Volume 18 Issue 3 | Journal of Vacuum Science and Technology

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Chemical information from Auger electron spectroscopy

H. H. Madden

J. Vac. Sci. Technol. 18, 677–689 (1981) https://doi.org/10.1116/1.570927

Abstract

View articletitled, Chemical information from Auger electron spectroscopy

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Quantitative analysis of iron oxides using Auger electron spectroscopy combined with ion sputtering

D. F. Mitchell; G. I. Sproule; M. J. Graham

J. Vac. Sci. Technol. 18, 690–694 (1981) https://doi.org/10.1116/1.570928

Abstract

View articletitled, Quantitative analysis of iron oxides using Auger electron spectroscopy combined with ion sputtering

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Thickness periodicity in the Auger line shapes from epitaxial (111) Pd/ (111) Cu films

S. S. Chao; R. W. Vook; Y. Namba

J. Vac. Sci. Technol. 18, 695–699 (1981) https://doi.org/10.1116/1.570929

Abstract

View articletitled, Thickness periodicity in the Auger line shapes from epitaxial (111) Pd/ (111) Cu films

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Chemical effects in ion scattering spectroscopy

R. C. McCune

J. Vac. Sci. Technol. 18, 700–708 (1981) https://doi.org/10.1116/1.570930

Abstract

View articletitled, Chemical effects in ion scattering spectroscopy

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Summary Abstract: Auger spectroscopy of metal carbonyls and nitrosyls

R. R. Rye; G. D. Stucky

J. Vac. Sci. Technol. 18, 709–710 (1981) https://doi.org/10.1116/1.570931

View articletitled, Summary Abstract: Auger spectroscopy of metal carbonyls and nitrosyls

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Summary Abstract: ISS chemical effects in elemental and compound semiconductors

W. L. Baun

J. Vac. Sci. Technol. 18, 711–712 (1981) https://doi.org/10.1116/1.570932

View articletitled, Summary Abstract: ISS chemical effects in elemental and compound semiconductors

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Summary Abstract: Auger lineshape analysis of polymers: polyethylene and poly(ethylene oxide)

J. A. Kelber; R. R. Rye; G. C. Nelson

J. Vac. Sci. Technol. 18, 712–713 (1981) https://doi.org/10.1116/1.570933

View articletitled, Summary Abstract: Auger lineshape analysis of polymers: polyethylene and poly(ethylene oxide)

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Chemical information from XPS—applications to the analysis of electrode surfaces

N. S. McIntyre; S. Sunder; D. W. Shoesmith; F. W. Stanchell

J. Vac. Sci. Technol. 18, 714–721 (1981) https://doi.org/10.1116/1.570934

Abstract

View articletitled, Chemical information from XPS—applications to the analysis of electrode surfaces

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Chemistry of corrosion layers on amorphous FeNiCrPB alloys

D. R. Baer; M. T. Thomas

J. Vac. Sci. Technol. 18, 722–726 (1981) https://doi.org/10.1116/1.570935

Abstract

View articletitled, Chemistry of corrosion layers on amorphous FeNiCrPB alloys

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Correction for loss effects in valence‐band XPS spectra by deconvolution

G. D. Davis; M. G. Lagally

J. Vac. Sci. Technol. 18, 727–731 (1981) https://doi.org/10.1116/1.570936

Abstract

View articletitled, Correction for loss effects in valence‐band XPS spectra by deconvolution

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Application of ESCA to corrosion studies of glasses containing simulated nuclear wastes

L. R. Pederson; M. T. Thomas; G. L. McVay

J. Vac. Sci. Technol. 18, 732–736 (1981) https://doi.org/10.1116/1.570937

Abstract

View articletitled, Application of ESCA to corrosion studies of glasses containing simulated nuclear wastes

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Molecular secondary ion mass spectrometry (SIMS)

R. J. Colton

J. Vac. Sci. Technol. 18, 737–747 (1981) https://doi.org/10.1116/1.570938

Abstract

View articletitled, Molecular secondary ion mass spectrometry (SIMS)

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Summary Abstract: Auger induced desorption of covalent and ionic systems

D. E. Ramaker; C. T. White; J. S. Murday

J. Vac. Sci. Technol. 18, 748–749 (1981) https://doi.org/10.1116/1.570939

View articletitled, Summary Abstract: Auger induced desorption of covalent and ionic systems

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Summary Abstract: Lithium compound identification in thermally activated batteries by ISS and SIMS

G. C. Nelson; P. A. Neiswander; J. Q. Searcy

J. Vac. Sci. Technol. 18, 750–751 (1981) https://doi.org/10.1116/1.570940

View articletitled, Summary Abstract: Lithium compound identification in thermally activated batteries by ISS and SIMS

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Low pressure CVD of III–V compounds

J. P. Duchemin

J. Vac. Sci. Technol. 18, 753–755 (1981) https://doi.org/10.1116/1.570941

Abstract

View articletitled, Low pressure CVD of III–V compounds

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Morphological defects arising during MBE growth of GaAs

R. Z. Bachrach; B. S. Krusor

J. Vac. Sci. Technol. 18, 756–764 (1981) https://doi.org/10.1116/1.570942

Abstract

View articletitled, Morphological defects arising during MBE growth of GaAs

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Effects of Ga and Si ionization on the growth of Ga doped Si MBE

S. Shimizu; S. Komiya

J. Vac. Sci. Technol. 18, 765–768 (1981) https://doi.org/10.1116/1.570943

Abstract

View articletitled, Effects of Ga and Si ionization on the growth of Ga doped Si MBE

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Summary Abstract: Silicon MBE

J. C. Bean

J. Vac. Sci. Technol. 18, 769–771 (1981) https://doi.org/10.1116/1.570944

Abstract

View articletitled, Summary Abstract: Silicon MBE

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Novel device structures by molecular beam epitaxy

