Journal of Vacuum Science and Technology

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Interaction of Slow Electrons with Surfaces

E. Bauer

J. Vac. Sci. Technol. 7, 3–12 (1970) https://doi.org/10.1116/1.1315823

Abstract

View articletitled, Interaction of Slow Electrons with Surfaces

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Surface Quantum Transport Phenomena

J. N. Zemel

J. Vac. Sci. Technol. 7, 12–13 (1970) https://doi.org/10.1116/1.1315771

View articletitled, Surface Quantum Transport Phenomena

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Auger Electron Spectroscopy Study of Oxygen Adsorption on W(110)

Ronald G. Musket; John Ferrante

J. Vac. Sci. Technol. 7, 14–17 (1970) https://doi.org/10.1116/1.1315780

Abstract

View articletitled, Auger Electron Spectroscopy Study of Oxygen Adsorption on W(110)

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Ion Burial and Thermal Release of Noble Gases at Nickel Surfaces

R. O. Rantanen; A. L. Moen; E. E. Donaldson

J. Vac. Sci. Technol. 7, 18–22 (1970) https://doi.org/10.1116/1.1315791

Abstract

View articletitled, Ion Burial and Thermal Release of Noble Gases at Nickel Surfaces

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Tunneling in Semiconductors

C. B. Duke

J. Vac. Sci. Technol. 7, 22–27 (1970) https://doi.org/10.1116/1.1315804

Abstract

View articletitled, Tunneling in Semiconductors

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Quantum Scattering Approach to Auger Neutralization of Ions by Metals

E. P. Wenaas; A. J. Howsmon

J. Vac. Sci. Technol. 7, 27–30 (1970) https://doi.org/10.1116/1.1315819

Abstract

View articletitled, Quantum Scattering Approach to Auger Neutralization of Ions by Metals

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Ion Reflection, Penetration, and Entrapment in Solids

G. Carter

J. Vac. Sci. Technol. 7, 31–38 (1970) https://doi.org/10.1116/1.1315821

Abstract

View articletitled, Ion Reflection, Penetration, and Entrapment in Solids

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Effect of Oxygen Adsorption on Silicon Surface Conductivity

F. Wilhelmsen; J. H. Leck

J. Vac. Sci. Technol. 7, 39–42 (1970) https://doi.org/10.1116/1.1315822

Abstract

View articletitled, Effect of Oxygen Adsorption on Silicon Surface Conductivity

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Electric Quantum Effects in Inverted Silicon Surfaces

Alan B. Fowler

J. Vac. Sci. Technol. 7, 42 (1970) https://doi.org/10.1116/1.1315824

View articletitled, Electric Quantum Effects in Inverted Silicon Surfaces

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Some Problems in the Analysis of Auger Electron Spectra

T. W. Haas; J. T. Grant; G. J. Dooley, III

J. Vac. Sci. Technol. 7, 43–45 (1970) https://doi.org/10.1116/1.1315825

Abstract

View articletitled, Some Problems in the Analysis of Auger Electron Spectra

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Critical Evaluation of the Metastable Time-of-Flight Technique for Obtaining Molecular Velocity Distributions

J. W. Locke; J. B. French

J. Vac. Sci. Technol. 7, 46–49 (1970) https://doi.org/10.1116/1.1315826

Abstract

View articletitled, Critical Evaluation of the Metastable Time-of-Flight Technique for Obtaining Molecular Velocity Distributions

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Chemisorption on Single Crystal Molybdenum (112) Surfaces

G. J. Dooley, III; T. W. Haas

J. Vac. Sci. Technol. 7, 49–52 (1970) https://doi.org/10.1116/1.1315827

Abstract

View articletitled, Chemisorption on Single Crystal Molybdenum (112) Surfaces

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Surface Structure and Gas-Solid Interactions

Gert Ehrlich

J. Vac. Sci. Technol. 7, 52 (1970) https://doi.org/10.1116/1.1315828

View articletitled, Surface Structure and Gas-Solid Interactions

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Mass Spectrometric Studies of Neutral Molecule-Surface Interactions

John B. Hudson

J. Vac. Sci. Technol. 7, 53–61 (1970) https://doi.org/10.1116/1.1315829

Abstract

View articletitled, Mass Spectrometric Studies of Neutral Molecule-Surface Interactions

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Ion-Neutralization Spectroscopy

