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Emerging Materials in Antiferromagnetic Spintronics

The use of antiferromagnetic materials constitutes a paradigm shift for the development of new spintronic components, beyond what is possible with the traditional ferromagnetic materials. Antiferromagnetism is described by its order parameter, also known as the Néel vector, which is expressed macroscopically in an indirect manner. This magnetic ordering can give rise to new symmetry breaking, which can have profound impact on electronic structure. Consequently, the physics of antiferromagnetic materials is very rich, sometimes unique and unexpected compared to their ferromagnetic counterparts. This topical issue provides the reader with the latest material developments exploring the cutting-edge fundamental physics and promising applications of antiferromagnetic materials.

Guest Editors: Vincent Baltz, Axel Hoffmann, Satoru Emori, Ding-Fu Shao, and Tomas Jungwirth

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V. Baltz; A. Hoffmann; S. Emori; D.-F. Shao; T. Jungwirth
Lucas Caretta; Can Onur Avci
Helena Reichlova; Dominik Kriegner; Alexander Mook; Matthias Althammer; Andy Thomas
Junyu Tang; Ran Cheng
Hadass S. Inbar; Dai Q. Ho; Shouvik Chatterjee; Aaron N. Engel; Shoaib Khalid; Connor P. Dempsey; Mihir Pendharkar; Yu Hao Chang; Shinichi Nishihaya; Alexei V. Fedorov; Donghui Lu; Makoto Hashimoto; Dan Read; Anderson Janotti; Christopher J. Palmstrøm
Youngmin Lim; Bhuwan Nepal; David A. Smith; Shuang Wu; Abhishek Srivastava; Prabandha Nakarmi; Claudia Mewes; Zijian Jiang; Adbhut Gupta; Dwight D. Viehland; Christoph Klewe; Padraic Shafer; In Jun Park; Timothy Mabe; Vivek P. Amin; Jean J. Heremans; Tim Mewes; Satoru Emori
Kenta Kimura; Tsuyoshi Kimura
Aurore Finco; Vincent Jacques
Teresa Tschirner; Philipp Keßler; Ruben Dario Gonzalez Betancourt; Tommy Kotte; Dominik Kriegner; Bernd Büchner; Joseph Dufouleur; Martin Kamp; Vedran Jovic; Libor Smejkal; Jairo Sinova; Ralph Claessen; Tomas Jungwirth; Simon Moser; Helena Reichlova; Louis Veyrat
M. Scheufele; J. Gückelhorn; M. Opel; A. Kamra; H. Huebl; R. Gross; S. Geprägs; M. Althammer
O. J. Amin; S. Reimers; F. Maccherozzi; S. S. Dhesi; V. Novák; R. P. Campion; K. W. Edmonds; P. Wadley
Ankit Shukla; Siyuan Qian; Shaloo Rakheja
L. Hu; X. B. Zhu; Y. P. Sun
Jinsong Xu; Weiwei Lin; Jiaming He; J.-S. Zhou; Danru Qu; Ssu-Yen Huang; C. L. Chien
San Ko; Jungjae Park; Hyunjin Kim; Jungmin Park; Ah-Yeon Lee; Jong Min Yuk; Albert Min Gyu Park; Kab-Jin Kim
Mingxing Wu; Kouta Kondou; Yoshinobu Nakatani; Taishi Chen; Hironari Isshiki; Tomoya Higo; Satoru Nakatsuji; Yoshichika Otani
Chao Zhou; Jia Xu; Tong Wu; Yizheng Wu
N. Biniskos; F. J. dos Santos; M. dos Santos Dias; S. Raymond; K. Schmalzl; P. Steffens; J. Persson; N. Marzari; S. Blügel; S. Lounis; T. Brückel
Teng Xu; Hao Bai; Yiqing Dong; Le Zhao; Heng-An Zhou; Junwei Zhang; Xi-Xiang Zhang; Wanjun Jiang
Rui-Chun Xiao; Y. J. Jin; Hua Jiang
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