Journal of Vacuum Science and Technology

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Ultrahigh vacuum applied to physics

P. A. Redhead

J. Vac. Sci. Technol. 13, 5–10 (1976) https://doi.org/10.1116/1.568957

Abstract

View articletitled, Ultrahigh vacuum applied to physics

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Electrochemical reactions of semiconductors

Richard Williams

J. Vac. Sci. Technol. 13, 12–18 (1976) https://doi.org/10.1116/1.568806

Abstract

View articletitled, Electrochemical reactions of semiconductors

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Adhesion aspects of metallization of organic polymer surfaces

K. L. Mittal

J. Vac. Sci. Technol. 13, 19–25 (1976) https://doi.org/10.1116/1.568850

Abstract

View articletitled, Adhesion aspects of metallization of organic polymer surfaces

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Abstract: In‐process intergranular corrosion in Al alloy thin films

P. A. Totta

J. Vac. Sci. Technol. 13, 26–27 (1976) https://doi.org/10.1116/1.568867

Abstract

View articletitled, Abstract: In‐process intergranular corrosion in Al alloy thin films

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Abstract: Recent advances in ion implantation

H. S. Rupprecht

J. Vac. Sci. Technol. 13, 27–28 (1976) https://doi.org/10.1116/1.568825

Abstract

View articletitled, Abstract: Recent advances in ion implantation

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Interface properties of Si on sapphire and spinel

Heinrich Schlötterer

J. Vac. Sci. Technol. 13, 29–36 (1976) https://doi.org/10.1116/1.568832

Abstract

View articletitled, Interface properties of Si on sapphire and spinel

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Abstract: Properties of interfacial defects in III–V compound semiconductors

P. M. Petroff

J. Vac. Sci. Technol. 13, 37 (1976) https://doi.org/10.1116/1.568895

Abstract

View articletitled, Abstract: Properties of interfacial defects in III–V compound semiconductors

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Abstract: Growth morphology and surface‐acoustic‐wave measurements of AlN films on sapphire

K. M. Lakin; J. K. Liu; K. L. Wang

J. Vac. Sci. Technol. 13, 37–38 (1976) https://doi.org/10.1116/1.568896

Abstract

View articletitled, Abstract: Growth morphology and surface‐acoustic‐wave measurements of AlN films on sapphire

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Abstract: Measurement of interfacial bond strength by laser spallation

A. W. Stephens; J. L. Vossen

J. Vac. Sci. Technol. 13, 38–39 (1976) https://doi.org/10.1116/1.568925

Abstract

View articletitled, Abstract: Measurement of interfacial bond strength by laser spallation

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Conversion‐electron Mössbauer spectroscopy of thin films

R. Oswald; M. Ohring

J. Vac. Sci. Technol. 13, 40–44 (1976) https://doi.org/10.1116/1.568932

Abstract

View articletitled, Conversion‐electron Mössbauer spectroscopy of thin films

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XPS studies of surfaces and thin films of small‐band‐gap inorganic azides

P. DiBona; D. A. Wiegand; J. Sharma

J. Vac. Sci. Technol. 13, 45–47 (1976) https://doi.org/10.1116/1.568943

Abstract

View articletitled, XPS studies of surfaces and thin films of small‐band‐gap inorganic azides

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Abstract: AES characterization of oxidized films of Mg, Al, and Si

Y. E. Strausser; J. S. Johannessen

J. Vac. Sci. Technol. 13, 48–49 (1976) https://doi.org/10.1116/1.568905

Abstract

View articletitled, Abstract: AES characterization of oxidized films of Mg, Al, and Si

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Dielectric instability and breakdown in SiO₂ thin films

T. H. DiStefano; M. Shatzkes

J. Vac. Sci. Technol. 13, 50–54 (1976) https://doi.org/10.1116/1.568911

Abstract

View articletitled, Dielectric instability and breakdown in SiO2 thin films

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Interfacial reaction in MOS structures

E. I. Alessandrini; D. R. Campbell; K. N. Tu

J. Vac. Sci. Technol. 13, 55–57 (1976) https://doi.org/10.1116/1.568952

Abstract

View articletitled, Interfacial reaction in MOS structures

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Abstract: Stoichiometry of SiO₂/Si interfacial regions. I. Ultrathin oxide films

S. I. Raider; R. Flitsch

J. Vac. Sci. Technol. 13, 58 (1976) https://doi.org/10.1116/1.568955

Abstract

View articletitled, Abstract: Stoichiometry of SiO2/Si interfacial regions. I. Ultrathin oxide films

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Properties of the native oxide on GaSb

C. W. Fischer; N. Leslie; A. Etchells

J. Vac. Sci. Technol. 13, 59–63 (1976) https://doi.org/10.1116/1.568956

Abstract

View articletitled, Properties of the native oxide on GaSb

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Correlation between the composition profile and electrical conductivity of the thermal and anodic oxides of InSb

C. W. Wilmsen

J. Vac. Sci. Technol. 13, 64–67 (1976) https://doi.org/10.1116/1.568958

Abstract

View articletitled, Correlation between the composition profile and electrical conductivity of the thermal and anodic oxides of InSb

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Kinetics of compound formation in thin film couples of Al and transition metals

J. K. Howard; R. F. Lever; P. J. Smith; P. S. Ho

J. Vac. Sci. Technol. 13, 68–71 (1976) https://doi.org/10.1116/1.568959

Abstract

View articletitled, Kinetics of compound formation in thin film couples of Al and transition metals

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Morphological and electrical properties of rf sputtered Y₂O₃‐doped ZrO₂ thin films

J. E. Greene; C. E. Wickersham; J. L. Zilko; L. B. Welsh; F. R. Szofran

J. Vac. Sci. Technol. 13, 72–75 (1976) https://doi.org/10.1116/1.568960

Abstract

View articletitled, Morphological and electrical properties of rf sputtered Y2O3‐doped ZrO2 thin films

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Introduction to tribology

W. E. Jamison

J. Vac. Sci. Technol. 13, 76–81 (1976) https://doi.org/10.1116/1.568961

Abstract

View articletitled, Introduction to tribology

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Recent work on tribology of ion‐plated thin films

Nobuo Ohmae

J. Vac. Sci. Technol. 13, 82–87 (1976) https://doi.org/10.1116/1.568962

Abstract

View articletitled, Recent work on tribology of ion‐plated thin films

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Wear and interfacial transport of material

Donald H. Buckley

J. Vac. Sci. Technol. 13, 88–95 (1976) https://doi.org/10.1116/1.568963

Abstract

View articletitled, Wear and interfacial transport of material

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Effect of impurities on intrinsic stress in thin Ni films