C. E. C. Wood

J. Vac. Sci. Technol. 18, 772–777 (1981) https://doi.org/10.1116/1.570945

Abstract

View articletitled, Novel device structures by molecular beam epitaxy

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Core threshold photoemission spectroscopy from the As 3d core level of GaAs (110) and effects of Ge chemisorption

P. Zurcher; G. J. Lapeyre; R. Avci; J. Anderson

J. Vac. Sci. Technol. 18, 778–783 (1981) https://doi.org/10.1116/1.570946

Abstract

View articletitled, Core threshold photoemission spectroscopy from the As 3d core level of GaAs (110) and effects of Ge chemisorption

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Photoemission studies of heterojunction interface formation: Ge–GaAs(110) and Ge–Si(111)

G. Margaritondo; N. G. Stoffel; A. D. Katnani; H. S. Edelman; C. M. Bertoni

J. Vac. Sci. Technol. 18, 784–786 (1981) https://doi.org/10.1116/1.570947

Abstract

View articletitled, Photoemission studies of heterojunction interface formation: Ge–GaAs(110) and Ge–Si(111)

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Reactive interdiffusion at metal–CdS and metal–CdSe interfaces

C. F. Brucker; L. J. Brillson

J. Vac. Sci. Technol. 18, 787–791 (1981) https://doi.org/10.1116/1.570948

Abstract

View articletitled, Reactive interdiffusion at metal–CdS and metal–CdSe interfaces

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LEED intensity analysis of the structure of Al on GaAs(110)

A. Kahn; D. Kanani; J. Carelli; J. L. Yeh; C. B. Duke; R. J. Meyer; A. Paton; L. Brillson

J. Vac. Sci. Technol. 18, 792–796 (1981) https://doi.org/10.1116/1.570949

Abstract

View articletitled, LEED intensity analysis of the structure of Al on GaAs(110)

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Surface phases of GaAs(100) and AlAs(100)

R. Z. Bachrach; R. S. Bauer; P. Chiaradia; G. V. Hansson

J. Vac. Sci. Technol. 18, 797–801 (1981) https://doi.org/10.1116/1.570950

Abstract

View articletitled, Surface phases of GaAs(100) and AlAs(100)

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Summary Abstract: Low‐energy electron diffraction study of the surface‐defect structure of Ge grown epitaxially on GaAs(110)

H. M. Clearfield; D. G. Welkie; M. G. Lagally

J. Vac. Sci. Technol. 18, 802–803 (1981) https://doi.org/10.1116/1.570951

View articletitled, Summary Abstract: Low‐energy electron diffraction study of the surface‐defect structure of Ge grown epitaxially on GaAs(110)

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Material and device research for VLSI in Japan

T. Sugano

J. Vac. Sci. Technol. 18, 804–809 (1981) https://doi.org/10.1116/1.570952

Abstract

View articletitled, Material and device research for VLSI in Japan

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Microstructure of beam‐annealed silicon

J. M. Gibson

J. Vac. Sci. Technol. 18, 810–817 (1981) https://doi.org/10.1116/1.570953

Abstract

View articletitled, Microstructure of beam‐annealed silicon

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Laser annealing of bipolar NPN transistors

R. H. Hendel; D. D. Casey; C. U. Bickford

J. Vac. Sci. Technol. 18, 818–820 (1981) https://doi.org/10.1116/1.570954

Abstract

View articletitled, Laser annealing of bipolar NPN transistors

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Laser annealing of phosphosilicate glass

A. Naumaan; J. T. Boyd

J. Vac. Sci. Technol. 18, 821–824 (1981) https://doi.org/10.1116/1.570955

Abstract

View articletitled, Laser annealing of phosphosilicate glass

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Summary Abstract: Plasma–surface interactions in dry processing

J. W. Coburn; H. F. Winters

J. Vac. Sci. Technol. 18, 825–826 (1981) https://doi.org/10.1116/1.570956

View articletitled, Summary Abstract: Plasma–surface interactions in dry processing

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Materials options for field‐effect transistors

H. H. Wieder

J. Vac. Sci. Technol. 18, 827–837 (1981) https://doi.org/10.1116/1.570957

Abstract

View articletitled, Materials options for field‐effect transistors

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Sputtered TiW/Au Schottky barriers on GaAs

L. S. Weinman; S. A. Jamison; M. J. Helix

J. Vac. Sci. Technol. 18, 838–840 (1981) https://doi.org/10.1116/1.570958

Abstract

View articletitled, Sputtered TiW/Au Schottky barriers on GaAs

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Summary Abstract: Thin film and package processing aspects of Josephson LSI

B. J. van der Hoeven

J. Vac. Sci. Technol. 18, 841–842 (1981) https://doi.org/10.1116/1.570973

View articletitled, Summary Abstract: Thin film and package processing aspects of Josephson LSI

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Oxidation of Si(111), 7×7 and 2×1: A comparison

C. Y. Su; P. R. Skeath; I. Lindau; W. E. Spicer

J. Vac. Sci. Technol. 18, 843–846 (1981) https://doi.org/10.1116/1.570974

Abstract

View articletitled, Oxidation of Si(111), 7×7 and 2×1: A comparison

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The Si(111) 7×7 to ’’1×1’’ transition: A summary

M. B. Webb; P. A. Bennett

J. Vac. Sci. Technol. 18, 847–851 (1981) https://doi.org/10.1116/1.570975

Abstract

View articletitled, The Si(111) 7×7 to ’’1×1’’ transition: A summary

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Atomic structure of laser annealed Si(111)–(1×1)

D. M. Zehner; J. R. Noonan; H. L. Davis; C. W. White

J. Vac. Sci. Technol. 18, 852–855 (1981) https://doi.org/10.1116/1.570976

Abstract

View articletitled, Atomic structure of laser annealed Si(111)–(1×1)

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Theoretical studies of Si(111) surface structures

D. J. Chadi

J. Vac. Sci. Technol. 18, 856–859 (1981) https://doi.org/10.1116/1.570977

Abstract

View articletitled, Theoretical studies of Si(111) surface structures

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Electronic states of Si(111) surfaces

