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1-20 of 272 Search Results for
plasma
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in High Breakdown Voltage β-Ga2O3 Schottky Diodes
> Ultrawide Bandgap β-Ga2O3 SemiconductorTheory and Applications
Published: February 2023
FIG. 8.10 Schematics of an unterminated β-Ga2O3 SBD, a β-Ga2O3 SBD with self-aligned fluorine plasma treatment (FPT), and a β-Ga2O3 SBD with self-aligned beveled fluorine plasma treatment (BFPT). (b) Forward I–V characteristics and differential RON,sp of the three different SBDs. (c) Reverse breakdown characteristics of the three different SBDs. Reprinted with permission from Hu et al., IEEE Electron Device Lett. 41 (3), 441–444 (2020a). Copyright 2020 IEEE. More about this image found in Schematics of an unterminated β-Ga2O3 SBD, a β-Ga
Book Chapter
Series: AIPP Books, Methods
Published: March 2023
EISBN: 978-0-7354-2574-3
ISBN: 978-0-7354-2572-9
.... , Ferreira , N. L. , Mašláni , A. , and Tomar , R. et al. , “ Thermal plasma gasification of organic waste stream coupled with CO2-sorption enhanced reforming employing different sorbents for enhanced hydrogen production ,” RSC. Adv. 12 , 6122 – 6132 ( 2022 ). 10.1039/D1RA07719H...
Book Chapter
Series: AIPP Books, Principles
Published: March 2023
0
EISBN: 978-0-7354-2559-0
ISBN: 978-0-7354-2556-9
.../La0.7Sr0.3MnO3 heterostructures deposited on spark plasma sintered LaAlO3 substrates ,” Appl. Phys. Lett. 104 , 082914 ( 2014 ). 10.1063/1.4867021 Ranjith , R. and Krupanidhi , S. B. , “ Antiferroelectriclike polarization behavior in compositionally varying (1 − x)Pb(Mg1...
Book Chapter
Series: AIPP Books, Principles
Published: February 2023
0
EISBN: 978-0-7354-2503-3
ISBN: 978-0-7354-2500-2
...References References Ahmadi , E. , Koksaldi , O. S. , Kaun , S. W. , Oshima , Y. , Short , D. B. , Mishra , U. K. , and Speck , J. S. , “ Ge doping of β-Ga2O3 films grown by plasma-assisted molecular beam epitaxy ,” Appl. Phys. Express 10...
Book Chapter
Series: AIPP Books, Methods
Published: March 2023
10.1063/9780735425743_004
EISBN: 978-0-7354-2574-3
ISBN: 978-0-7354-2572-9
.... , Ferreira , N. L. , Mašláni , A. , and Tomar , R. et al. , “ Thermal plasma gasification of organic waste stream coupled with CO2-sorption enhanced reforming employing different sorbents for enhanced hydrogen production ,” RSC. Adv. 12 , 6122 – 6132 ( 2022 ). 10.1039/D1RA07719H...
Book Chapter
Series: AIPP Books, Principles
Published: March 2023
10.1063/9780735424395_003
EISBN: 978-0-7354-2439-5
ISBN: 978-0-7354-2436-4
... chemically. The second step is to etch the chemically modified top layer. This technique basically solves various issues related to continued pulsed plasma based etching like aspect ratio, selectivity and etchants. Silicon is the most common layer for making MEMS devices, and its etching through the ALE...
Book Chapter
Series: AIPP Books, Principles
Published: March 2023
0
EISBN: 978-0-7354-2559-0
ISBN: 978-0-7354-2556-9
... Electronics (COMPEL) ( IEEE , 2014 ), pp. 1 – 9 . Zwierz , R. , Plasma Enhanced Growth of GaN Single Crystalline Layers from Vapour Phase ( Brandenburgische Technische Universität Cottbus-Senftenberg , 2014 ). ...
Book Chapter
Series: AIPP Books, Professional
Published: March 2023
10.1063/9780735425712_006
EISBN: 978-0-7354-2571-2
ISBN: 978-0-7354-2568-2
.... (1999) proposed a model for using Internet resources to teach high school students of plasma physics and fusion energy ( Zwicker et al., 1999 ). According to this work, students are given access to real-time data and engage in virtual experimentation and interact with professional scientists...