P. M. Alexander; R. W. Hoffman

J. Vac. Sci. Technol. 13, 96–98 (1976) https://doi.org/10.1116/1.568964

Abstract

View articletitled, Effect of impurities on intrinsic stress in thin Ni films

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Low‐intrinsic‐stress and good‐adhesion alloy thin films

H. C. Tong; C. M. Lo; W. F. Traber

J. Vac. Sci. Technol. 13, 99–101 (1976) https://doi.org/10.1116/1.568965

Abstract

View articletitled, Low‐intrinsic‐stress and good‐adhesion alloy thin films

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Abstract: Adhesion of evaporated metal films to fused silica

Linda D. Yurk

J. Vac. Sci. Technol. 13, 102 (1976) https://doi.org/10.1116/1.568870

Abstract

View articletitled, Abstract: Adhesion of evaporated metal films to fused silica

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Abstract: Materials for integrated optics

Ivan P. Kaminow

J. Vac. Sci. Technol. 13, 102–103 (1976) https://doi.org/10.1116/1.568871

Abstract

View articletitled, Abstract: Materials for integrated optics

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Fabrication of optical waveguides by ion‐beam sputtering

W. D. Westwood; S. J. Ingrey

J. Vac. Sci. Technol. 13, 104–106 (1976) https://doi.org/10.1116/1.568872

Abstract

View articletitled, Fabrication of optical waveguides by ion‐beam sputtering

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UPS, ESCA, and Auger spectroscopy study of vacuum deposited silver halide films

P. S. Von Bacho; G. P. Ceasar; H. M. Saltsburg; R. C. Baetzold

J. Vac. Sci. Technol. 13, 107–111 (1976) https://doi.org/10.1116/1.568873

Abstract

View articletitled, UPS, ESCA, and Auger spectroscopy study of vacuum deposited silver halide films

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Study of Al with a combined Auger electron spectrometer–ellipsometer system

T. H. Allen

J. Vac. Sci. Technol. 13, 112–115 (1976) https://doi.org/10.1116/1.568874

Abstract

View articletitled, Study of Al with a combined Auger electron spectrometer–ellipsometer system

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Abstract: Transparent conducting films

J. L. Vossen

J. Vac. Sci. Technol. 13, 116 (1976) https://doi.org/10.1116/1.568875

Abstract

View articletitled, Abstract: Transparent conducting films

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Transparent conductive Sn‐doped indium oxide coatings deposited by reactive sputtering with a post cathode

John A. Thornton; Virgle L. Hedgcoth

J. Vac. Sci. Technol. 13, 117–121 (1976) https://doi.org/10.1116/1.568876

Abstract

View articletitled, Transparent conductive Sn‐doped indium oxide coatings deposited by reactive sputtering with a post cathode

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Preparation and properties of adherent, transparent, conducting Rh films

Dorothy M. Hoffman; Maurice D. Coutts

J. Vac. Sci. Technol. 13, 122–126 (1976) https://doi.org/10.1116/1.568804

Abstract

View articletitled, Preparation and properties of adherent, transparent, conducting Rh films

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Application of thin films to solar energy utilization

D. M. Mattox

J. Vac. Sci. Technol. 13, 127–134 (1976) https://doi.org/10.1116/1.568805

Abstract

View articletitled, Application of thin films to solar energy utilization

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Optical properties of ultrathin Ag films

S. L. McCarthy

J. Vac. Sci. Technol. 13, 135–138 (1976) https://doi.org/10.1116/1.568807

Abstract

View articletitled, Optical properties of ultrathin Ag films

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Growth and properties of vacuum deposited CuInSe₂ thin films

L. L. Kazmerski; M. S. Ayyagari; F. R. White; G. A. Sanborn

J. Vac. Sci. Technol. 13, 139–144 (1976) https://doi.org/10.1116/1.568808

Abstract

View articletitled, Growth and properties of vacuum deposited CuInSe2 thin films

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Properties of superconducting rf sputtered ultrathin films of Nb

Stuart A. Wolf; James J. Kennedy; Martin Nisenoff

J. Vac. Sci. Technol. 13, 145–147 (1976) https://doi.org/10.1116/1.568809

Abstract

View articletitled, Properties of superconducting rf sputtered ultrathin films of Nb

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Metallurgical considerations with respect to electrodes and interconnection lines for Josephson tunneling circuits

S. K. Lahiri

J. Vac. Sci. Technol. 13, 148–151 (1976) https://doi.org/10.1116/1.568810

Abstract

View articletitled, Metallurgical considerations with respect to electrodes and interconnection lines for Josephson tunneling circuits

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Ti–Cu–Ni–Au (TCNA) compatibility with resistor and bilevel crossover circuit processing

J. H. Thomas, III; J. M. Morabito; N. G. Lesh

J. Vac. Sci. Technol. 13, 152–155 (1976) https://doi.org/10.1116/1.568811

Abstract

View articletitled, Ti–Cu–Ni–Au (TCNA) compatibility with resistor and bilevel crossover circuit processing

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Abstract: AES study of the silicide formation in 85%Ni–15%Pt alloy films

Simon Thomas; Lewis E. Terry

J. Vac. Sci. Technol. 13, 156 (1976) https://doi.org/10.1116/1.568812

Abstract

View articletitled, Abstract: AES study of the silicide formation in 85%Ni–15%Pt alloy films

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Application of high‐rate E×B or magnetron sputtering in the metallization of semiconductor devices

Richard W. Wilson; Lewis E. Terry

J. Vac. Sci. Technol. 13, 157–164 (1976) https://doi.org/10.1116/1.568813

Abstract

View articletitled, Application of high‐rate E×B or magnetron sputtering in the metallization of semiconductor devices

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Electron effects in magnetron sputtering

F. A. Green; B. N. Chapman

J. Vac. Sci. Technol. 13, 165–168 (1976) https://doi.org/10.1116/1.568814

Abstract

View articletitled, Electron effects in magnetron sputtering

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Abstract: Plasma etching of thin metal and dielectric films

R. L. Bersin

J. Vac. Sci. Technol. 13, 169 (1976) https://doi.org/10.1116/1.568815

Abstract

View articletitled, Abstract: Plasma etching of thin metal and dielectric films

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In situ investigation of substrate surface recontamination during glow‐discharge sputter cleaning

