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Progress in the Continuous Observation of Thin-Film Nucleation and Growth Processes by Electron Microscopy
J. Vac. Sci. Technol. 2, 42–48 (1965)
https://doi.org/10.1116/1.1492397
Structure and Annealing Behavior of Metal Films Deposited on Substrates near 80 °K: I. Copper Films on Glass
J. Vac. Sci. Technol. 2, 49–57 (1965)
https://doi.org/10.1116/1.1492398