Homer D. Hagstrum

J. Vac. Sci. Technol. 7, 62–63 (1970) https://doi.org/10.1116/1.1315830

View articletitled, Ion-Neutralization Spectroscopy

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Kinetic Studies of Surface Processes by Field Ion Mass Spectroscopy

Jochen Block; Herbert Thimm; Klaus Zühlke

J. Vac. Sci. Technol. 7, 63–69 (1970) https://doi.org/10.1116/1.1315831

Abstract

View articletitled, Kinetic Studies of Surface Processes by Field Ion Mass Spectroscopy

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Thermal Evolution of Gases Bombarded into Copper-Nickel Alloys

A. W. Smith

J. Vac. Sci. Technol. 7, 69–72 (1970) https://doi.org/10.1116/1.1315832

Abstract

View articletitled, Thermal Evolution of Gases Bombarded into Copper-Nickel Alloys

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Surface Composition Analysis by Binary Scattering of Noble Gas Ions

R. F. Goff; D. P. Smith

J. Vac. Sci. Technol. 7, 72–75 (1970) https://doi.org/10.1116/1.1315833

Abstract

View articletitled, Surface Composition Analysis by Binary Scattering of Noble Gas Ions

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Technique and Applications of Auger Electron Spectroscopy

P. W. Palmberg

J. Vac. Sci. Technol. 7, 76 (1970) https://doi.org/10.1116/1.1315834

View articletitled, Technique and Applications of Auger Electron Spectroscopy

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Auger Studies of Cleaved (111) Silicon Surfaces

J. T. Grant; T. W. Haas

J. Vac. Sci. Technol. 7, 77–79 (1970) https://doi.org/10.1116/1.1315835

Abstract

View articletitled, Auger Studies of Cleaved (111) Silicon Surfaces

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Interaction of Photons with Surfaces

W. E. Spicer

J. Vac. Sci. Technol. 7, 80 (1970) https://doi.org/10.1116/1.1315836

View articletitled, Interaction of Photons with Surfaces

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Auger Electron Spectroscopy of Contaminated Gallium-Arsenide Surfaces

John J. Uebbing

J. Vac. Sci. Technol. 7, 81–83 (1970) https://doi.org/10.1116/1.1315837

Abstract

View articletitled, Auger Electron Spectroscopy of Contaminated Gallium-Arsenide Surfaces

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Iron Cyanide as a Surface State to Prevent ZnO Photolysis in Vacuum

S. Roy Morrison

J. Vac. Sci. Technol. 7, 84–89 (1970) https://doi.org/10.1116/1.1315838

Abstract

View articletitled, Iron Cyanide as a Surface State to Prevent ZnO Photolysis in Vacuum

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Review of the Interaction of Neutral Molecules with Solid Surfaces

Robert E. Stickney

J. Vac. Sci. Technol. 7, 90 (1970) https://doi.org/10.1116/1.1315839

View articletitled, Review of the Interaction of Neutral Molecules with Solid Surfaces

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Experimental Attempt to Observe Helium Atom Diffraction from (001) Silver

R. L. Palmer; D. R. O'Keefe; H. Saltsburg; J. N. Smith, Jr.

J. Vac. Sci. Technol. 7, 91–95 (1970) https://doi.org/10.1116/1.1315840

Abstract

View articletitled, Experimental Attempt to Observe Helium Atom Diffraction from (001) Silver

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High Resistivity Transparent ZnO Thin Films

D. L. Raimondi; E. Kay

J. Vac. Sci. Technol. 7, 96–99 (1970) https://doi.org/10.1116/1.1315841

Abstract

View articletitled, High Resistivity Transparent ZnO Thin Films

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Formation of Thin InAs Films for Electronic Devices

H. E. Kunig

J. Vac. Sci. Technol. 7, 100–102 (1970) https://doi.org/10.1116/1.1315761

Abstract

View articletitled, Formation of Thin InAs Films for Electronic Devices

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Bismuth-Based Glasses for Thin-Film Capacitors Deposited by rf Sputtering

J. G. Titchmarsh; P. A. B. Toombs

J. Vac. Sci. Technol. 7, 103–107 (1970) https://doi.org/10.1116/1.1315762

Abstract

View articletitled, Bismuth-Based Glasses for Thin-Film Capacitors Deposited by rf Sputtering

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On the Growth of Silver-Bismuth Alloy Deposits on a Rock Salt