G. L. Kominiak; J. E. Uhl

J. Vac. Sci. Technol. 13, 170–174 (1976) https://doi.org/10.1116/1.568816

Abstract

View articletitled, In situ investigation of substrate surface recontamination during glow‐discharge sputter cleaning

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Abstract: Physical vapor deposition of Ga_xIn_1−xSb

R. O. Dillon; R. F. Bunshah; H. A. Beale; V. L. Rehn; N. Bottka

J. Vac. Sci. Technol. 13, 175 (1976) https://doi.org/10.1116/1.568817

Abstract

View articletitled, Abstract: Physical vapor deposition of GaxIn1−xSb

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Abstract: Catalyst preparation by rf sputtering

W. F. Riemath; D. H. Lester

J. Vac. Sci. Technol. 13, 176 (1976) https://doi.org/10.1116/1.568818

Abstract

View articletitled, Abstract: Catalyst preparation by rf sputtering

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Abstract: Steady state mass‐balance analysis of substrate‐biased rf sputtering

D. B. Dove; R. J. Gambino; J. J. Cuomo; R. J. Kobliska

J. Vac. Sci. Technol. 13, 176 (1976) https://doi.org/10.1116/1.568819

Abstract

View articletitled, Abstract: Steady state mass‐balance analysis of substrate‐biased rf sputtering

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Semiconductor surface spectroscopy

J. C. Phillips

J. Vac. Sci. Technol. 13, 178–182 (1976) https://doi.org/10.1116/1.568820

Abstract

View articletitled, Semiconductor surface spectroscopy

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Angular‐resolved Auger emission spectra from a clean Cu(100) surface

J. R. Noonan; D. M. Zehner; L. H. Jenkins

J. Vac. Sci. Technol. 13, 183–187 (1976) https://doi.org/10.1116/1.568821

Abstract

View articletitled, Angular‐resolved Auger emission spectra from a clean Cu(100) surface

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Abstract: Surface structure determination of the layered compounds MoS₂ and NbSe₂ by the dynamical LEED approach

S. Y. Tong; M. Van Hove; B. J. Mrstik; R. Kaplan; T. Reinecke

J. Vac. Sci. Technol. 13, 188 (1976) https://doi.org/10.1116/1.568822

Abstract

View articletitled, Abstract: Surface structure determination of the layered compounds MoS2 and NbSe2 by the dynamical LEED approach

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Atomic geometry of the low‐index surfaces of ZnO: LEED analysis

A. R. Lubinsky; C. B. Duke; S. C. Chang; B. W. Lee; P. Mark

J. Vac. Sci. Technol. 13, 189–192 (1976) https://doi.org/10.1116/1.568823

Abstract

View articletitled, Atomic geometry of the low‐index surfaces of ZnO: LEED analysis

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Study of the spin polarization of field‐emitted electrons from magnetic materials

M. Campagna; T. Utsumi; D. N. E. Buchanan

J. Vac. Sci. Technol. 13, 193–195 (1976) https://doi.org/10.1116/1.568824

Abstract

View articletitled, Study of the spin polarization of field‐emitted electrons from magnetic materials

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Abstract: Greater surface sensitivity of ion neutralization spectroscopy with respect to uv photoemission spectroscopy

Toshio Sakurai; H. D. Hagstrum

J. Vac. Sci. Technol. 13, 196 (1976) https://doi.org/10.1116/1.568847

Abstract

View articletitled, Abstract: Greater surface sensitivity of ion neutralization spectroscopy with respect to uv photoemission spectroscopy

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Abstract: Computer analysis of FIM diffusion studies

D. A. Reed; Gert Ehrlich

J. Vac. Sci. Technol. 13, 196–197 (1976) https://doi.org/10.1116/1.568848

Abstract

View articletitled, Abstract: Computer analysis of FIM diffusion studies

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Relative sputtering yields and quantitative surface analysis by Auger spectroscopy

L. A. West

J. Vac. Sci. Technol. 13, 198–203 (1976) https://doi.org/10.1116/1.568849

Abstract

View articletitled, Relative sputtering yields and quantitative surface analysis by Auger spectroscopy

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Surface segregation in alloys: Equilibrium segregation of Au to the (111) surface of Ni

J. J. Burton; C. R. Helms; R. S. Polizzotti

J. Vac. Sci. Technol. 13, 204–208 (1976) https://doi.org/10.1116/1.568851

Abstract

View articletitled, Surface segregation in alloys: Equilibrium segregation of Au to the (111) surface of Ni

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Alloy work functions: Extended Hückel calculations for Ag–Au and Cu–Au clusters

E. R. Davidson; S. C. Fain, Jr.

J. Vac. Sci. Technol. 13, 209–213 (1976) https://doi.org/10.1116/1.568852

Abstract

View articletitled, Alloy work functions: Extended Hückel calculations for Ag–Au and Cu–Au clusters

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Quantitative Auger electron spectroscopy using elemental sensitivity factors

Paul W. Palmberg

J. Vac. Sci. Technol. 13, 214–218 (1976) https://doi.org/10.1116/1.568853

Abstract

View articletitled, Quantitative Auger electron spectroscopy using elemental sensitivity factors

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Abstract: Cross sections for ionization of inner‐shell electrons by electron impact

C. J. Powell

J. Vac. Sci. Technol. 13, 219–220 (1976) https://doi.org/10.1116/1.568854

Abstract

View articletitled, Abstract: Cross sections for ionization of inner‐shell electrons by electron impact

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Electron attenuation lengths for free‐electron‐like metals

David R. Penn

J. Vac. Sci. Technol. 13, 221–223 (1976) https://doi.org/10.1116/1.568855

Abstract

View articletitled, Electron attenuation lengths for free‐electron‐like metals

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Application of AES to the study of selective sputtering of thin films

A. van Oostrom

J. Vac. Sci. Technol. 13, 224–227 (1976) https://doi.org/10.1116/1.568856

Abstract

View articletitled, Application of AES to the study of selective sputtering of thin films

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Electron‐stimulated processes at solid surfaces

H. H. Madden

J. Vac. Sci. Technol. 13, 228–232 (1976) https://doi.org/10.1116/1.568857

Abstract

View articletitled, Electron‐stimulated processes at solid surfaces

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Photoemission studies of surface and interface states on III–V compounds

W. E. Spicer; P.W. Chye; P. E. Gregory; T. Sukegawa; I. A. Babalola

J. Vac. Sci. Technol. 13, 233–240 (1976) https://doi.org/10.1116/1.568858

Abstract

View articletitled, Photoemission studies of surface and interface states on III–V compounds

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Electronic surface states on clean and oxygen‐exposed GaAs surfaces