F. Houzay; G. M. Guichar; R. Pinchaux; Y. Petroff

J. Vac. Sci. Technol. 18, 860–865 (1981) https://doi.org/10.1116/1.570978

Abstract

View articletitled, Electronic states of Si(111) surfaces

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Analysis of low‐energy electron diffraction intensities from ZnS(110)

C. B. Duke; R. J. Meyer; A. Paton; A. Kahn; J. Carelli; J. L. Yeh

J. Vac. Sci. Technol. 18, 866–870 (1981) https://doi.org/10.1116/1.570979

Abstract

View articletitled, Analysis of low‐energy electron diffraction intensities from ZnS(110)

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Summary Abstract: Si(111)‐7×7 surface structure using ion scattering

R. J. Culbertson; L. C. Feldman; P. J. Silverman

J. Vac. Sci. Technol. 18, 871 (1981) https://doi.org/10.1116/1.570980

View articletitled, Summary Abstract: Si(111)‐7×7 surface structure using ion scattering

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Structure study of Au–Si interface by MeV ion scattering

T. Narusawa; K. Kinoshita; W. M. Gibson; A. Hiraki

J. Vac. Sci. Technol. 18, 872–875 (1981) https://doi.org/10.1116/1.570981

Abstract

View articletitled, Structure study of Au–Si interface by MeV ion scattering

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Binding state perturbations in the silicon oxide–tungsten system

O. K. T. Wu; Richard P. Burns

J. Vac. Sci. Technol. 18, 876–879 (1981) https://doi.org/10.1116/1.570982

Abstract

View articletitled, Binding state perturbations in the silicon oxide–tungsten system

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Si(111): Ni surface studies by AES, UPS, LEED, and ion scattering

Y. J. Chabal; R. J. Culbertson; L. C. Feldman; J. E. Rowe

J. Vac. Sci. Technol. 18, 880–882 (1981) https://doi.org/10.1116/1.570983

Abstract

View articletitled, Si(111): Ni surface studies by AES, UPS, LEED, and ion scattering

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Transient capacitance spectroscopy of semiconductor/insulator interface states: Thermally activated capture cross section of Si/SiO₂ interface states

E. Kamieniecki; N. Gomma; A. Kloc; R. Nitecki

J. Vac. Sci. Technol. 18, 883–887 (1981) https://doi.org/10.1116/1.570984

Abstract

View articletitled, Transient capacitance spectroscopy of semiconductor/insulator interface states: Thermally activated capture cross section of Si/SiO2 interface states

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Studies on silicon MOS Schottky barriers

F. A. Abou‐Elfotouh

J. Vac. Sci. Technol. 18, 888–889 (1981) https://doi.org/10.1116/1.570985

Abstract

View articletitled, Studies on silicon MOS Schottky barriers

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Process conditions affecting hot electron trapping in dc magnetron sputtered MOS devices

N. A. Bojarczuk

J. Vac. Sci. Technol. 18, 890–894 (1981) https://doi.org/10.1116/1.570986

Abstract

View articletitled, Process conditions affecting hot electron trapping in dc magnetron sputtered MOS devices

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Detection of residual damage in ⁷⁵As implanted silicon single crystal by secondary ion mass spectrometry

A. C. Yen

J. Vac. Sci. Technol. 18, 895–898 (1981) https://doi.org/10.1116/1.570987

Abstract

View articletitled, Detection of residual damage in 75As implanted silicon single crystal by secondary ion mass spectrometry

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Effect of ion implantation on CdSe thin film transistors

F. R. Shepherd; W. D. Westwood; P. J. Scanlon; J. Levinson; I. V. Mitchell; H. Plattner

J. Vac. Sci. Technol. 18, 899–902 (1981) https://doi.org/10.1116/1.570988

Abstract

View articletitled, Effect of ion implantation on CdSe thin film transistors

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Summary Abstract: Electronic structure of the V/Si interface

J. G. Clabes; G. W. Rubloff

J. Vac. Sci. Technol. 18, 903–904 (1981) https://doi.org/10.1116/1.570989

View articletitled, Summary Abstract: Electronic structure of the V/Si interface

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Summary Abstract: Site‐specific densities of states for cleaved and sputtered GaAs (110) from Auger line shapes

G. D. Davis; D. E. Savage; M. G. Lagally

J. Vac. Sci. Technol. 18, 904–905 (1981) https://doi.org/10.1116/1.570990

View articletitled, Summary Abstract: Site‐specific densities of states for cleaved and sputtered GaAs (110) from Auger line shapes

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Summary Abstract: Growth of high quality epitaxial GaAs films by sputter deposition

S. A. Barnett; G. Bajor; J. E. Greene

J. Vac. Sci. Technol. 18, 906–907 (1981) https://doi.org/10.1116/1.570991

View articletitled, Summary Abstract: Growth of high quality epitaxial GaAs films by sputter deposition

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Summary Abstract: Oxygen adsorption on Si(110) studied by Auger electron spectroscopy

P. Morgen

J. Vac. Sci. Technol. 18, 908–909 (1981) https://doi.org/10.1116/1.570992

View articletitled, Summary Abstract: Oxygen adsorption on Si(110) studied by Auger electron spectroscopy

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Silicide interface stoichiometry

J. L. Freeouf

J. Vac. Sci. Technol. 18, 910–916 (1981) https://doi.org/10.1116/1.570993

Abstract

View articletitled, Silicide interface stoichiometry

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Metal–semiconductor interfacial reactions: Ni/Si system

N. W. Cheung; P. J. Grunthaner; F. J. Grunthaner; J. W. Mayer; B. M. Ullrich

J. Vac. Sci. Technol. 18, 917–923 (1981) https://doi.org/10.1116/1.570994

Abstract

View articletitled, Metal–semiconductor interfacial reactions: Ni/Si system

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Interface metallurgy and electronic properties of silicides