K. Matsushima; T. Ohtsuki

J. Vac. Sci. Technol. 7, 107–110 (1970) https://doi.org/10.1116/1.1315763

Abstract

View articletitled, On the Growth of Silver-Bismuth Alloy Deposits on a Rock Salt

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Gallium–Phosphide Films Deposited by Sputtering

J. Sosniak

J. Vac. Sci. Technol. 7, 110–114 (1970) https://doi.org/10.1116/1.1315764

Abstract

View articletitled, Gallium–Phosphide Films Deposited by Sputtering

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Epitaxial Polycrystalline ${CaF}_{2}$ Films

R. W. Vook; M. Bujor

J. Vac. Sci. Technol. 7, 115–117 (1970) https://doi.org/10.1116/1.1315765

Abstract

View articletitled, Epitaxial Polycrystalline <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">CaF</mi><mrow><mn>2</mn></mrow></msub></math> Films

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Mössbauer Spectra of Monolayer Iron Films

A. C. Zuppero; R. W. Hoffman

J. Vac. Sci. Technol. 7, 118–121 (1970) https://doi.org/10.1116/1.1315766

Abstract

View articletitled, Mössbauer Spectra of Monolayer Iron Films

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Preparation and Properties of ${Pb}_{1−x} {Sn}_{x}$ Te Epitaxial Films

Timothy O. Farinre; Jay N. Zemel

J. Vac. Sci. Technol. 7, 121–126 (1970) https://doi.org/10.1116/1.1315767

Abstract

View articletitled, Preparation and Properties of <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">Pb</mi><mrow><mtext>1−x</mtext></mrow></msub><mi xmlns=""> </mi><msub xmlns=""><mi mathvariant="normal">Sn</mi><mrow><mi>x</mi></mrow></msub></math> Te Epitaxial Films

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Electrical Properties of ${Pb}_{x} {Sn}_{1−x}$ Te Alloys

Richard F. Bis

J. Vac. Sci. Technol. 7, 126 (1970) https://doi.org/10.1116/1.1315768

View articletitled, Electrical Properties of <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">Pb</mi><mrow><mi>x</mi></mrow></msub><mi xmlns=""> </mi><msub xmlns=""><mi mathvariant="normal">Sn</mi><mrow><mtext>1−x</mtext></mrow></msub></math> Te Alloys

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Preparation and Properties of Super-conducting Thin Films of β-Tungsten Structure Compounds

M. A. Janocko; J. R. Gavaler; J. K. Hulm; C. K. Jones

J. Vac. Sci. Technol. 7, 127–129 (1970) https://doi.org/10.1116/1.1315769

Abstract

View articletitled, Preparation and Properties of Super-conducting Thin Films of β-Tungsten Structure Compounds

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Argon Concentration in Tungsten Films Deposited by dc Sputtering

William W. Lee; Daniel Oblas

J. Vac. Sci. Technol. 7, 129–133 (1970) https://doi.org/10.1116/1.1315770

Abstract

View articletitled, Argon Concentration in Tungsten Films Deposited by dc Sputtering

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Contact and Interconnection Technology

W. H. Legat; K. H. Tiefert; W. C. Rosvold

J. Vac. Sci. Technol. 7, 133–134 (1970) https://doi.org/10.1116/1.1315772

View articletitled, Contact and Interconnection Technology

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Resistivity Variations in Vacuum Deposited CdS Films

W. P. Bleha; W. H. Hartman; R. L. Jimenez; R. N. Peacock

J. Vac. Sci. Technol. 7, 135–138 (1970) https://doi.org/10.1116/1.1315773

Abstract

View articletitled, Resistivity Variations in Vacuum Deposited CdS Films

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GaAs Films for Semitransparent Photocathodes

T. Yasar; R. F. Steinberg

J. Vac. Sci. Technol. 7, 139–141 (1970) https://doi.org/10.1116/1.1315774

Abstract

View articletitled, GaAs Films for Semitransparent Photocathodes

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Silicon Semiconductor Device Passivation

Donald R. Young

J. Vac. Sci. Technol. 7, 141 (1970) https://doi.org/10.1116/1.1315775

View articletitled, Silicon Semiconductor Device Passivation

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Metallization Systems for Integrated Circuits

Richard W. Wilson; Lewis E. Terry

J. Vac. Sci. Technol. 7, 142 (1970) https://doi.org/10.1116/1.1315776

View articletitled, Metallization Systems for Integrated Circuits

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Fabrication of Thin Dielectric Films with Low Internal Stresses