R. Ludeke; A. Koma

J. Vac. Sci. Technol. 13, 241–247 (1976) https://doi.org/10.1116/1.568859

Abstract

View articletitled, Electronic surface states on clean and oxygen‐exposed GaAs surfaces

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Abstract: Metal‐induced extrinsic surface states on Si, Ge, and GaAs

J. E. Rowe

J. Vac. Sci. Technol. 13, 248–250 (1976) https://doi.org/10.1116/1.568860

Abstract

View articletitled, Abstract: Metal‐induced extrinsic surface states on Si, Ge, and GaAs

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Abstract: Empty surface states on semiconductors: Their interactions with metal overlayers and their relation to Schottky barriers

W. Gudat; D. E. Eastman; J. L. Freeouf

J. Vac. Sci. Technol. 13, 250–252 (1976) https://doi.org/10.1116/1.568861

Abstract

View articletitled, Abstract: Empty surface states on semiconductors: Their interactions with metal overlayers and their relation to Schottky barriers

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Catalytic reactions on metal surfaces: A review of the recent contributions of surface science

R. J. Madix

J. Vac. Sci. Technol. 13, 253–258 (1976) https://doi.org/10.1116/1.568862

Abstract

View articletitled, Catalytic reactions on metal surfaces: A review of the recent contributions of surface science

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Interaction of CO and O₂ with Ir(111) surfaces

J. Küppers; A. Plagge

J. Vac. Sci. Technol. 13, 259–263 (1976) https://doi.org/10.1116/1.568863

Abstract

View articletitled, Interaction of CO and O2 with Ir(111) surfaces

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Abstract: CO chemisorption on Ir(111)

C. M. Comrie; W. H. Weinberg

J. Vac. Sci. Technol. 13, 264–265 (1976) https://doi.org/10.1116/1.568864

Abstract

View articletitled, Abstract: CO chemisorption on Ir(111)

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Study of the hydrogenation of O adsorbed on Pt

D. M. Collins; J. B. Lee; W. E. Spicer

J. Vac. Sci. Technol. 13, 266–268 (1976) https://doi.org/10.1116/1.568865

Abstract

View articletitled, Study of the hydrogenation of O adsorbed on Pt

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Photoemission from some metals and semiconductors in the energy range 5–350 eV

I. Lindau; P. Pianetta; K. Y. Yu; W. E. Spicer

J. Vac. Sci. Technol. 13, 269–272 (1976) https://doi.org/10.1116/1.568866

Abstract

View articletitled, Photoemission from some metals and semiconductors in the energy range 5–350 eV

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Chemical identification of individual surface atoms in the atom probe

Robert S. Chambers; Gert Ehrlich

J. Vac. Sci. Technol. 13, 273–276 (1976) https://doi.org/10.1116/1.568868

Abstract

View articletitled, Chemical identification of individual surface atoms in the atom probe

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Relationship of heat of chemisorption to π‐ and σ‐level shifts as measured by photoemission

K. Y. Yu; W. E. Spicer; I. Lindau; P. Pianetta; S. F. Lin

J. Vac. Sci. Technol. 13, 277–279 (1976) https://doi.org/10.1116/1.568869

Abstract

View articletitled, Relationship of heat of chemisorption to π‐ and σ‐level shifts as measured by photoemission

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Chemisorption of O and H on the free‐electron‐like metals Al and Mg studied by photoelectron spectroscopy

S. A. Flodström; L.‐G. Petersson; S. B. M. Hagström

J. Vac. Sci. Technol. 13, 280–282 (1976) https://doi.org/10.1116/1.568826

Abstract

View articletitled, Chemisorption of O and H on the free‐electron‐like metals Al and Mg studied by photoelectron spectroscopy

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Abstract: The application of UPS to the study of chemisorption

J. E. Demuth; D. E. Eastman

J. Vac. Sci. Technol. 13, 283–286 (1976) https://doi.org/10.1116/1.568827

Abstract

View articletitled, Abstract: The application of UPS to the study of chemisorption

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Abstract: Chemisorption states of CO on W(110)

C. Leung; M. Vass; R. Gomer

J. Vac. Sci. Technol. 13, 286 (1976) https://doi.org/10.1116/1.568828

Abstract

View articletitled, Abstract: Chemisorption states of CO on W(110)

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UPS studies of virgin CO on W(100)

T. V. Vorburger; D. R. Sandstrom; B. J. Waclawski

J. Vac. Sci. Technol. 13, 287–290 (1976) https://doi.org/10.1116/1.568829

Abstract

View articletitled, UPS studies of virgin CO on W(100)

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Study of the N–Cu(100) system

J. M. Burkstrand; G. G. Kleiman; G. G. Tibbetts; J. C. Tracy

J. Vac. Sci. Technol. 13, 291–295 (1976) https://doi.org/10.1116/1.568830

Abstract

View articletitled, Study of the N–Cu(100) system

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Some aspects of an AES and XPS study of the adsorption of O₂ on Ni

M. P. Hooker; J. T. Grant; T. W. Haas

J. Vac. Sci. Technol. 13, 296–300 (1976) https://doi.org/10.1116/1.568831

Abstract

View articletitled, Some aspects of an AES and XPS study of the adsorption of O2 on Ni

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XPS and UPS studies of the interaction of nitrogen‐containing molecules with nickel: The use of binding energy patterns and relative intensities to diagnose surface species

C. R. Brundle

J. Vac. Sci. Technol. 13, 301–309 (1976) https://doi.org/10.1116/1.568833

Abstract

View articletitled, XPS and UPS studies of the interaction of nitrogen‐containing molecules with nickel: The use of binding energy patterns and relative intensities to diagnose surface species

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Adsorption of nitrogen on perfect Re(0001) planes

Ruichen Liu; Gert Ehrlich

J. Vac. Sci. Technol. 13, 310–313 (1976) https://doi.org/10.1116/1.568834

Abstract

View articletitled, Adsorption of nitrogen on perfect Re(0001) planes

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Chemisorption of N₂ on an Fe(100) surface

G. Ertl; M. Grunze; M. Weiss

J. Vac. Sci. Technol. 13, 314–317 (1976) https://doi.org/10.1116/1.568835

Abstract

View articletitled, Chemisorption of N2 on an Fe(100) surface

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Abstract: Theoretical aspects of bonding in transition metal complexes and clusters

Roald Hoffmann

J. Vac. Sci. Technol. 13, 318 (1976) https://doi.org/10.1116/1.568836

Abstract

View articletitled, Abstract: Theoretical aspects of bonding in transition metal complexes and clusters

