Skip Nav Destination

Reactive high power impulse magnetron sputtering: Fundamental understanding and applications

The Special Topic Section on reactive HiPIMS, highlights the most recent developments aiming to show the full potential of this technique which is still restricted by a limited understanding of the plasma physics of the pulsed reactive processes.

Guest Editors: Jón Tómas Guðmundsson and Ante Hecimovic

Preface

Preface to Special Topic: Reactive high power impulse magnetron sputtering

A. Hecimovic; J. T. Gudmundsson

https://doi.org/10.1063/1.4979270

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Synthesis of tunable plasmonic metal-ceramic nanocomposite thin films by temporally modulated sputtered fluxes

D. Magnfält; E. Melander; R. D. Boyd; V. Kapaklis; K. Sarakinos

https://doi.org/10.1063/1.4979139

TUTORIALS

Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

André Anders

https://doi.org/10.1063/1.4978350

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

A study of the oxygen dynamics in a reactive Ar/O₂ high power impulse magnetron sputtering discharge using an ionization region model

D. Lundin; J. T. Gudmundsson; N. Brenning; M. A. Raadu; T. M. Minea

https://doi.org/10.1063/1.4977817

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Process- and optoelectronic-control of NiO_x thin films deposited by reactive high power impulse magnetron sputtering

Julien Keraudy; Brice Delfour-Peyrethon; Axel Ferrec; Javier Garcia Molleja; Mireille Richard-Plouet; Christophe Payen; Jonathan Hamon; Benoît Corraze; Antoine Goullet; Pierre-Yves Jouan

https://doi.org/10.1063/1.4978349

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Measurement and modeling of plasma parameters in reactive high-power impulse magnetron sputtering of Ti in Ar/O₂ mixtures

M. Čada; D. Lundin; Z. Hubička

https://doi.org/10.1063/1.4977821

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Enhanced oxidation of TiO₂ films prepared by high power impulse magnetron sputtering running in metallic mode

V. Stranak; J. Kratochvil; J. Olejnicek; P. Ksirova; P. Sezemsky; M. Cada; Z. Hubicka

https://doi.org/10.1063/1.4977825

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Investigation of plasma spokes in reactive high power impulse magnetron sputtering discharge

A. Hecimovic; C. Corbella; C. Maszl; W. Breilmann; A. von Keudell

https://doi.org/10.1063/1.4978348

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Composite targets in HiPIMS plasmas: Correlation of in-vacuum XPS characterization and optical plasma diagnostics

Vincent Layes; Sascha Monje; Carles Corbella; Volker Schulz-von der Gathen; Achim von Keudell; Teresa de los Arcos

https://doi.org/10.1063/1.4977820

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Return of target material ions leads to a reduced hysteresis in reactive high power impulse magnetron sputtering: Experiment

Jiří Čapek; Stanislav Kadlec

https://doi.org/10.1063/1.4977816

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Return of target material ions leads to a reduced hysteresis in reactive high power impulse magnetron sputtering: Model

Stanislav Kadlec; Jiří Čapek

https://doi.org/10.1063/1.4977815

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering

Andrea Dagmar Pajdarová; Jaroslav Vlček; Jiří Rezek

https://doi.org/10.1063/1.4977822

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Evolution of target condition in reactive HiPIMS as a function of duty cycle: An opportunity for refractive index grading

Rajesh Ganesan; Behnam Akhavan; James G. Partridge; Dougal G. McCulloch; David R. McKenzie; Marcela M. M. Bilek

https://doi.org/10.1063/1.4977824

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Unprecedented Al supersaturation in single-phase rock salt structure VAlN films by Al⁺ subplantation

G. Greczynski; S. Mráz; M. Hans; D. Primetzhofer; J. Lu; L. Hultman; J. M. Schneider

https://doi.org/10.1063/1.4977813

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO₂ layers

R. Hippler; Z. Hubicka; M. Cada; P. Ksirova; H. Wulff; C. A. Helm; V. Stranak

https://doi.org/10.1063/1.4977823

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

SiN_x coatings deposited by reactive high power impulse magnetron sputtering: Process parameters influencing the residual coating stress

S. Schmidt; T. Hänninen; J. Wissting; L. Hultman; N. Goebbels; A. Santana; M. Tobler; H. Högberg

https://doi.org/10.1063/1.4977812

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Quantification of the hysteresis and related phenomena in reactive HiPIMS discharges

Nikolay Britun; Stephanos Konstantinidis; Alexandr Belosludtsev; Tiago Silva; Rony Snyders

https://doi.org/10.1063/1.4977819

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Low-temperature growth of dense and hard Ti_0.41Al_0.51Ta_0.08N films via hybrid HIPIMS/DC magnetron co-sputtering with synchronized metal-ion irradiation

H. Fager; O. Tengstrand; J. Lu; S. Bolz; B. Mesic; W. Kölker; Ch. Schiffers; O. Lemmer; J. E. Greene; L. Hultman; I. Petrov; G. Greczynski

https://doi.org/10.1063/1.4977818

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

Evolution of sputtering target surface composition in reactive high power impulse magnetron sputtering

T. Kubart; A. Aijaz

https://doi.org/10.1063/1.4977814

SPECIAL TOPIC: REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING: FUNDAMENTAL UNDERSTANDING AND APPLICATIONS

A global plasma model for reactive deposition of compound films by modulated pulsed power magnetron sputtering discharges

B. C. Zheng; Z. L. Wu; B. Wu; Y. G. Li; M. K. Lei

https://doi.org/10.1063/1.4977471

1 2

Reactive high power impulse magnetron sputtering: Fundamental understanding and applications

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

Reactive high power impulse magnetron sputtering: Fundamental understanding and applications

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

This Feature Is Available To Subscribers Only