Richard J. Scheuerman

J. Vac. Sci. Technol. 7, 143–146 (1970) https://doi.org/10.1116/1.1315777

Abstract

View articletitled, Fabrication of Thin Dielectric Films with Low Internal Stresses

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Metal-Oxide Semiconductor Devices

E. M. Wilder

J. Vac. Sci. Technol. 7, 146 (1970) https://doi.org/10.1116/1.1315778

View articletitled, Metal-Oxide Semiconductor Devices

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Thin-Film Devices on Dielectric Substrates

C. W. Mueller

J. Vac. Sci. Technol. 7, 147–153 (1970) https://doi.org/10.1116/1.1315779

Abstract

View articletitled, Thin-Film Devices on Dielectric Substrates

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Thin-Film Failure Modes in Semiconductor Devices

D. W. Jones; J. L. Mills

J. Vac. Sci. Technol. 7, 154 (1970) https://doi.org/10.1116/1.1315781

View articletitled, Thin-Film Failure Modes in Semiconductor Devices

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Space Charge Instabilities in the rf Induced Gas Discharge of the Diode Configuration

Lawrence T. Lamont, Jr.; John J. DeLeone, Jr.

J. Vac. Sci. Technol. 7, 155–158 (1970) https://doi.org/10.1116/1.1315782

Abstract

View articletitled, Space Charge Instabilities in the rf Induced Gas Discharge of the Diode Configuration

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Insignificance of Lattice Misfit for Epitaxy

A. K. Green; J. Dancy; E. Bauer

J. Vac. Sci. Technol. 7, 159–163 (1970) https://doi.org/10.1116/1.1315783

Abstract

View articletitled, Insignificance of Lattice Misfit for Epitaxy

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High-Vacuum Evaporation Stage for an Electron Microscope

D. N. Braski

J. Vac. Sci. Technol. 7, 164–168 (1970) https://doi.org/10.1116/1.1315784

Abstract

View articletitled, High-Vacuum Evaporation Stage for an Electron Microscope

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Electron-Microscope-Beam Effects in the Investigation of Thin-Film Structure

Michael R. Neuman; Lorn L. Howard

J. Vac. Sci. Technol. 7, 169–173 (1970) https://doi.org/10.1116/1.1315785

Abstract

View articletitled, Electron-Microscope-Beam Effects in the Investigation of Thin-Film Structure

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Review of the ${Pb}_{1−x} {Sn}_{x}$ Chalcogenide Semiconductors

J. F. Butler

J. Vac. Sci. Technol. 7, 174 (1970) https://doi.org/10.1116/1.1315786

View articletitled, Review of the <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">Pb</mi><mrow><mtext>1−x</mtext></mrow></msub><mi xmlns=""> </mi><msub xmlns=""><mi mathvariant="normal">Sn</mi><mrow><mi>x</mi></mrow></msub></math> Chalcogenide Semiconductors

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Stress in Co–Au Alloy Films

E. Klokholm

J. Vac. Sci. Technol. 7, 175–177 (1970) https://doi.org/10.1116/1.1315787

Abstract

View articletitled, Stress in Co–Au Alloy Films

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The Structure of Tin Thin Films Evaporated onto a Clean NaCl Substrate

G. Shimaoka; G. Komoriya

J. Vac. Sci. Technol. 7, 178–181 (1970) https://doi.org/10.1116/1.1315788

Abstract

View articletitled, The Structure of Tin Thin Films Evaporated onto a Clean NaCl Substrate

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Ion Desorption by Electron Bombardment; Relation to Total and Partial Pressure Measurement

P. A. Redhead

J. Vac. Sci. Technol. 7, 182–187 (1970) https://doi.org/10.1116/1.1315789

Abstract

View articletitled, Ion Desorption by Electron Bombardment; Relation to Total and Partial Pressure Measurement

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Omegatron for Total and Partial Pressure Measurement

J. W. Culton; R. N. Peacock

J. Vac. Sci. Technol. 7, 188–191 (1970) https://doi.org/10.1116/1.1315790

Abstract

View articletitled, Omegatron for Total and Partial Pressure Measurement

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Influence of Segmented Rods and their Alignment on the Performance of a Quadrupole Mass Filter

W. Arnold

J. Vac. Sci. Technol. 7, 191–194 (1970) https://doi.org/10.1116/1.1315792

Abstract

View articletitled, Influence of Segmented Rods and their Alignment on the Performance of a Quadrupole Mass Filter