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Size effects in catalysis by metal nuclei

J. F. Hamilton

J. Vac. Sci. Technol. 13, 319–324 (1976) https://doi.org/10.1116/1.568837

Abstract

View articletitled, Size effects in catalysis by metal nuclei

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Surface photovoltage and electron energy‐loss spectroscopy of oxygen adsorbed on (112̄0) CdSe

L. J. Brillson

J. Vac. Sci. Technol. 13, 325–328 (1976) https://doi.org/10.1116/1.568838

Abstract

View articletitled, Surface photovoltage and electron energy‐loss spectroscopy of oxygen adsorbed on (112̄0) CdSe

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Chemisorption and Schottky barrier formation of Ga on Si(111) 7×7

G. Margaritondo; S. B. Christman; J. E. Rowe

J. Vac. Sci. Technol. 13, 329–332 (1976) https://doi.org/10.1116/1.568839

Abstract

View articletitled, Chemisorption and Schottky barrier formation of Ga on Si(111) 7×7

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Abstract: Orbital shifts associated with chemical bonding of organic molecules on ZnO nonpolar surfaces

G. W. Rubloff; H. Lüth; W. D. Grobman

J. Vac. Sci. Technol. 13, 333 (1976) https://doi.org/10.1116/1.568840

Abstract

View articletitled, Abstract: Orbital shifts associated with chemical bonding of organic molecules on ZnO nonpolar surfaces

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Abstract: SCF‐Xα‐SW calculation of electronic energy levels for methanol adsorbed on alumina

David C. Foyt; J. M. White

J. Vac. Sci. Technol. 13, 334 (1976) https://doi.org/10.1116/1.568841

Abstract

View articletitled, Abstract: SCF‐Xα‐SW calculation of electronic energy levels for methanol adsorbed on alumina

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Abstract: Photodesorption of CO₂ from ZnO

Y. Shapira; S. M. Cox; David Lichtman

J. Vac. Sci. Technol. 13, 334 (1976) https://doi.org/10.1116/1.568842

Abstract

View articletitled, Abstract: Photodesorption of CO2 from ZnO

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Elementary reactions on surfaces

J. Robert Schrieffer

J. Vac. Sci. Technol. 13, 335–342 (1976) https://doi.org/10.1116/1.568843

Abstract

View articletitled, Elementary reactions on surfaces

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Abstract: Can chemisorption bonding shifts be separated from relaxation‐energy shifts in photoelectron spectroscopy?

J. W. Gadzuk

J. Vac. Sci. Technol. 13, 343–344 (1976) https://doi.org/10.1116/1.568844

Abstract

View articletitled, Abstract: Can chemisorption bonding shifts be separated from relaxation‐energy shifts in photoelectron spectroscopy?

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Interpretation of the electronic spectra of chemisorbed systems

Brian Bell; Anupam Madhukar

J. Vac. Sci. Technol. 13, 345–348 (1976) https://doi.org/10.1116/1.568845

Abstract

View articletitled, Interpretation of the electronic spectra of chemisorbed systems

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Abstract: Chemisorption on a model bcc metal

W. Ho; S. L. Cunningham; W. H. Weinberg

J. Vac. Sci. Technol. 13, 349–350 (1976) https://doi.org/10.1116/1.568846

Abstract

View articletitled, Abstract: Chemisorption on a model bcc metal

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Abstract: Hydrogen and transition metal adatom chemisorption on transition metals as a function of d bandfilling: Tenfold degenerate Hubbard and Anderson models

Edward Siegel

J. Vac. Sci. Technol. 13, 350 (1976) https://doi.org/10.1116/1.568877

Abstract

View articletitled, Abstract: Hydrogen and transition metal adatom chemisorption on transition metals as a function of d bandfilling: Tenfold degenerate Hubbard and Anderson models

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Characterization of surfaces by low‐energy helium scattering

James Horne; David R. Miller

J. Vac. Sci. Technol. 13, 351–354 (1976) https://doi.org/10.1116/1.568878

Abstract

View articletitled, Characterization of surfaces by low‐energy helium scattering

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Semiclassical theories and quantum hardwall calculation of atom surface scattering

R. I. Masel; R. P. Merrill; W. H. Miller

J. Vac. Sci. Technol. 13, 355–359 (1976) https://doi.org/10.1116/1.568879

Abstract

View articletitled, Semiclassical theories and quantum hardwall calculation of atom surface scattering

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Abstract: Selective adsorption in atom‐crystalline surface scattering

H. Chow; E. D. Thompson

J. Vac. Sci. Technol. 13, 360 (1976) https://doi.org/10.1116/1.568880

Abstract

View articletitled, Abstract: Selective adsorption in atom‐crystalline surface scattering

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Abstract: SIMS studies of adsorption on aluminium

Peter H. Dawson

J. Vac. Sci. Technol. 13, 360 (1976) https://doi.org/10.1116/1.568881

Abstract

View articletitled, Abstract: SIMS studies of adsorption on aluminium

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Abstract: A new model for silicon (100) 4×4 and (111) 7×7 LEED patterns

Brenton L. Mattes

J. Vac. Sci. Technol. 13, 360 (1976) https://doi.org/10.1116/1.568882

Abstract

View articletitled, Abstract: A new model for silicon (100) 4×4 and (111) 7×7 LEED patterns

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Abstract: Valence‐band density of states for Si and SiO₂ using Auger electron spectroscopy

J. E. Houston; M. G. Lagally

J. Vac. Sci. Technol. 13, 361 (1976) https://doi.org/10.1116/1.568883

Abstract

View articletitled, Abstract: Valence‐band density of states for Si and SiO2 using Auger electron spectroscopy

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Abstract: Experimental and theoretical studies of angular resolved uv photoemission from single‐crystal surfaces of copper

P. O. Nilsson; L. Ilver

J. Vac. Sci. Technol. 13, 362 (1976) https://doi.org/10.1116/1.568884

Abstract

View articletitled, Abstract: Experimental and theoretical studies of angular resolved uv photoemission from single‐crystal surfaces of copper

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Abstract: Electronic properties of adsorbed layers of nitrogen, oxygen, and sulfur on copper (100)

Gary G. Tibbetts; James M. Burkstrand; J. Charles Tracy

J. Vac. Sci. Technol. 13, 362 (1976) https://doi.org/10.1116/1.568885

Abstract

View articletitled, Abstract: Electronic properties of adsorbed layers of nitrogen, oxygen, and sulfur on copper (100)

