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Emerging Materials in Antiferromagnetic Spintronics

The use of antiferromagnetic materials constitutes a paradigm shift for the development of new spintronic components, beyond what is possible with the traditional ferromagnetic materials. Antiferromagnetism is described by its order parameter, also known as the Néel vector, which is expressed macroscopically in an indirect manner. This magnetic ordering can give rise to new symmetry breaking, which can have profound impact on electronic structure. Consequently, the physics of antiferromagnetic materials is very rich, sometimes unique and unexpected compared to their ferromagnetic counterparts. This topical issue provides the reader with the latest material developments exploring the cutting-edge fundamental physics and promising applications of antiferromagnetic materials.

Guest Editors: Vincent Baltz, Axel Hoffmann, Satoru Emori, Ding-Fu Shao, and Tomas Jungwirth

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M. Scheufele; J. Gückelhorn; M. Opel; A. Kamra; H. Huebl; R. Gross; S. Geprägs; M. Althammer
10.1063/5.0160304
O. J. Amin; S. Reimers; F. Maccherozzi; S. S. Dhesi; V. Novák; R. P. Campion; K. W. Edmonds; P. Wadley
10.1063/5.0156508
Ankit Shukla; Siyuan Qian; Shaloo Rakheja
10.1063/5.0158164
L. Hu; X. B. Zhu; Y. P. Sun
10.1063/5.0164952
San Ko; Jungjae Park; Hyunjin Kim; Jungmin Park; Ah-Yeon Lee; Jong Min Yuk; Albert Min Gyu Park; Kab-Jin Kim
10.1063/5.0160193
Mingxing Wu; Kouta Kondou; Yoshinobu Nakatani; Taishi Chen; Hironari Isshiki; Tomoya Higo; Satoru Nakatsuji; Yoshichika Otani
10.1063/5.0156191
Chao Zhou; Jia Xu; Tong Wu; Yizheng Wu
10.1063/5.0156439
N. Biniskos; F. J. dos Santos; M. dos Santos Dias; S. Raymond; K. Schmalzl; P. Steffens; J. Persson; N. Marzari; S. Blügel; S. Lounis; T. Brückel
10.1063/5.0156028
Teng Xu; Hao Bai; Yiqing Dong; Le Zhao; Heng-An Zhou; Junwei Zhang; Xi-Xiang Zhang; Wanjun Jiang
10.1063/5.0156266
Rui-Chun Xiao; Y. J. Jin; Hua Jiang
10.1063/5.0156426
J. R. Hortensius; D. Afanasiev; L. Vistoli; M. Matthiesen; M. Bibes; A. D. Caviglia
10.1063/5.0156400
Kang Wang; Vineetha Bheemarasetty; Gang Xiao
10.1063/5.0153349
M. Merte; F. Freimuth; D. Go; T. Adamantopoulos; F. R. Lux; L. Plucinski; O. Gomonay; S. Blügel; Y. Mokrousov
10.1063/5.0149955
D. Khusyainov; T. Gareev; V. Radovskaia; K. Sampathkumar; S. Acharya; M. Šiškins; S. Mañas-Valero; B. A. Ivanov; E. Coronado; Th. Rasing; A. V. Kimel; D. Afanasiev
10.1063/5.0146128
Junyi Yang; Haiyang Zhang; Han Zhang; Lin Hao
10.1063/5.0155794
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