Book Chapter
Series: AIPP Books, Principles
Published: March 2023
10.1063/9780735424395_001
EISBN: 978-0-7354-2439-5
ISBN: 978-0-7354-2436-4
... and electrical parameters, such as stiffness, damping factor, mass, capacitance, and inductance ( Basu et al., 2019a , 2019d ). Recent technologies such as 3D printing, plasma processing and laser micromachining have provided significant advantages in scaling down from MEMS to NEMS devices. While...
Book Chapter
Series: AIPP Books, Principles
Published: March 2023
10.1063/9780735425590_010
EISBN: 978-0-7354-2559-0
ISBN: 978-0-7354-2556-9
.... , “ BIFeO3/La0.7Sr0.3MnO3 heterostructures deposited on spark plasma sintered LaAlO3 substrates ,” Appl. Phys. Lett. 104 , 082914 ( 2014 ). 10.1063/1.4867021 Ranjith , R. and Krupanidhi , S. B. , “ Antiferroelectriclike polarization behavior...
Book
Series: AIPP Books, Methods
Published: March 2023
10.1063/9780735425743
EISBN: 978-0-7354-2574-3
ISBN: 978-0-7354-2572-9
Book
Series: AIPP Books, Professional
Published: March 2023
10.1063/9780735425712
EISBN: 978-0-7354-2571-2
ISBN: 978-0-7354-2568-2
Book Chapter
Series: AIPP Books, Principles
Published: March 2023
10.1063/9780735424395_005
EISBN: 978-0-7354-2439-5
ISBN: 978-0-7354-2436-4
... such as atomic layer deposition (ALD), atomic layer etching (ALE), and deep reactive ion etching (DRIE) based plasma processes are becoming increasingly important for manufacturing accelerometers, especially for the cantilever-based accelerometers. Some other non-conventional methods of fabrication are also...
Book Chapter
Series: AIPP Books, Principles
Published: March 2023
10.1063/9780735425590_003
EISBN: 978-0-7354-2559-0
ISBN: 978-0-7354-2556-9
... power stage ,” in IEEE 15th Workshop on Control and Modeling for Power Electronics (COMPEL) ( IEEE , 2014 ), pp. 1 – 9 . Zwierz , R. , Plasma Enhanced Growth of GaN Single Crystalline Layers from Vapour Phase ( Brandenburgische Technische Universität Cottbus-Senftenberg , 2014 ). ...
Book Chapter
Series: AIPP Books, Principles
Published: March 2023
10.1063/9780735424395_007
EISBN: 978-0-7354-2439-5
ISBN: 978-0-7354-2436-4
... is achieved with the help of high-resolution optical lithography in standard silicon foundry ( Zhang et al., 2020 ) and electron beam lithography for low volume research prototyping ( Sadasivan and Das, 2015 ). Pattern transfer with high aspect ratio plasma etching is necessary in most cases. Often...
Book Chapter
Series: AIPP Books, Principles
Published: February 2023
0
EISBN: 978-0-7354-2503-3
ISBN: 978-0-7354-2500-2
... , Z. , Zhan , X. , Bhuiyan , A. U. , Feng , Z. , Yang , Z. , Luo , X. , Huang , A. Q. , Green , A. , Chabak , K. , Zhao , H. , and Li , X. , “ β-Ga2O3 FinFETs with ultra-low hysteresis by plasma-free metal-assisted chemical etching...
Book
Series: AIPP Books, Principles
Published: March 2023
10.1063/9780735425590
EISBN: 978-0-7354-2559-0
ISBN: 978-0-7354-2556-9
Book Chapter
Series: AIPP Books, Principles
Published: February 2023
10.1063/9780735425033_009
EISBN: 978-0-7354-2503-3
ISBN: 978-0-7354-2500-2
..., plasma-assisted chemical reactions and energetic ion beams are utilized to remove target materials from the sample. Therefore, in addition to removing material by a pure chemical reaction as wet etch, dry etch also consists of knocking out atoms by striking with high-energy ions, which is known...
Book Chapter
Series: AIPP Books, Principles
Published: February 2023
10.1063/9780735425033_004
EISBN: 978-0-7354-2503-3
ISBN: 978-0-7354-2500-2
.... 4-1–4-18. Molecular beam epitaxy (MBE) has allowed for growth of the highest quality films of β-Ga2O3 and its alloys. In this chapter, we discuss the fundamentals of both plasma-assisted and ozone MBE of β-Ga2O3. The impact of Ga2O suboxide...
Book
Series: AIPP Books, Principles
Published: March 2023
10.1063/9780735424395
EISBN: 978-0-7354-2439-5
ISBN: 978-0-7354-2436-4
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