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Sensitivity Variations in Bayard-Alpert Gauges Caused by Auger Emission at the Collector

C. P. Gopalaraman; R. A. Armstrong; P. A. Redhead

J. Vac. Sci. Technol. 7, 195–198 (1970) https://doi.org/10.1116/1.1315793

Abstract

View articletitled, Sensitivity Variations in Bayard-Alpert Gauges Caused by Auger Emission at the Collector

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Reduction of Substrate Heating during rf Sputtering

Lawrence T. Lamont, Jr.; Albert Lang

J. Vac. Sci. Technol. 7, 198–200 (1970) https://doi.org/10.1116/1.1315794

Abstract

View articletitled, Reduction of Substrate Heating during rf Sputtering

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Extractor Gauge as a Nude System

A. Barz; P. Kocian

J. Vac. Sci. Technol. 7, 200–203 (1970) https://doi.org/10.1116/1.1315795

Abstract

View articletitled, Extractor Gauge as a Nude System

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“Spot-Metering” Residual Gas Analyzer

Russell Pichlik; Jens C. Zorn

J. Vac. Sci. Technol. 7, 204–205 (1970) https://doi.org/10.1116/1.1315796

Abstract

View articletitled, “Spot-Metering” Residual Gas Analyzer

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Monte Carlo Simulation of Specular and Surface Diffusional Perturbations to Flow from Knudsen Cells

John W. Ward; Robert L. Bivins; Malcolm V. Fraser

J. Vac. Sci. Technol. 7, 206–210 (1970) https://doi.org/10.1116/1.1315797

Abstract

View articletitled, Monte Carlo Simulation of Specular and Surface Diffusional Perturbations to Flow from Knudsen Cells

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Helium Memory in Mass Spectrometer Leak Detectors

J. R. Young

J. Vac. Sci. Technol. 7, 210–213 (1970) https://doi.org/10.1116/1.1315798

Abstract

View articletitled, Helium Memory in Mass Spectrometer Leak Detectors

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Ionization Gauge Using a SiC p-n Junction Electron Emitter

J. R. Dobrott; R. M. Oman

J. Vac. Sci. Technol. 7, 214–215 (1970) https://doi.org/10.1116/1.1315799

Abstract

View articletitled, Ionization Gauge Using a SiC p-n Junction Electron Emitter

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Displacement Phenomena in the Barium-Nitrogen-Oxygen System

C. Pisani; S. J. Hellier; T. A. Giorgi

J. Vac. Sci. Technol. 7, 216–220 (1970) https://doi.org/10.1116/1.1315800

Abstract

View articletitled, Displacement Phenomena in the Barium-Nitrogen-Oxygen System

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Control of Optical Properties on Large Substrates $(10×12 ft)$ Produced in a Semicontinuous Production Coater

Albany D. Grubb

J. Vac. Sci. Technol. 7, 220–224 (1970) https://doi.org/10.1116/1.1315801

Abstract

View articletitled, Control of Optical Properties on Large Substrates <math xmlns="http://www.w3.org/1998/Math/MathML"><mtext xmlns="">(10×12 </mtext><mi mathvariant="normal" xmlns="">ft</mi><mi xmlns="">)</mi></math> Produced in a Semicontinuous Production Coater

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Practical Techniques for Improving Sputtered Film Quality

Dennis Hajzak

J. Vac. Sci. Technol. 7, 224–227 (1970) https://doi.org/10.1116/1.1315802

Abstract

View articletitled, Practical Techniques for Improving Sputtered Film Quality

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Microwave Measurement of Electron Density in a Penning Discharge

W. J. Lange

J. Vac. Sci. Technol. 7, 228–232 (1970) https://doi.org/10.1116/1.1315803

Abstract

View articletitled, Microwave Measurement of Electron Density in a Penning Discharge

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Study of Low Pressure Application of the Orbitron Ion Gauge

Charles M. Gosselin; George A. Beitel; Alphonsa Smith

J. Vac. Sci. Technol. 7, 233–236 (1970) https://doi.org/10.1116/1.1315805

Abstract

View articletitled, Study of Low Pressure Application of the Orbitron Ion Gauge

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Concept of Compatibility in Conductance Calculations