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Abstract: Metal interfaces: Adhesive energies and electronic barriers

John Ferrante; John R. Smith

J. Vac. Sci. Technol. 13, 362 (1976) https://doi.org/10.1116/1.568886

Abstract

View articletitled, Abstract: Metal interfaces: Adhesive energies and electronic barriers

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Abstract: Transform‐deconvolution analysis of LEED: The structures of some clean metal surfaces

David L. Adams; Uzi Landman

J. Vac. Sci. Technol. 13, 363 (1976) https://doi.org/10.1116/1.568887

Abstract

View articletitled, Abstract: Transform‐deconvolution analysis of LEED: The structures of some clean metal surfaces

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Abstract: Reaction of atomic hydrogen with chemisorbed species

R. R. Rye

J. Vac. Sci. Technol. 13, 364 (1976) https://doi.org/10.1116/1.568888

Abstract

View articletitled, Abstract: Reaction of atomic hydrogen with chemisorbed species

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Abstract: SCF‐Xα‐SW ionization energies for chemisorbed chalcogens on Ni(001)

S. J. Niemczyk

J. Vac. Sci. Technol. 13, 364–365 (1976) https://doi.org/10.1116/1.568889

Abstract

View articletitled, Abstract: SCF‐Xα‐SW ionization energies for chemisorbed chalcogens on Ni(001)

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Abstract: Recent developments in ion‐beam analysis

James F. Ziegler

J. Vac. Sci. Technol. 13, 367 (1976) https://doi.org/10.1116/1.568890

Abstract

View articletitled, Abstract: Recent developments in ion‐beam analysis

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Computer simulation of surface atom ejection by ion impact

H. F. Helbig

J. Vac. Sci. Technol. 13, 368–373 (1976) https://doi.org/10.1116/1.568891

Abstract

View articletitled, Computer simulation of surface atom ejection by ion impact

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Energy dependence of scattered ion yields in ISS

T. W. Rusch; R. L. Erickson

J. Vac. Sci. Technol. 13, 374–377 (1976) https://doi.org/10.1116/1.568892

Abstract

View articletitled, Energy dependence of scattered ion yields in ISS

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Abstract: Redeposition of sputtered species during ion etching of Cu, Ag, and Au

Alfred C. Miller; A. W. Czanderna

J. Vac. Sci. Technol. 13, 378 (1976) https://doi.org/10.1116/1.568893

Abstract

View articletitled, Abstract: Redeposition of sputtered species during ion etching of Cu, Ag, and Au

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Redeposition of sputtered species by the electric fields of an incident ion beam and sputtered ion

H. F. Helbig; P. J. Adelmann; A. C. Miller; A. W. Czanderna

J. Vac. Sci. Technol. 13, 379–383 (1976) https://doi.org/10.1116/1.568894

Abstract

View articletitled, Redeposition of sputtered species by the electric fields of an incident ion beam and sputtered ion

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Depth profiles of Au overlayers on Ag films

A. W. Czanderna; R. Summermatter

J. Vac. Sci. Technol. 13, 384–387 (1976) https://doi.org/10.1116/1.568897

Abstract

View articletitled, Depth profiles of Au overlayers on Ag films

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Abstract: Depth profiling of solids using a quadrupole mass filter

R. D. Fralick

J. Vac. Sci. Technol. 13, 388 (1976) https://doi.org/10.1116/1.568898

Abstract

View articletitled, Abstract: Depth profiling of solids using a quadrupole mass filter

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Abstract: Repair and maintenance of vacuum‐deposition systems in a production environment

Rex L. Biggerstaff

J. Vac. Sci. Technol. 13, 388 (1976) https://doi.org/10.1116/1.568899

Abstract

View articletitled, Abstract: Repair and maintenance of vacuum‐deposition systems in a production environment

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Abstract: Leak hunting problems associated with controlled thermonuclear fusion experiments

Thomas H. Batzer; John J. Murphy

J. Vac. Sci. Technol. 13, 389 (1976) https://doi.org/10.1116/1.568923

Abstract

View articletitled, Abstract: Leak hunting problems associated with controlled thermonuclear fusion experiments

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Abstract: Coupling of a mass spectrometer to a process control computer for deposition control of superconducting alloys

H. Lutz; D. G. Dimmler; J. Strozier; H. Wiesmann; M. Strongin; D. H. Douglass

J. Vac. Sci. Technol. 13, 389–390 (1976) https://doi.org/10.1116/1.568924

Abstract

View articletitled, Abstract: Coupling of a mass spectrometer to a process control computer for deposition control of superconducting alloys

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Abstract: Recent trends in device fabrication using ion implantation

F. N. Schwettmann

J. Vac. Sci. Technol. 13, 390 (1976) https://doi.org/10.1116/1.568926

Abstract

View articletitled, Abstract: Recent trends in device fabrication using ion implantation

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Residual lattice damage in As‐implanted and annealed Si

S. Mader; A. E. Michel

J. Vac. Sci. Technol. 13, 391–395 (1976) https://doi.org/10.1116/1.568927

Abstract

View articletitled, Residual lattice damage in As‐implanted and annealed Si

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Effect of B, C, N, and Ne ion implantation on the oxidation of polycrystalline Cu

H. M. Naguib; R. J. Kriegler; J. A. Davies; J. B. Mitchell

J. Vac. Sci. Technol. 13, 396–400 (1976) https://doi.org/10.1116/1.568928

Abstract

View articletitled, Effect of B, C, N, and Ne ion implantation on the oxidation of polycrystalline Cu

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Abstract: Tritium diffusion in ceramic materials for thermonuclear reactors

J. D. Fowler, Jr.; R. A. Causey; D. Chandra; T. S. Elleman; K. Verghese

J. Vac. Sci. Technol. 13, 401–402 (1976) https://doi.org/10.1116/1.568929

Abstract

View articletitled, Abstract: Tritium diffusion in ceramic materials for thermonuclear reactors

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Surface texturing by sputter etching

R. S. Berg; G. J. Kominiak

J. Vac. Sci. Technol. 13, 403–405 (1976) https://doi.org/10.1116/1.568930

Abstract

View articletitled, Surface texturing by sputter etching

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Effect of secondary electrons and negative ions on sputtering of films

J. J. Hanak; J. P. Pellicane

J. Vac. Sci. Technol. 13, 406–409 (1976) https://doi.org/10.1116/1.568931

Abstract

View articletitled, Effect of secondary electrons and negative ions on sputtering of films

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Activation of thin film Zn₂SiO₄ phosphors using ion implantation techniques

