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Ultrafast Laser Fabrication Enabled Photonics and Devices

Ultrafast laser micro/nanofabrication and processing have rapidly emerged as one of the most powerful and promising tools in the area of photonic device fabrication. The rich interactions between light and various matters offer new fundamental science and interaction mechanisms, including photopolymerization, laser plasma generation, laser ablation, laser doping, laser thinning and laser coloration. In the meantime, as a cost-effective precision nanofabrication tool, it has also revolutionized various areas of photonics devices, including photovoltaics, lighting, lasing, energy harvesting, biomedicine, optical communications, data storage, quantum computing, display, sensing and so on. This special issue aims at capturing the most exciting advances in the ultrafast laser fabrication field and promoting high impact applications.

Guest Editors: Minghui Hong, Han Lin, and Stephen Mihailov, and APL Photonics Editors Baohua Jia and Paul Westbrook

Special Collection Image
Han Lin; Minghui Hong; Stephen Mihailov
Famei Wang; Mengqiang Zou; Changrui Liao; Bozhe Li; Dejun Liu; Jie Zhou; Haoqiang Huang; Jinlai Zhao; Chao Liu; Paul K. Chu; Yiping Wang
Stephen J. Mihailov
K. Ehrlich; C. A. Ross; R. J. Beck; J. D. Shephard; R. R. Thomson
Jiafeng Lu; Mostafa Hassan; François Courvoisier; Enrique Garcia-Caurel; François Brisset; Razvigor Ossikovski; Xianglong Zeng; Bertrand Poumellec; Matthieu Lancry
Hao Li; Baolai Yang; Meng Wang; Chenhui Gao; Baiyi Wu; Lingfa Zeng; Xiaoming Xi; Zilun Chen; Xiaolin Wang; Zefeng Wang; Jinbao Chen
Masanori Fujiwara; Shunsuke Inoue; Shin-ichiro Masuno; Haining Fu; Shigeki Tokita; Masaki Hashida; Norikazu Mizuochi
Pablo Roldán-Varona; Calum A. Ross; Luis Rodríguez-Cobo; José Miguel López-Higuera; Erin Gaughan; Kevin Dhaliwal; Michael G. Tanner; Robert R. Thomson; Helen E. Parker
A. G. Ciriolo; R. Martínez Vázquez; G. Crippa; M. Devetta; D. Faccialà; P. Barbato; F. Frassetto; M. Negro; F. Bariselli; L. Poletto; V. Tosa; A. Frezzotti; C. Vozzi; R. Osellame; S. Stagira
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