Skip Nav Destination

2019 Special Collection on Atomic Layer Deposition (ALD)

Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting, the Journal of Vacuum Science and Technology A, publishes a large group of papers covering the most recent developments and experimental studies in ALD. This ALD Special Topic Collection was planned in collaboration with ALD 2018 and the ALE 2018 Workshop held in Incheon, South Korea from July 29–August 1, 2018. The Collection features articles dedicated to the science and technology of atomic layer controlled deposition. Articles in this Collection include papers originating from talks presented at ALD 2018 as well as other ALD research articles that were not presented at this conference.

Image credit: Jeffrey M. Woodward, Samantha G. Rosenberg, Alexander C. Kozen, Neeraj Nepal, Scooter D. Johnson, Christa Wagenbach, Andrew H. Rowley, Zachary R. Robinson, Howie Joress, Karl F. Ludwig Jr., and Charles R. Eddy Jr., Journal of Vacuum Science & Technology A 37, 030901 (2019); [2]

Atomic Layer Deposition (ALD)

Quartz crystal microbalance study of precursor diffusion during molecular layer deposition using cyclic azasilane, maleic anhydride, and water

Ling Ju; Vamseedhara Vemuri; Nicholas C. Strandwitz

10.1116/1.5093509

LETTERS

Sticking probabilities of H₂O and Al(CH₃)₃ during atomic layer deposition of Al₂O₃ extracted from their impact on film conformality

Karsten Arts; Vincent Vandalon; Riikka L. Puurunen; Mikko Utriainen; Feng Gao; Wilhelmus M. M. (Erwin) Kessels; Harm C. M. Knoops

10.1116/1.5093620

Atomic Layer Deposition (ALD)

Formation of defects and impurities in MoS_x and their effect on electronic properties

Yifan Nie; Ravi Agarwal; Sumeet C. Pandey; Gurtej S. Sandhu

10.1116/1.5090237

Atomic Layer Deposition (ALD)

Growth characteristics of ZnO thin films produced via catalytic reaction-assisted chemical vapor deposition

Taro Saito; Ryuta Iba; Shotaro Ono; Go Imada; Kanji Yasui

10.1116/1.5079526

Atomic Layer Deposition (ALD)

Evaluation of grating realized via pulse current electroplating combined with atomic layer deposition as an x-ray grating interferometer

Tae-Eun Song; Seho Lee; Hee Han; Soonyoung Jung; Soo-Hyun Kim; Min Jun Kim; Seung Wook Lee; Chi Won Ahn

10.1116/1.5080954

Review Articles

Status and prospects of plasma-assisted atomic layer deposition

Harm C. M. Knoops; Tahsin Faraz; Karsten Arts; Wilhelmus M. M. (Erwin) Kessels

10.1116/1.5088582

Atomic Layer Deposition (ALD)

Influence of temperature on atomic layer epitaxial growth of indium nitride assessed with in situ grazing incidence small-angle x-ray scattering

Jeffrey M. Woodward; Samantha G. Rosenberg; Alexander C. Kozen; Neeraj Nepal; Scooter D. Johnson; Christa Wagenbach; Andrew H. Rowley; Zachary R. Robinson; Howie Joress; Karl F. Ludwig, Jr.; Charles R. Eddy, Jr.

10.1116/1.5081919

Atomic Layer Deposition (ALD)

Studies on solid state reactions of atomic layer deposited thin films of lithium carbonate with hafnia and zirconia

Miia Mäntymäki; Elisa Atosuo; Mikko J. Heikkilä; Marko Vehkamäki; Miika Mattinen; Kenichiro Mizohata; Jyrki Räisänen; Mikko Ritala; Markku Leskelä

10.1116/1.5081494

Atomic Layer Deposition (ALD)

In situ studies of low temperature atomic level processing of GaN surfaces for atomic layer epitaxial growth

Samantha G. Rosenberg; Christa Wagenbach; Virginia R. Anderson; Scooter D. Johnson; Neeraj Nepal; Alexander C. Kozen; Jeffrey M. Woodward; Zachary R. Robinson; Max Munger; Howie Joress; Karl F. Ludwig, Jr.; Charles R. Eddy, Jr.

10.1116/1.5080380

Atomic Layer Deposition (ALD)