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Transition metal compound surfaces I: The cubic sodium tungsten bronze (NaxWO3) surface
J. Vac. Sci. Technol. 17, 1287–1295 (1980)
https://doi.org/10.1116/1.570657
Transition metal compound surfaces II: The tungsten trioxide single crystal surface
J. Vac. Sci. Technol. 17, 1296–1302 (1980)
https://doi.org/10.1116/1.570658
The Si(111)–Pd interface: Spectroscopic evidence of chemical processes at liquid nitrogen temperature
J. Vac. Sci. Technol. 17, 1303–1305 (1980)
https://doi.org/10.1116/1.570659
Phosphorus concentration in hydrogenated amorphous silicon using ion‐implanted references
J. Vac. Sci. Technol. 17, 1306–1308 (1980)
https://doi.org/10.1116/1.570660
X‐ray photoelectron spectroscopy study of the surface adsorption of lead naphthenate
J. Vac. Sci. Technol. 17, 1309–1314 (1980)
https://doi.org/10.1116/1.570661
AES study of tin–lead alloys: Effects of ion sputtering and oxidation on surface composition and structure
J. Vac. Sci. Technol. 17, 1315–1319 (1980)
https://doi.org/10.1116/1.570662
Surface texturing of copper by sputter etching with applications for solar selective absorbing surfaces
J. Vac. Sci. Technol. 17, 1320–1325 (1980)
https://doi.org/10.1116/1.570663
Emission spectroscopy of glow‐discharge and sputtering plasmas used in amorphous Si:H film deposition
J. Vac. Sci. Technol. 17, 1332–1335 (1980)
https://doi.org/10.1116/1.570665
Etching and film formation in CF3Br plasmas: some qualitative observations and their general implications
J. Vac. Sci. Technol. 17, 1341–1347 (1980)
https://doi.org/10.1116/1.570667
Plasma etching characteristics of chromium film and its novel etching mode
J. Vac. Sci. Technol. 17, 1351–1357 (1980)
https://doi.org/10.1116/1.570669
Construction and performance characteristics of a low cost energy prefilter
J. Vac. Sci. Technol. 17, 1360–1363 (1980)
https://doi.org/10.1116/1.570671