J. M. Hurd; R. E. Johnston

J. Vac. Sci. Technol. 13, 410–413 (1976) https://doi.org/10.1116/1.568933

Abstract

View articletitled, Activation of thin film Zn2SiO4 phosphors using ion implantation techniques

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AES compositional profiles of mobile ions in the surface region of glass

C. G. Pantano, Jr.; D. B. Dove; G. Y. Onoda, Jr.

J. Vac. Sci. Technol. 13, 414–418 (1976) https://doi.org/10.1116/1.568934

Abstract

View articletitled, AES compositional profiles of mobile ions in the surface region of glass

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Abstract: Surface research for controlled thermonuclear fusion

C. R. Finfgeld

J. Vac. Sci. Technol. 13, 419 (1976) https://doi.org/10.1116/1.568935

Abstract

View articletitled, Abstract: Surface research for controlled thermonuclear fusion

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Ion–solid interaction in fusion reactors

Bernhard M. U. Scherzer

J. Vac. Sci. Technol. 13, 420–428 (1976) https://doi.org/10.1116/1.568936

Abstract

View articletitled, Ion–solid interaction in fusion reactors

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Abstract: Neutron sputtering from metal foils

M. T. Thomas; O. K. Harling; R. L. Brodzinski; L. A. Rancitelli

J. Vac. Sci. Technol. 13, 429 (1976) https://doi.org/10.1116/1.568937

Abstract

View articletitled, Abstract: Neutron sputtering from metal foils

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Hydrogen and helium implantation in vitreous silica

P. L. Mattern; G. J. Thomas; W. Bauer

J. Vac. Sci. Technol. 13, 430–436 (1976) https://doi.org/10.1116/1.568938

Abstract

View articletitled, Hydrogen and helium implantation in vitreous silica

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Measurement and modification of first‐wall surface composition in the Oak Ridge tokamak (ORMAK)

R. E. Clausing; L. C. Emerson; L. Heatherly; R. J. Colchin; J. C. Twichell

J. Vac. Sci. Technol. 13, 437–442 (1976) https://doi.org/10.1116/1.568939

Abstract

View articletitled, Measurement and modification of first‐wall surface composition in the Oak Ridge tokamak (ORMAK)

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Graphite surface erosion and blistering

Benedict Feinberg; Richard S. Post

J. Vac. Sci. Technol. 13, 443–446 (1976) https://doi.org/10.1116/1.568940

Abstract

View articletitled, Graphite surface erosion and blistering

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Abstract: (D, T) neutron radioactive sputtering yields

M. T. Thomas; O. K. Harling; R. L. Brodzinski; L. A. Rancitelli

J. Vac. Sci. Technol. 13, 447–448 (1976) https://doi.org/10.1116/1.568941

Abstract

View articletitled, Abstract: (D, T) neutron radioactive sputtering yields

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Vacuum and wall problems in precursor reactor tokamaks

S. A. Cohen

J. Vac. Sci. Technol. 13, 449–462 (1976) https://doi.org/10.1116/1.568942

Abstract

View articletitled, Vacuum and wall problems in precursor reactor tokamaks

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Thermal desorption of gases from aluminum alloy Al 6061, their rates and activation energies

H. J. Halama; J. C. Herrera

J. Vac. Sci. Technol. 13, 463–466 (1976) https://doi.org/10.1116/1.568944

Abstract

View articletitled, Thermal desorption of gases from aluminum alloy Al 6061, their rates and activation energies

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Operating experience with an UHV system in the vicinity of a fission‐reactor core

R. Dobrozemsky

J. Vac. Sci. Technol. 13, 467–471 (1976) https://doi.org/10.1116/1.568945

Abstract

View articletitled, Operating experience with an UHV system in the vicinity of a fission‐reactor core

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Review of sticking coefficients and sorption capacities of gases on titanium films

D. J. Harra

J. Vac. Sci. Technol. 13, 471–474 (1976) https://doi.org/10.1116/1.568900

Abstract

View articletitled, Review of sticking coefficients and sorption capacities of gases on titanium films

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Abstract: Basic concepts for calculating the characteristics of active carbon

O. Jäntti

J. Vac. Sci. Technol. 13, 475 (1976) https://doi.org/10.1116/1.568901

Abstract

View articletitled, Abstract: Basic concepts for calculating the characteristics of active carbon

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Windowed discharge lamp for 16–70 eV

Carl J. Russo; Roy Kaplow

J. Vac. Sci. Technol. 13, 476–478 (1976) https://doi.org/10.1116/1.568902

Abstract

View articletitled, Windowed discharge lamp for 16–70 eV

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Surface analysis using complementary electronic and chemical measurements

George A. Haas

J. Vac. Sci. Technol. 13, 479–486 (1976) https://doi.org/10.1116/1.568903

Abstract

View articletitled, Surface analysis using complementary electronic and chemical measurements

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Versatile surface spectroscopy sample manipulator

Carl J. Russo; Roy Kaplow

J. Vac. Sci. Technol. 13, 487–489 (1976) https://doi.org/10.1116/1.568904

Abstract

View articletitled, Versatile surface spectroscopy sample manipulator

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Some measurements of Hg vapor pumping pressures in pairs of isotopic species

Lloyd B. Thomas; C. Leon Krueger

J. Vac. Sci. Technol. 13, 490–493 (1976) https://doi.org/10.1116/1.568906

Abstract

View articletitled, Some measurements of Hg vapor pumping pressures in pairs of isotopic species

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Stable pumping with small diffusion pumps

M. H. Hablanian; A. A. Landfors

J. Vac. Sci. Technol. 13, 494–497 (1976) https://doi.org/10.1116/1.568907

Abstract

View articletitled, Stable pumping with small diffusion pumps

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New developments in sputter‐ion pump configurations

Kimo M. Welch

J. Vac. Sci. Technol. 13, 498–502 (1976) https://doi.org/10.1116/1.568908

Abstract

View articletitled, New developments in sputter‐ion pump configurations

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Recent developments in metal‐sealed gate valves

William R. Wheeler

J. Vac. Sci. Technol. 13, 503–506 (1976) https://doi.org/10.1116/1.568909

Abstract

View articletitled, Recent developments in metal‐sealed gate valves

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Integral Auger spectra via tailored modulation techniques

D. J. Pocker; R. W. Springer; F. E. Ruttenberg; T. W. Haas

J. Vac. Sci. Technol. 13, 507–511 (1976) https://doi.org/10.1116/1.568910

Abstract

View articletitled, Integral Auger spectra via tailored modulation techniques

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Abstract: Analysis of grain‐boundary diffusion in thin films: Chromium in gold

