.org/10.1116/6.0001622

Atomic Layer Deposition (ALD)

Modified 3D-printed architectures: Effects of coating by alumina on acrylonitrile butadiene styrene

Atilla C. Varga; Seán T. Barry

https://doi.org/10.1116/6.0001595

Atomic Layer Deposition (ALD)

High wet-etch resistance SiO₂ films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane

Su Min Hwang; Harrison Sejoon Kim; Dan N. Le; Akshay Sahota; Jaebeom Lee; Yong Chan Jung; Sang Woo Kim; Si Joon Kim; Rino Choi; Jinho Ahn; Byung Keun Hwang; Xiaobing Zhou; Jiyoung Kim

https://doi.org/10.1116/6.0001519

Atomic Layer Deposition (ALD)

Room-temperature and high-quality HfO₂/SiO₂ gate stacked film grown by neutral beam enhanced atomic layer deposition

Beibei Ge; Daisuke Ohori; Yi-Ho Chen; Takuya Ozaki; Kazuhiko Endo; Yiming Li; Jenn-Hwan Tarng; Seiji Samukawa

https://doi.org/10.1116/6.0001607

Atomic Layer Deposition (ALD)

Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition

Nese Gungor; Mustafa Alevli

https://doi.org/10.1116/6.0001498

Atomic Layer Deposition (ALD)

Atomic layer deposition of titanium phosphate onto reinforcing fibers using titanium tetrachloride, water, and tris(trimethylsilyl) phosphate as precursors

Pauline Dill; Xiang Ren; Helen Hintersatz; Mathias Franz; Doreen Dentel; Christoph Tegenkamp; Susann Ebert

https://doi.org/10.1116/6.0001514

Atomic Layer Deposition (ALD)

Atomic layer deposition of GdF₃ thin films

Elisa Atosuo; Kenichiro Mizohata; Miika Mattinen; Miia Mäntymäki; Marko Vehkamäki; Markku Leskelä; Mikko Ritala

https://doi.org/10.1116/6.0001629

Atomic Layer Deposition (ALD)

Reaction mechanism studies on atomic layer deposition process of AlF₃

Heta-Elisa Nieminen; Mikko Ritala

https://doi.org/10.1116/6.0001624

Atomic Layer Deposition (ALD)

Machine learning approach to thickness prediction from in situ spectroscopic ellipsometry data for atomic layer deposition processes

Ayush Arunachalam; S. Novia Berriel; Corbin Feit; Udit Kumar; Sudipta Seal; Kanad Basu; Parag Banerjee

https://doi.org/10.1116/6.0001482

Atomic Layer Deposition (ALD)

Comparison of AlF₃ thin films grown by thermal and plasma enhanced atomic layer deposition

Daniel C. Messina; Brianna S. Eller; Paul A. Scowen; Robert J. Nemanich

https://doi.org/10.1116/6.0001468

Atomic Layer Deposition (ALD)

Influence of HfO₂ and SiO₂ interfacial layers on the characteristics of n-GaN/HfSiO_x capacitors using plasma-enhanced atomic layer deposition

Toshihide Nabatame; Erika Maeda; Mari Inoue; Masafumi Hirose; Yoshihiro Irokawa; Akihiko Ohi; Naoki Ikeda; Takashi Onaya; Koji Shiozaki; Ryota Ochi; Tamotsu Hashizume; Yasuo Koide

https://doi.org/10.1116/6.0001334

Atomic Layer Deposition (ALD)

Reactor scale simulations of ALD and ALE: Ideal and non-ideal self-limited processes in a cylindrical and a 300 mm wafer cross-flow reactor

Angel Yanguas-Gil; Joseph A. Libera; Jeffrey W. Elam

https://doi.org/10.1116/6.0001212

Atomic Layer Deposition (ALD)

Innovative remote plasma source for atomic layer deposition for GaN devices

Harm C. M. Knoops; Karsten Arts; Jan W. Buiter; Luca Matteo Martini; Richard Engeln; Dilini Tania Hemakumara; Michael Powell; Wilhelmus M. M. (Erwin) Kessels; Chris J. Hodson; Aileen O’Mahony

https://doi.org/10.1116/6.0001318

Atomic Layer Deposition (ALD)

Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth

Andreas Werbrouck; Kevin Van de Kerckhove; Diederik Depla; Dirk Poelman; Philippe F. Smet; Jolien Dendooven; Christophe Detavernier

https://doi.org/10.1116/6.0001094

Atomic Layer Deposition (ALD)

Influence of annealing temperature of nickel oxide as hole transport layer applied for inverted perovskite solar cells

Ka-Te Chen; Chia-Hsun Hsu; Fang-Bin Ren; Can Wang; Peng Gao; Wan-Yu Wu; Shui-Yang Lien; Wen-Zhang Zhu

https://doi.org/10.1116/6.0001191

Atomic Layer Deposition (ALD)

Effect of O₂ plasma exposure time during atomic layer deposition of amorphous gallium oxide

Hanno Kröncke; Florian Maudet; Sourish Banerjee; Jürgen Albert; Sven Wiesner; Veeresh Deshpande; Catherine Dubourdieu

https://doi.org/10.1116/6.0001207

Atomic Layer Deposition (ALD)

Impact of trimethylaluminum exposure time on the mechanical properties of single-cycle atomic layer deposition modified cellulosic nanopaper

Yi Li; Mark D. Losego

https://doi.org/10.1116/6.0001198

Atomic Layer Deposition (ALD)

Atomic layer deposition onto fabrics of carbon and silicon carbide fibers: Preparation of multilayers comprising alumina, titania-furfuryl alcohol hybrid, and titanium phosphate

Pauline Dill; Florian Pachel; Christian Militzer; Alexander Held; Georg Puchas; Stefan Knohl; Walter Krenkel; Christoph Tegenkamp; Werner Andreas Goedel

https://doi.org/10.1116/6.0001193

Thin Films