2019 Special Collection on Atomic Layer Deposition (ALD)
Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting, the Journal of Vacuum Science and Technology A, publishes a large group of papers covering the most recent developments and experimental studies in ALD. This ALD Special Topic Collection was planned in collaboration with ALD 2018 and the ALE 2018 Workshop held in Incheon, South Korea from July 29–August 1, 2018. The Collection features articles dedicated to the science and technology of atomic layer controlled deposition. Articles in this Collection include papers originating from talks presented at ALD 2018 as well as other ALD research articles that were not presented at this conference.
Image credit: Jeffrey M. Woodward, Samantha G. Rosenberg, Alexander C. Kozen, Neeraj Nepal, Scooter D. Johnson, Christa Wagenbach, Andrew H. Rowley, Zachary R. Robinson, Howie Joress, Karl F. Ludwig Jr., and Charles R. Eddy Jr., Journal of Vacuum Science & Technology A 37, 030901 (2019); [2]
