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2018 Special Collection on Atomic Layer Deposition (ALD)

Each year, in concert with the annual Atomic Layer Deposition (ALD) meeting, the Journal of Vacuum Science and Technology A, publishes a large group of papers covering the most recent developments and research in ALD. This ALD Special Topic Collection includes ALD papers published in 2018. Papers are from ALD 2017 held in Denver, CO, July 15-18, 2017 and some (those published in 2018) are from ALD 2018 held in Incheon, South Korea from July 29 – August 1, 2018. The Collection features articles dedicated to the science and technology of atomic layer controlled deposition.

Special Issue on Atomic Layer Deposition (ALD)

Thermal atomic layer deposition of Sn metal using SnCl₄ and a vapor phase silyl dihydropyrazine reducing agent

Eric C. Stevens; Moataz Bellah M. Mousa; Gregory N. Parsons

https://doi.org/10.1116/1.5055212

Special Issue on Atomic Layer Deposition (ALD)

Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition

Igor Krylov; Xianbin Xu; Ekaterina Zoubenko; Kamira Weinfeld; Santiago Boyeras; Felix Palumbo; Moshe Eizenberg; Dan Ritter

https://doi.org/10.1116/1.5057761

Special Issue on Atomic Layer Deposition (ALD)

Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition

Shinya Iwashita; Tsuyoshi Moriya; Akira Uedono

https://doi.org/10.1116/1.5043309

Special Issue on Atomic Layer Deposition (ALD)

Plasma-enhanced atomic layer deposition of titanium vanadium nitride

Mark J. Sowa; Ling Ju; Alexander C. Kozen; Nicholas C. Strandwitz; Guosong Zeng; Tomas F. Babuska; Zakaria Hsain; Brandon A. Krick

https://doi.org/10.1116/1.5037463

Special Issue on Atomic Layer Deposition (ALD)

Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgO

Violeta Prodanovic´; Hong Wah Chan; Anil U. Mane; Jeffrey W. Elam; Matthias M. Minjauw; Christophe Detavernier; Harry van der Graaf; Pasqualina M. Sarro

https://doi.org/10.1116/1.5040813

Special Issue on Atomic Layer Deposition (ALD)

Atomic layer deposition of Al₂O₃ and TiO₂ on MoS₂ surfaces

Jaron A. Kropp; Yuhang Cai; Zihan Yao; Wenjuan Zhu; Theodosia Gougousi

https://doi.org/10.1116/1.5043621

Thin Films

Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

Perttu Sippola; Alexander Pyymaki Perros; Oili M. E. Ylivaara; Helena Ronkainen; Jaakko Julin; Xuwen Liu; Timo Sajavaara; Jarkko Etula; Harri Lipsanen; Riikka L. Puurunen

https://doi.org/10.1116/1.5038856

Special Issue on Atomic Layer Deposition (ALD)

Tribological properties of thin films made by atomic layer deposition sliding against silicon

Lauri Kilpi; Oili M. E. Ylivaara; Antti Vaajoki; Xuwen Liu; Ville Rontu; Sakari Sintonen; Eero Haimi; Jari Malm; Markus Bosund; Marko Tuominen; Timo Sajavaara; Harri Lipsanen; Simo-Pekka Hannula; Riikka L. Puurunen; Helena Ronkainen

https://doi.org/10.1116/1.5003729

Special Issue on Atomic Layer Deposition (ALD)

Spatial atomic layer deposition for coating flexible porous Li-ion battery electrodes

Alexander S. Yersak; Kashish Sharma; Jasmine M. Wallas; Arrelaine A. Dameron; Xuemin Li; Yongan Yang; Katherine E. Hurst; Chunmei Ban; Robert C. Tenent; Steven M. George

https://doi.org/10.1116/1.5006670

Special Issue on Atomic Layer Deposition (ALD)

Atomically dispersed vanadium oxides on multiwalled carbon nanotubes via atomic layer deposition: A multiparameter optimization

Pascal Düngen; Mark Greiner; Karl-Heinz Böhm; Ioannis Spanos; Xing Huang; Alexander A. Auer; Robert Schlögl; Saskia Heumann

https://doi.org/10.1116/1.5006783

Special Issue on Atomic Layer Deposition (ALD)

Atomic layer deposition frequency-multiplied Fresnel zone plates for hard x-rays focusing

Nicolaie Moldovan; Ralu Divan; Hongjun Zeng; Leonidas E. Ocola; Vincent De Andrade; Michael Wojcik

https://doi.org/10.1116/1.5003412

Special Issue on Atomic Layer Deposition (ALD)

Atomic layer deposition of molybdenum disulfide films using MoF₆ and H₂S

Anil U. Mane; Steven Letourneau; David J. Mandia; Jian Liu; Joseph A. Libera; Yu Lei; Qing Peng; Elton Graugnard; Jeffrey W. Elam

https://doi.org/10.1116/1.5003423

Special Issue on Atomic Layer Deposition (ALD)

Influence of the atomic layer deposition temperature on the structural and electrical properties of Al/Al₂O₃/p-Ge MOS structures

Martha A. Botzakaki; George Skoulatakis; Nikolaos Xanthopoulos; Violetta Gianneta; Anastasios Travlos; Stella Kennou; Spyridon Ladas; Christos Tsamis; Eleni Makarona; Stavroula N. Georga; Christoforos A. Krontiras

https://doi.org/10.1116/1.5003375

Special Issue on Atomic Layer Deposition (ALD)

Growth behavior and structural analysis of atomic layer deposited Sn_xTi_1−xO_y films

Siliang Chang; Christos G. Takoudis

https://doi.org/10.1116/1.5004993

Special Issue on Atomic Layer Deposition (ALD)

Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel

Jae-Min Park; Seongyoon Kim; June Hwang; Won Seok Han; Wonyong Koh; Won-Jun Lee

https://doi.org/10.1116/1.5003388

Special Issue on Atomic Layer Deposition (ALD)

Electron-enhanced atomic layer deposition of silicon thin films at room temperature

Jaclyn K. Sprenger; Huaxing Sun; Andrew S. Cavanagh; Steven M. George

https://doi.org/10.1116/1.5006696

Special Issue on Atomic Layer Deposition (ALD)

Spatial molecular layer deposition of polyamide thin films on flexible polymer substrates using a rotating cylinder reactor

Daniel J. Higgs; Jaime W. DuMont; Kashish Sharma; Steven M. George

https://doi.org/10.1116/1.5004041

Special Issue on Atomic Layer Deposition (ALD)

Hydrogen passivation of silicon/silicon oxide interface by atomic layer deposited hafnium oxide and impact of silicon oxide underlayer

Evan Oudot; Mickael Gros-Jean; Kristell Courouble; Francois Bertin; Romain Duru; Névine Rochat; Christophe Vallée

https://doi.org/10.1116/1.4999561

Special Issue on Atomic Layer Deposition (ALD)

Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnO_x as conductive gas diffusion barrier

Lukas Hoffmann; Detlef Theirich; Daniel Schlamm; Tim Hasselmann; Sven Pack; Kai Oliver Brinkmann; Detlef Rogalla; Sven Peters; André Räupke; Hassan Gargouri; Thomas Riedl

https://doi.org/10.1116/1.5006781

Special Issue on Atomic Layer Deposition (ALD)