G. Ottaviani

J. Vac. Sci. Technol. 18, 924–928 (1981) https://doi.org/10.1116/1.570995

Abstract

View articletitled, Interface metallurgy and electronic properties of silicides

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Surface defect effects on Schottky barriers

R. H. Williams

J. Vac. Sci. Technol. 18, 929–936 (1981) https://doi.org/10.1116/1.570959

Abstract

View articletitled, Surface defect effects on Schottky barriers

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Electronic states and atomic structure at the Pd₂Si–Si interface

P. E. Schmid; P. S. Ho; H. Föll; G. W. Rubloff

J. Vac. Sci. Technol. 18, 937–943 (1981) https://doi.org/10.1116/1.570960

Abstract

View articletitled, Electronic states and atomic structure at the Pd2Si–Si interface

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XPS investigation of the oxidation of Hg_1−xCd_xTe surfaces

S. P. Kowalczyk; J. T. Cheung

J. Vac. Sci. Technol. 18, 944–948 (1981) https://doi.org/10.1116/1.570961

Abstract

View articletitled, XPS investigation of the oxidation of Hg1−xCdxTe surfaces

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Effects of a thin SiO₂ layer on the formation of metal–silicon contacts

S. M. Goodnick; M. Fathipour; D. L. Ellsworth; C. W. Wilmsen

J. Vac. Sci. Technol. 18, 949–954 (1981) https://doi.org/10.1116/1.570962

Abstract

View articletitled, Effects of a thin SiO2 layer on the formation of metal–silicon contacts

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Variations in the stoichiometry of thin oxides on silicon as seen in the Si LVV Auger spectrum

H. S. Wildman; R. F. Bartholomew; W. A. Pliskin; M. Revitz

J. Vac. Sci. Technol. 18, 955–959 (1981) https://doi.org/10.1116/1.570963

Abstract

View articletitled, Variations in the stoichiometry of thin oxides on silicon as seen in the Si LVV Auger spectrum

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A study of the initial oxidation of polycrystalline Si using surface analysis techniques

L. L. Kazmerski; O. Jamjoum; P. J. Ireland; R. L. Whitney

J. Vac. Sci. Technol. 18, 960–964 (1981) https://doi.org/10.1116/1.570964

Abstract

View articletitled, A study of the initial oxidation of polycrystalline Si using surface analysis techniques

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Thermal nitridation of Si(111) by nitric oxide

M. D. Wiggins; R. J. Baird; P. Wynblatt

J. Vac. Sci. Technol. 18, 965–970 (1981) https://doi.org/10.1116/1.570965

Abstract

View articletitled, Thermal nitridation of Si(111) by nitric oxide

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Summary Abstract: Auger sputter profiling studies of SiO₂ grown in O₂/HCl mixtures

J. W. Rouse; C. R. Helms; B. E. Deal; R. R. Razouk

J. Vac. Sci. Technol. 18, 971–972 (1981) https://doi.org/10.1116/1.570966

View articletitled, Summary Abstract: Auger sputter profiling studies of SiO2 grown in O2/HCl mixtures

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Summary Abstract: MeV ion scattering studies of the(111)Si−SiO₂ interface

R. Haight; W. M. Gibson; T. Narusawa; L. C. Feldman

J. Vac. Sci. Technol. 18, 973 (1981) https://doi.org/10.1116/1.570967

View articletitled, Summary Abstract: MeV ion scattering studies of the(111)Si−SiO2 interface

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A 10¹³/s 14 MeV neutron generator for cancer therapy

R. J. Walko; F. M. Bacon; R. W. Bickes, Jr.; D. F. Cowgill; J. E. Boers; A. A. Riedel; J. B. O’Hagan

J. Vac. Sci. Technol. 18, 975–982 (1981) https://doi.org/10.1116/1.570968

Abstract

View articletitled, A 1013/s 14 MeV neutron generator for cancer therapy

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Ion beam characteristics of a gas‐filled accelerator tube

R. S. Berg; R. W. Bickes, Jr.; J. E. Boers; L. A. Shope

J. Vac. Sci. Technol. 18, 983–986 (1981) https://doi.org/10.1116/1.570969

Abstract

View articletitled, Ion beam characteristics of a gas‐filled accelerator tube

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Measurement of ion energy distribution in an orbitron device

M. L. Feidt; B. Petit

J. Vac. Sci. Technol. 18, 987–993 (1981) https://doi.org/10.1116/1.570970

Abstract

View articletitled, Measurement of ion energy distribution in an orbitron device

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Nitrogen sensitivities of a sample of commercial hot cathode ionization gage tubes

K. E. McCulloh; C. R. Tilford

J. Vac. Sci. Technol. 18, 994–996 (1981) https://doi.org/10.1116/1.570971

Abstract

View articletitled, Nitrogen sensitivities of a sample of commercial hot cathode ionization gage tubes

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Selection and evaluation of an ultrahigh vacuum gate valve for ISABELLE beam line vacuum system

C. L. Foerster; D. McCafferty

J. Vac. Sci. Technol. 18, 997–1000 (1981) https://doi.org/10.1116/1.570972

Abstract

View articletitled, Selection and evaluation of an ultrahigh vacuum gate valve for ISABELLE beam line vacuum system

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Evaluation of ISABELLE full cell ultrahigh vacuum system

C. L. Foerster; J. Briggs; T. S. Chou; P. Stattel

J. Vac. Sci. Technol. 18, 1001–1004 (1981) https://doi.org/10.1116/1.570872

Abstract

View articletitled, Evaluation of ISABELLE full cell ultrahigh vacuum system

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Application of low temperature calorimetry for the measurement of impingement rate of gas molecules

I. Arakawa; Y. Tuzi

J. Vac. Sci. Technol. 18, 1005–1008 (1981) https://doi.org/10.1116/1.570873

Abstract

View articletitled, Application of low temperature calorimetry for the measurement of impingement rate of gas molecules

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A simple understanding of net outgassing rate as a function of pumping speed

