Materials, Metrology, and Modeling for a Future Beyond CMOS Technology

In this special topic, APL Materials is proud to present new advances in materials, devices, and processes that push the boundaries of current complementary-metal-oxide-semiconductor (CMOS) technology. The importance of metrology and computational modeling is also highlighted as playing a key role in advancing the research that is associated with CMOS technology and nanoscale devices.

Guest Editors: G. Andrew Antonelli, Dann Herr and Sean W. King