P. H. Holloway; D. E. Amos; G. C. Nelson

J. Vac. Sci. Technol. 13, 512 (1976) https://doi.org/10.1116/1.568912

Abstract

View articletitled, Abstract: Analysis of grain‐boundary diffusion in thin films: Chromium in gold

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Abstract: Determination of the surface vs bulk composition of Ag/Au alloys by low‐energy ion‐scattering spectroscopy

G. C. Nelson

J. Vac. Sci. Technol. 13, 512–513 (1976) https://doi.org/10.1116/1.568913

Abstract

View articletitled, Abstract: Determination of the surface vs bulk composition of Ag/Au alloys by low‐energy ion‐scattering spectroscopy

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Composition of binary alloys by simultaneous SIMS and AES measurements

T. Narusawa; T. Satake; S. Komiya

J. Vac. Sci. Technol. 13, 514–518 (1976) https://doi.org/10.1116/1.568914

Abstract

View articletitled, Composition of binary alloys by simultaneous SIMS and AES measurements

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Physical vapor deposition of thick Cr and its carbide and nitride films by hollow‐cathode discharge

Souji Komiya; Kazuyuki Tsuruoka

J. Vac. Sci. Technol. 13, 520–524 (1976) https://doi.org/10.1116/1.568915

Abstract

View articletitled, Physical vapor deposition of thick Cr and its carbide and nitride films by hollow‐cathode discharge

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Abstract: Rolling bimetals in vacuum and inert atmospheres

L. M. Bianchi

J. Vac. Sci. Technol. 13, 525 (1976) https://doi.org/10.1116/1.568916

Abstract

View articletitled, Abstract: Rolling bimetals in vacuum and inert atmospheres

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Carbothermic reduction of refractory metals

R. N. Anderson; N. A. D. Parlee

J. Vac. Sci. Technol. 13, 526–529 (1976) https://doi.org/10.1116/1.568917

Abstract

View articletitled, Carbothermic reduction of refractory metals

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Abstract: Surface depletion in two‐component alloys during evaporation

M. Arita

J. Vac. Sci. Technol. 13, 530 (1976) https://doi.org/10.1116/1.568918

Abstract

View articletitled, Abstract: Surface depletion in two‐component alloys during evaporation

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Abstract: Ion‐plated oxide coatings for protection against corrosion

R. Swaroop; D. E. Meyer; G. W. White

J. Vac. Sci. Technol. 13, 531 (1976) https://doi.org/10.1116/1.568919

Abstract

View articletitled, Abstract: Ion‐plated oxide coatings for protection against corrosion

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Synthesis of TiC–Ni cermets by the activated reactive evaporation process

R. Nimmagadda; R. F. Bunshah

J. Vac. Sci. Technol. 13, 532–535 (1976) https://doi.org/10.1116/1.568920

Abstract

View articletitled, Synthesis of TiC–Ni cermets by the activated reactive evaporation process

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Synthesis and characterization of yttrium oxide (Y₂O₃) deposits

M. Colen; R. F. Bunshah

J. Vac. Sci. Technol. 13, 536–539 (1976) https://doi.org/10.1116/1.568921

Abstract

View articletitled, Synthesis and characterization of yttrium oxide (Y2O3) deposits

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Abstract: The microbalance in chemisorption and catalysis

D. A. Cadenhead

J. Vac. Sci. Technol. 13, 541 (1976) https://doi.org/10.1116/1.568922

Abstract

View articletitled, Abstract: The microbalance in chemisorption and catalysis

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Abstract: Vacuum microbalance investigations on the kinetics of the reduction of CdO with CO

D. Hofmann; W. Hirschwald; M. Grunze

J. Vac. Sci. Technol. 13, 542 (1976) https://doi.org/10.1116/1.568946

Abstract

View articletitled, Abstract: Vacuum microbalance investigations on the kinetics of the reduction of CdO with CO

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Use of vacuum microbalances for determining physical adsorption isotherms of vapors on solids

P. A. Cutting; N. D. Parkyns

J. Vac. Sci. Technol. 13, 543–548 (1976) https://doi.org/10.1116/1.568947

Abstract

View articletitled, Use of vacuum microbalances for determining physical adsorption isotherms of vapors on solids

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Adsorption and desorption of water on Au by the quartz‐crystal‐oscillator method

J. H. Thomas, III; S. P. Sharma

J. Vac. Sci. Technol. 13, 549–551 (1976) https://doi.org/10.1116/1.568948

Abstract

View articletitled, Adsorption and desorption of water on Au by the quartz‐crystal‐oscillator method

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Abstract: A system for studying the initial states of gas–metal reactions

G. H. Andrews, Jr.; R. M. Alire; A. W. Czanderna

J. Vac. Sci. Technol. 13, 552 (1976) https://doi.org/10.1116/1.568949

Abstract

View articletitled, Abstract: A system for studying the initial states of gas–metal reactions

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Vacuum microbalance for determining sputtering yields operable in the vicinity of a magnetically confined, low‐pressure arc discharge

R. G. Hart; C. B. Cooper

J. Vac. Sci. Technol. 13, 553–555 (1976) https://doi.org/10.1116/1.568950

Abstract

View articletitled, Vacuum microbalance for determining sputtering yields operable in the vicinity of a magnetically confined, low‐pressure arc discharge

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Photoelectrically automated, bakeable, high‐load ultramicrobalance

A. W. Czanderna; W. Kollen; J. R. Biegen; J. Rodder

J. Vac. Sci. Technol. 13, 556–559 (1976) https://doi.org/10.1116/1.568951

Abstract

View articletitled, Photoelectrically automated, bakeable, high‐load ultramicrobalance

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Abstract: Thermogravimetric device operating up to 2300 °C under controlled atmospheres

B. Granier; R. Renard; J. P. Coutures

J. Vac. Sci. Technol. 13, 560 (1976) https://doi.org/10.1116/1.568953

Abstract

View articletitled, Abstract: Thermogravimetric device operating up to 2300 °C under controlled atmospheres

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Abstract: Microthermogravimetry: A new symmetrical microthermoanalyzer from −196 °C up to 1700 °C with combined micro DTA and EGA

Bruno Jalon

J. Vac. Sci. Technol. 13, 560 (1976) https://doi.org/10.1116/1.568954

Abstract

View articletitled, Abstract: Microthermogravimetry: A new symmetrical microthermoanalyzer from −196 °C up to 1700 °C with combined micro DTA and EGA

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Issues