G. Horikoshi; M. Kobayashi

J. Vac. Sci. Technol. 18, 1009–1012 (1981) https://doi.org/10.1116/1.570874

Abstract

View articletitled, A simple understanding of net outgassing rate as a function of pumping speed

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Performance of a simplified directional detector for gas molecules

M. Kobayashi; Y. Tuzi; K. Terada

J. Vac. Sci. Technol. 18, 1013–1016 (1981) https://doi.org/10.1116/1.570875

Abstract

View articletitled, Performance of a simplified directional detector for gas molecules

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Measurement of neutral gas density with ionization gauges in plasma physics research

A. Berman

J. Vac. Sci. Technol. 18, 1017–1022 (1981) https://doi.org/10.1116/1.570876

Abstract

View articletitled, Measurement of neutral gas density with ionization gauges in plasma physics research

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Water vapor pressure gauge

D. Edwards, Jr.; D. Gillette

J. Vac. Sci. Technol. 18, 1023–1025 (1981) https://doi.org/10.1116/1.570877

Abstract

View articletitled, Water vapor pressure gauge

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Pumping of corrosive or hazardous gases with turbomolecular and oil‐filled rotary vane backing pumps

K. Fischer; J. Henning; K. Abbel; H. Lotz

J. Vac. Sci. Technol. 18, 1026–1029 (1981) https://doi.org/10.1116/1.570878

Abstract

View articletitled, Pumping of corrosive or hazardous gases with turbomolecular and oil‐filled rotary vane backing pumps

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Mechanical boosters on clean or corrosive applications

N. T. M. Dennis; L. J. Budgen; L. Laurenson

J. Vac. Sci. Technol. 18, 1030–1032 (1981) https://doi.org/10.1116/1.570879

Abstract

View articletitled, Mechanical boosters on clean or corrosive applications

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Vacuum pumping of aggressive and dust laden vapors

P. Connock; A. Devaney; I. Currington

J. Vac. Sci. Technol. 18, 1033–1036 (1981) https://doi.org/10.1116/1.570880

Abstract

View articletitled, Vacuum pumping of aggressive and dust laden vapors

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Material selection for TFTR limiters

M. Ulrickson

J. Vac. Sci. Technol. 18, 1037–1045 (1981) https://doi.org/10.1116/1.570881

Abstract

View articletitled, Material selection for TFTR limiters

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Gas release studies from explosion‐cladded materials

J. H. Craig, Jr.

J. Vac. Sci. Technol. 18, 1046–1048 (1981) https://doi.org/10.1116/1.570882

Abstract

View articletitled, Gas release studies from explosion‐cladded materials

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Mechanical properties of chemical vapor deposited coatings for fusion reactor application

A. W. Mullendore; J. B. Whitley; H. O. Pierson; D. M. Mattox

J. Vac. Sci. Technol. 18, 1049–1053 (1981) https://doi.org/10.1116/1.570883

Abstract

View articletitled, Mechanical properties of chemical vapor deposited coatings for fusion reactor application

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Impurity studies in fusion devices using laser‐fluorescence spectroscopy

W. R. Husinsky

J. Vac. Sci. Technol. 18, 1054–1061 (1981) https://doi.org/10.1116/1.570884

Abstract

View articletitled, Impurity studies in fusion devices using laser‐fluorescence spectroscopy

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Hydrogen isotope analysis by quadrupole mass spectrometry

R. E. Ellefson; W. E. Moddeman; H. F. Dylla

J. Vac. Sci. Technol. 18, 1062–1067 (1981) https://doi.org/10.1116/1.570885

Abstract

View articletitled, Hydrogen isotope analysis by quadrupole mass spectrometry

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Si–C–Al–O compound coatings on molybdenum for application to fusion reactor first wall components

M. Fukutomi; M. Kitajima; T. Shikama; M. Okada; R. Watanabe; H. Yoshida

J. Vac. Sci. Technol. 18, 1068–1071 (1981) https://doi.org/10.1116/1.570886

Abstract

View articletitled, Si–C–Al–O compound coatings on molybdenum for application to fusion reactor first wall components

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Summary Abstract: Surface analysis of TFTR vacuum vessel samples subjected to the post‐weld heat treatment

R. L. Moore; S. A. Cohen; J. L. Cecchi; H. F. Dylla

J. Vac. Sci. Technol. 18, 1072 (1981) https://doi.org/10.1116/1.570887

View articletitled, Summary Abstract: Surface analysis of TFTR vacuum vessel samples subjected to the post‐weld heat treatment

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The compact torus

H. P. Furth

J. Vac. Sci. Technol. 18, 1073–1080 (1981) https://doi.org/10.1116/1.570888

Abstract

View articletitled, The compact torus

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ETF reactor design status

P. H. Sager

J. Vac. Sci. Technol. 18, 1081–1087 (1981) https://doi.org/10.1116/1.570889

Abstract

View articletitled, ETF reactor design status

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ELMO Bumpy Torus: An alternate concept to tokamaks and mirrors

J. C. Glowienka

J. Vac. Sci. Technol. 18, 1088–1097 (1981) https://doi.org/10.1116/1.570890

Abstract

View articletitled, ELMO Bumpy Torus: An alternate concept to tokamaks and mirrors

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Co adsorption on Al‐Zr at room temperature

C. H. Wu; R. L. Moore; S. A. Cohen

J. Vac. Sci. Technol. 18, 1098–1101 (1981) https://doi.org/10.1116/1.570891

Abstract

View articletitled, Co adsorption on Al‐Zr at room temperature

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Titanium gettering in Doublet III

J. S. deGrassie; R. Callis; G. Campbell; J. Garcia; E. Ledin; C. Meyer; J. Miller; P. Petersen; J. Smith; R. Stav; T. Taylor; the Doublet III Group; M. Nagami; the Jaeri Group

J. Vac. Sci. Technol. 18, 1102–1105 (1981) https://doi.org/10.1116/1.570848

Abstract

View articletitled, Titanium gettering in Doublet III

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Thermal decomposition of Ti getter films from the DITE tokamak