M. H. Hablanian

J. Vac. Sci. Technol. 7, 237–240 (1970) https://doi.org/10.1116/1.1315806

Abstract

View articletitled, Concept of Compatibility in Conductance Calculations

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Vacuum on the Moon

F. G. Allen

J. Vac. Sci. Technol. 7, 240 (1970) https://doi.org/10.1116/1.1315807

View articletitled, Vacuum on the Moon

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Condensation of 300–2500 K Gases on Surfaces at Cryogenic Temperatures

R. F. Brown; D. M. Trayer; M. R. Busby

J. Vac. Sci. Technol. 7, 241–246 (1970) https://doi.org/10.1116/1.1315808

Abstract

View articletitled, Condensation of 300–2500 K Gases on Surfaces at Cryogenic Temperatures

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Upper Atmosphere Investigations by Rocket and Satellite-Borne Mass Spectrometers

Alfred O. Nier

J. Vac. Sci. Technol. 7, 247 (1970) https://doi.org/10.1116/1.1315809

View articletitled, Upper Atmosphere Investigations by Rocket and Satellite-Borne Mass Spectrometers

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Thermal Coated Extendible Boom for Space Environment

M. Lauriente; C. Staugitis

J. Vac. Sci. Technol. 7, 248–250 (1970) https://doi.org/10.1116/1.1315810

Abstract

View articletitled, Thermal Coated Extendible Boom for Space Environment

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Cryogenically Pumped Coating Plant for Thin-Film Production under Clean Vacuum Condition

J. Hengevoss; H. Reisinger; H. Wössner

J. Vac. Sci. Technol. 7, 251–254 (1970) https://doi.org/10.1116/1.1315811

Abstract

View articletitled, Cryogenically Pumped Coating Plant for Thin-Film Production under Clean Vacuum Condition

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New Approach to rf-Sputter Power Supply Design

Frieder H. Ensslin; Martin R. Zalonis

J. Vac. Sci. Technol. 7, 254–256 (1970) https://doi.org/10.1116/1.1315812

Abstract

View articletitled, New Approach to rf-Sputter Power Supply Design

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Selective Pumping of an 800 000 Liter Chamber

Leon V. Omelka

J. Vac. Sci. Technol. 7, 257–261 (1970) https://doi.org/10.1116/1.1315813

Abstract

View articletitled, Selective Pumping of an 800 000 Liter Chamber

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Influence of Adsorption at Endothermic Surface Sites on the Pumping and Outgassing Rate for Ion Gauges, Residual Gas Analyzers, and other Similar Devices

Harold F. Winters

J. Vac. Sci. Technol. 7, 262–266 (1970) https://doi.org/10.1116/1.1315814

Abstract

View articletitled, Influence of Adsorption at Endothermic Surface Sites on the Pumping and Outgassing Rate for Ion Gauges, Residual Gas Analyzers, and other Similar Devices

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Ultrahigh Vacuum Bakeable Valves with Integral Spare Seal

R. G. Bernard

J. Vac. Sci. Technol. 7, 267–269 (1970) https://doi.org/10.1116/1.1315815

Abstract

View articletitled, Ultrahigh Vacuum Bakeable Valves with Integral Spare Seal

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Absolute Calibration of Ion Gauges by Means of a Bakeable Adjustable Conductance

P. S. Choumoff; H. Bernardet; J. Mativet; R. Sauneuf

J. Vac. Sci. Technol. 7, 270–273 (1970) https://doi.org/10.1116/1.1315816

Abstract

View articletitled, Absolute Calibration of Ion Gauges by Means of a Bakeable Adjustable Conductance

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Influence of Film Condensation and Source Radiation on Substrate Temperature

G. Breitweiser; B. N. Varadarajan; J. Wafer

J. Vac. Sci. Technol. 7, 274–277 (1970) https://doi.org/10.1116/1.1315817

Abstract

View articletitled, Influence of Film Condensation and Source Radiation on Substrate Temperature

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Practical Design Aspects of a Continuous Vacuum rf Sputtering Machine

B. J. Williams; T. Putner; C. Priestland; P. Granger; J. A. A. Emery

J. Vac. Sci. Technol. 7, 278–281 (1970) https://doi.org/10.1116/1.1315818

Abstract

View articletitled, Practical Design Aspects of a Continuous Vacuum rf Sputtering Machine

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Charged Particle Flux Generated by an Electron-Beam Deposition Source

Edward B. Graper

J. Vac. Sci. Technol. 7, 282–285 (1970) https://doi.org/10.1116/1.1315820

Abstract

View articletitled, Charged Particle Flux Generated by an Electron-Beam Deposition Source

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