TiO₂ Thin Films by Chemical Vapor Deposition: An XPS Characterization Available to Purchase

As a part of a comprehensive research work on ZnO-TiO₂ nanosystems synthesized by Chemical Vapor Deposition (CVD), we initially devoted our attention to the preparation and characterization of nanocrystalline TiO₂ thin films. Specifically, the coatings were obtained by CVD on Si(100) substrates starting from Ti(OⁱPr)₂(dpm)₂ (OⁱPr=iso-propoxy; dpm=2,2,6,6-tetramethyl-3,5-heptanedionate), under a dry O₂ atmosphere. The obtained samples were characterized by complementary techniques, namely Glancing Incidence X-ray Diffraction (GIXRD), X-ray Photoelectron Spectroscopy (XPS) and Scanning Electron Microscopy (SEM), for a thorough investigation of their microstructure, chemical composition and morphology. The present contribution is devoted to the XPS analysis of a TiO₂ thin film obtained at 450 °C. Besides the wide scan spectrum, detailed spectra for the Ti 2p, O ls and C 1s regions and related data are presented and discussed.