M. E. Malinowski

J. Vac. Sci. Technol. 18, 1106–1110 (1981) https://doi.org/10.1116/1.570849

Abstract

View articletitled, Thermal decomposition of Ti getter films from the DITE tokamak

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Effect of hydrogen glow discharge conditioning on Zr/Al getter pumps

H. F. Dylla; J. L. Cecchi; M. Ulrickson

J. Vac. Sci. Technol. 18, 1111–1113 (1981) https://doi.org/10.1116/1.570850

Abstract

View articletitled, Effect of hydrogen glow discharge conditioning on Zr/Al getter pumps

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Nonevaporable getter for ion beam fusion

J. S. Moenich

J. Vac. Sci. Technol. 18, 1114–1116 (1981) https://doi.org/10.1116/1.570851

Abstract

View articletitled, Nonevaporable getter for ion beam fusion

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A nonevaporable low temperature activatable getter material

C. Boffito; B. Ferrario; P. della Porta; L. Rosai

J. Vac. Sci. Technol. 18, 1117–1120 (1981) https://doi.org/10.1116/1.570852

Abstract

View articletitled, A nonevaporable low temperature activatable getter material

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Study of the activation of nonevaporable getters

W. V. Lampert; K. D. Rachocki; B. C. Lamartine; T. W. Haas

J. Vac. Sci. Technol. 18, 1121–1124 (1981) https://doi.org/10.1116/1.570853

Abstract

View articletitled, Study of the activation of nonevaporable getters

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A TSTA compound cryopump

T. H. Batzer; R. E. Patrick; W. R. Call

J. Vac. Sci. Technol. 18, 1125–1130 (1981) https://doi.org/10.1116/1.570854

Abstract

View articletitled, A TSTA compound cryopump

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Performance of BNL‐TSTA compound cryopump

H. C. Hseuh; H. A. Worwetz

J. Vac. Sci. Technol. 18, 1131–1135 (1981) https://doi.org/10.1116/1.570855

Abstract

View articletitled, Performance of BNL‐TSTA compound cryopump

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Doublet III neutral beam cryopumping system

M. A. Otavka; A. P. Colleraine; M. M. Holland; J. Kim

J. Vac. Sci. Technol. 18, 1136–1139 (1981) https://doi.org/10.1116/1.570856

Abstract

View articletitled, Doublet III neutral beam cryopumping system

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Design and preliminary tests of the liquid helium cooled MFTF cryopumping system

J. J. Thibault; J. M. Disdier; G. Arnaud; J. C. Boissin; C. B. Hood

J. Vac. Sci. Technol. 18, 1140–1147 (1981) https://doi.org/10.1116/1.570857

Abstract

View articletitled, Design and preliminary tests of the liquid helium cooled MFTF cryopumping system

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Pumping behavior of sputter ion pumps

T. S. Chou; D. McCafferty

J. Vac. Sci. Technol. 18, 1148–1151 (1981) https://doi.org/10.1116/1.570858

Abstract

View articletitled, Pumping behavior of sputter ion pumps

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In situ observation of a cathode surface contamination of a sputter ion pump by Auger electron spectroscopy

N. Yagi; S. Komiya

J. Vac. Sci. Technol. 18, 1152–1155 (1981) https://doi.org/10.1116/1.570859

View articletitled, In situ observation of a cathode surface contamination of a sputter ion pump by Auger electron spectroscopy

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Ultimate pressure of mechanical pumps and the effectiveness of foreline traps

M. H. Hablanian

J. Vac. Sci. Technol. 18, 1156–1159 (1981) https://doi.org/10.1116/1.570860

Abstract

View articletitled, Ultimate pressure of mechanical pumps and the effectiveness of foreline traps

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Pumped oil feed systems for rotary vacuum pumps

H. Wycliffe; B. D. Power

J. Vac. Sci. Technol. 18, 1160–1163 (1981) https://doi.org/10.1116/1.570861

Abstract

View articletitled, Pumped oil feed systems for rotary vacuum pumps

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Steam ejector‐condenser—stage I of a differential vacuum pumping station

C. L. Hanson; T. W. Alger

J. Vac. Sci. Technol. 18, 1164–1168 (1981) https://doi.org/10.1116/1.570862

Abstract

View articletitled, Steam ejector‐condenser—stage I of a differential vacuum pumping station

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Interrupted pumpdown of a vacuum system

D. Edwards, Jr.

J. Vac. Sci. Technol. 18, 1169–1170 (1981) https://doi.org/10.1116/1.570863

Abstract

View articletitled, Interrupted pumpdown of a vacuum system

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Micromachining applications for ICF target fabrication

H. W. Deckman

J. Vac. Sci. Technol. 18, 1171–1174 (1981) https://doi.org/10.1116/1.570864

Abstract

View articletitled, Micromachining applications for ICF target fabrication

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Microfabrication of hemispherical shells for laser fusion targets

I. S. Goldstein; F. Kalk; J. Trovato

J. Vac. Sci. Technol. 18, 1175–1178 (1981) https://doi.org/10.1116/1.570865

Abstract

View articletitled, Microfabrication of hemispherical shells for laser fusion targets

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Solid‐state processes to produce hemispherical components for inertial fusion targets

K. D. Wise; M. G. Robinson; W. J. Hillegas

J. Vac. Sci. Technol. 18, 1179–1182 (1981) https://doi.org/10.1116/1.570866

Abstract

View articletitled, Solid‐state processes to produce hemispherical components for inertial fusion targets

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Polymeric mandrels—supersmooth finish by an infusion process

D. V. Duchane

J. Vac. Sci. Technol. 18, 1183–1186 (1981) https://doi.org/10.1116/1.570867

Abstract

View articletitled, Polymeric mandrels—supersmooth finish by an infusion process

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Double‐shell inertial confinement fusion target fabrication

C. W. Hatcher; L. E. Lorensen; B. W. Weinstein

J. Vac. Sci. Technol. 18, 1187–1190 (1981) https://doi.org/10.1116/1.570868

Abstract

View articletitled, Double‐shell inertial confinement fusion target fabrication

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Interferometric measurements of multilayer and double‐shell inertial fusion targets

B. W. Weinstein; J. T. Weir; D. L. Willenborg

J. Vac. Sci. Technol. 18, 1191–1194 (1981) https://doi.org/10.1116/1.570869

Abstract

View articletitled, Interferometric measurements of multilayer and double‐shell inertial fusion targets

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A cleaning procedure for inertial fusion targets

E.H. Farnum; A. R. Gutacker; R. Mulford

J. Vac. Sci. Technol. 18, 1195–1197 (1981) https://doi.org/10.1116/1.570892

Abstract

View articletitled, A cleaning procedure for inertial fusion targets

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Metallic coating of microspheres

S. F. Meyer

J. Vac. Sci. Technol. 18, 1198–1204 (1981) https://doi.org/10.1116/1.570893

Abstract

View articletitled, Metallic coating of microspheres

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Recent advances in Pt coating of microspheres by a batch magnetron sputtering process

E. J. Hsieh; S. F. Meyer

J. Vac. Sci. Technol. 18, 1205–1208 (1981) https://doi.org/10.1116/1.570894

Abstract

View articletitled, Recent advances in Pt coating of microspheres by a batch magnetron sputtering process

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Metal coatings for laser fusion targets by electroplating

J. D. Illige; C. M. Yu; S. A. Letts

J. Vac. Sci. Technol. 18, 1209–1213 (1981) https://doi.org/10.1116/1.570895

Abstract

View articletitled, Metal coatings for laser fusion targets by electroplating

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Acoustic microscopy for ICF target analysis

W. L. Bongianni

J. Vac. Sci. Technol. 18, 1214–1217 (1981) https://doi.org/10.1116/1.570896

Abstract

View articletitled, Acoustic microscopy for ICF target analysis

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Plastic coating of microsphere substrates

R. Liepins; M. Campbell; J. S. Clements; J. Hammond; R. J. Fries

J. Vac. Sci. Technol. 18, 1218–1226 (1981) https://doi.org/10.1116/1.570897

Abstract

View articletitled, Plastic coating of microsphere substrates

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Coating laser microspheres with homogeneous low density foams

A. Coudeville; P. Eyharts; J. P. Perrine; L. Rey; R. Rouillard

J. Vac. Sci. Technol. 18, 1227–1230 (1981) https://doi.org/10.1116/1.570898

Abstract

View articletitled, Coating laser microspheres with homogeneous low density foams

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Summary Abstract: Metal loaded poly‐p‐xylylene

Kevin W. Bieg

J. Vac. Sci. Technol. 18, 1231–1232 (1981) https://doi.org/10.1116/1.570899

View articletitled, Summary Abstract: Metal loaded poly‐p‐xylylene

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Polymer shells by the droplet method

L. B. Kool; R. L. Nolen; K. W. Sherwood

J. Vac. Sci. Technol. 18, 1233–1237 (1981) https://doi.org/10.1116/1.570900

Abstract

View articletitled, Polymer shells by the droplet method

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’’Vacuum’’ layer double‐shell cryogenic inertial fusion targets

R. J. Simms; D. L. Musinski; R. B. Jacobs

J. Vac. Sci. Technol. 18, 1238–1241 (1981) https://doi.org/10.1116/1.570901

Abstract

View articletitled, ’’Vacuum’’ layer double‐shell cryogenic inertial fusion targets

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Summary Abstract: Shells from compacted powders

T. P. O’Holleran; R. L. Nolen; R. L. Downs; D. A. Steinman; R. L. Crawley

J. Vac. Sci. Technol. 18, 1242–1243 (1981) https://doi.org/10.1116/1.570902

View articletitled, Summary Abstract: Shells from compacted powders

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Summary Abstract: Addition of bromine as a diagnostic gas to inertial confinement fusion target microspheres

R. L. Morrison

J. Vac. Sci. Technol. 18, 1244–1245 (1981) https://doi.org/10.1116/1.570903

View articletitled, Summary Abstract: Addition of bromine as a diagnostic gas to inertial confinement fusion target microspheres

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Summary Abstract: The fabrication of metal shells

T. P. O’Holleran; T. M. Henderson; R. L. Downs; R. L. Nolen

J. Vac. Sci. Technol. 18, 1246–1247 (1981) https://doi.org/10.1116/1.570904

View articletitled, Summary Abstract: The fabrication of metal shells

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Dependence of the surface morphology of copper coated laser fusion targets on the dc sputter source

I. S. Goldstein; J. Varon

J. Vac. Sci. Technol. 18, 1249–1252 (1981) https://doi.org/10.1116/1.570905

Abstract

View articletitled, Dependence of the surface morphology of copper coated laser fusion targets on the dc sputter source

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Fabrication of stepped foil laser targets

J. M. A. Reichelt; D. W. Sutton; M. C. Porter; R. A. Brown

J. Vac. Sci. Technol. 18, 1253–1254 (1981) https://doi.org/10.1116/1.570906

Abstract

View articletitled, Fabrication of stepped foil laser targets

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In situ seeding of high Z elements with glow discharge polymerized organic coatings

R. L. Crawley; L. B. Kool; R. L. Nolen

J. Vac. Sci. Technol. 18, 1255–1257 (1981) https://doi.org/10.1116/1.570907

Abstract

View articletitled, In situ seeding of high Z elements with glow discharge polymerized organic coatings

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A drill, fill, and plug technique for fabricating laser fusion targets

H. W. Deckman; J. H. Dunsmuir; G. M. Halpern; J. P. Drumheller

J. Vac. Sci. Technol. 18, 1258–1261 (1981) https://doi.org/10.1116/1.570908

Abstract

View articletitled, A drill, fill, and plug technique for fabricating laser fusion targets

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Analysis of x‐ray emission and tritium content from glass Microshell inertial fusion targets

S. M. Alexander; T. M. Henderson

J. Vac. Sci. Technol. 18, 1262–1263 (1981) https://doi.org/10.1116/1.570909

Abstract

View articletitled, Analysis of x‐ray emission and tritium content from glass Microshell inertial fusion targets

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Microradiographic characterization of metal and polymer coated microspheres

R. M. Singleton; J. T. Weir

J. Vac. Sci. Technol. 18, 1264–1267 (1981) https://doi.org/10.1116/1.570910

Abstract

View articletitled, Microradiographic characterization of metal and polymer coated microspheres

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Chemical durability improvement of glass shells

P. R. Anderson; L. A. Scott; J. J. Rolen

J. Vac. Sci. Technol. 18, 1268–1271 (1981) https://doi.org/10.1116/1.570911

Abstract

View articletitled, Chemical durability improvement of glass shells

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Analysis of glass shell blowing gases from metal‐organic gels

R. L. Downs; M. A. Ebner; B. D. Homyk; R. L. Nolen

J. Vac. Sci. Technol. 18, 1272–1275 (1981) https://doi.org/10.1116/1.570912

Abstract

View articletitled, Analysis of glass shell blowing gases from metal‐organic gels

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Furnace profile effects on glass shell formation

T. P. O’Holleran; R. L. Downs; B. D. Homyk

J. Vac. Sci. Technol. 18, 1276–1278 (1981) https://doi.org/10.1116/1.570913

Abstract

View articletitled, Furnace profile effects on glass shell formation

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Tensile testing of glass microshells

J.V. Milewski; R.G. Marsters

J. Vac. Sci. Technol. 18, 1279–1283 (1981) https://doi.org/10.1116/1.570914

Abstract

View articletitled, Tensile testing of glass microshells

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Summary Abstract: Micromachining of laser fusion target parts

J. K. Feuerherd; E. H. Farnum

J. Vac. Sci. Technol. 18, 1284–1285 (1981) https://doi.org/10.1116/1.570915

View articletitled, Summary Abstract: Micromachining of laser fusion target parts

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Summary Abstract: Improved IF cyrogenic‐target production technique

J. T. Murphy; J. R. Miller

J. Vac. Sci. Technol. 18, 1286–1287 (1981) https://doi.org/10.1116/1.570916

View articletitled, Summary Abstract: Improved IF cyrogenic‐target production technique

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Summary Abstract: Fabrication of double shell targets for laser fusion

T. Norimatsu; A. Furusawa; M. Yoshida; Y. Izawa; C. Yamanaka

J. Vac. Sci. Technol. 18, 1288–1289 (1981) https://doi.org/10.1116/1.570917

View articletitled, Summary Abstract: Fabrication of double shell targets for laser fusion

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Summary Abstract: Strength of aluminum‐containing glass shells

W. J. Miller; R. L. Downs; L. A. Scott; R. G. Schneggenburger

J. Vac. Sci. Technol. 18, 1290–1291 (1981) https://doi.org/10.1116/1.570918

Abstract

View articletitled, Summary Abstract: Strength of aluminum‐containing glass shells

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Summary Abstract:Glass‐sealed laser fusion targets containing a gas not permeable through the wall

S. M. Butler; M. H. Thomas

J. Vac. Sci. Technol. 18, 1291–1292 (1981) https://doi.org/10.1116/1.570919

View articletitled, Summary Abstract:Glass‐sealed laser fusion targets containing a gas not permeable through the wall

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Technical and commercial aspects of plasma heat applications in primary melting, secondary remelting and refining operations

G. K. Bhat

J. Vac. Sci. Technol. 18, 1293–1302 (1981) https://doi.org/10.1116/1.570920

Abstract

View articletitled, Technical and commercial aspects of plasma heat applications in primary melting, secondary remelting and refining operations

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E‐beam deposition characteristics of reactively evaporated Ta₂O₅ for optical interference coatings

W. C. Herrmann, Jr.

J. Vac. Sci. Technol. 18, 1303–1305 (1981) https://doi.org/10.1116/1.570921

Abstract

View articletitled, E‐beam deposition characteristics of reactively evaporated Ta2O5 for optical interference coatings

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Summary Abstract: Surface modification by ion chemical and physical erosion

D. J. Sharp; J. K. G. Panitz

J. Vac. Sci. Technol. 18, 1306–1307 (1981) https://doi.org/10.1116/1.570922

View articletitled, Summary Abstract: Surface modification by ion chemical and physical erosion

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Summary Abstract: An advanced multi‐chamber system for preparation of amorphous thin films by coevaporation and their subsequent characterization by AES, ESCA, SIMS and ISS methods

D. M. Sanders; E. N. Farabaugh; W. S. Hurst; W. K. Haller

J. Vac. Sci. Technol. 18, 1308–1310 (1981) https://doi.org/10.1116/1.570923

View articletitled, Summary Abstract: An advanced multi‐chamber system for preparation of amorphous thin films by coevaporation and their subsequent characterization by AES, ESCA, SIMS and ISS methods

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Summary Abstract: Ion bombardment cleaning of liquid gallium surfaces

J. Fine; S. C. Hardy; T. D. Andreadis

J. Vac. Sci. Technol. 18, 1310–1311 (1981) https://doi.org/10.1116/1.570924

View articletitled, Summary Abstract: Ion bombardment cleaning of liquid gallium surfaces

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Vacuum technology video instruction

R. M. Anderson, Jr.

J. Vac. Sci. Technol. 18, 1312–1318 (1981) https://doi.org/10.1116/1.570925

Abstract

View articletitled, Vacuum technology video instruction

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Education in vacuum and surface science at the University of Wisconsin‐Milwaukee

D. Lichtman; R. B. McQuistan

J. Vac. Sci. Technol. 18, 1319–1322 (1981) https://doi.org/10.1116/1.570926

Abstract

View articletitled, Education in vacuum and surface science at the University of Wisconsin‐Milwaukee

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