Journal of Vacuum Science and Technology

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Soft x-ray appearance potential spectroscopy

Robert L. Park; J. E. Houston

J. Vac. Sci. Technol. 11, 1–18 (1974) https://doi.org/10.1116/1.1318567

Abstract

View articletitled, Soft x-ray appearance potential spectroscopy

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Miscellaneous topics in Auger electron spectroscopy

L. A. Harris

J. Vac. Sci. Technol. 11, 23–28 (1974) https://doi.org/10.1116/1.1318578

Abstract

View articletitled, Miscellaneous topics in Auger electron spectroscopy

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The danger of “relevance” in fundamental research

Hans Mark

J. Vac. Sci. Technol. 11, 29–31 (1974) https://doi.org/10.1116/1.1318604

View articletitled, The danger of “relevance” in fundamental research

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Abstract: Organic polymer films formed in an rf discharge with applications for integrated optics

G. Smolinsky

J. Vac. Sci. Technol. 11, 33 (1974) https://doi.org/10.1116/1.1318613

View articletitled, Abstract: Organic polymer films formed in an rf discharge with applications for integrated optics

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The influence of bias on the depostion of metallic films in rf and dc sputtering

J. J. Cuomo; R. J. Gambino; R. Rosenberg

J. Vac. Sci. Technol. 11, 34–40 (1974) https://doi.org/10.1116/1.1318617

Abstract

View articletitled, The influence of bias on the depostion of metallic films in rf and dc sputtering

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Abstract: rf sputtering of ZnO films

H. W. Lehmann; R. Widmer

J. Vac. Sci. Technol. 11, 41 (1974) https://doi.org/10.1116/1.1318643

View articletitled, Abstract: rf sputtering of ZnO films

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Abstract: Electron effects in sputtering

B. N. Chapman; D. Downer; L. J. M. Guimarães

J. Vac. Sci. Technol. 11, 42 (1974) https://doi.org/10.1116/1.1318647

View articletitled, Abstract: Electron effects in sputtering

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rf bias evaporation (ion plating) of nonmetal thin films

J. Gordon Davy; J. J. Hanak

J. Vac. Sci. Technol. 11, 43–46 (1974) https://doi.org/10.1116/1.1318650

Abstract

View articletitled, rf bias evaporation (ion plating) of nonmetal thin films

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The role of dc self-bias potential in the control of rf sputtering

Lawrence T. Lamont, Jr.; Frederick T. Turner

J. Vac. Sci. Technol. 11, 47–51 (1974) https://doi.org/10.1116/1.1318659

Abstract

View articletitled, The role of dc self-bias potential in the control of rf sputtering

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Incorporation and behavior of helium in co-deposited films

R. S. Berg; G. J. Kominiak; D. M. Mattox

J. Vac. Sci. Technol. 11, 52–55 (1974) https://doi.org/10.1116/1.1318660

Abstract

View articletitled, Incorporation and behavior of helium in co-deposited films

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Sputter deposition of ${Cd}_{1−x} {Zn}_{x} S$ photoconductive films

D. B. Fraser; H. D. Cook

J. Vac. Sci. Technol. 11, 56–59 (1974) https://doi.org/10.1116/1.1318661

Abstract

View articletitled, Sputter deposition of <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">Cd</mi><mrow><mtext>1−x</mtext></mrow></msub><mi xmlns=""> </mi><msub xmlns=""><mi mathvariant="normal">Zn</mi><mrow><mi>x</mi></mrow></msub><mi xmlns=""> </mi><mi mathvariant="normal" xmlns="">S</mi></math> photoconductive films

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Processes for multilevel metallization

J. L. Vossen; G. L. Schnable; W. Kern

J. Vac. Sci. Technol. 11, 60–70 (1974) https://doi.org/10.1116/1.1318662

Abstract

View articletitled, Processes for multilevel metallization

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Abstract: Composite film interface control by sequential sputtering

Rindge Shima

J. Vac. Sci. Technol. 11, 71 (1974) https://doi.org/10.1116/1.1318663

View articletitled, Abstract: Composite film interface control by sequential sputtering

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Step coverage in the vacuum deposition of thin metal films

T. C. Tisone; J. B. Bindell

J. Vac. Sci. Technol. 11, 72–76 (1974) https://doi.org/10.1116/1.1318664

Abstract

View articletitled, Step coverage in the vacuum deposition of thin metal films

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An evaporation system for the metallization of bilevel substrates

R. H. Davis; S. R. Deo

J. Vac. Sci. Technol. 11, 77–80 (1974) https://doi.org/10.1116/1.1318665

Abstract

View articletitled, An evaporation system for the metallization of bilevel substrates

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Fabrication of experimental Josephson tunneling circuits

J. H. Greiner; S. Basavaiah; I. Ames

J. Vac. Sci. Technol. 11, 81–84 (1974) https://doi.org/10.1116/1.1318666

Abstract

View articletitled, Fabrication of experimental Josephson tunneling circuits

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Abstract: Photosensitive field emission from silicon

R. N. Thomas; D. K. Schroder; H. C. Nathanson

J. Vac. Sci. Technol. 11, 85 (1974) https://doi.org/10.1116/1.1318667

View articletitled, Abstract: Photosensitive field emission from silicon

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Analysis of thin-film structures with nuclear backscattering and x-ray diffraction

J. W. Mayer; K. N. Tu

J. Vac. Sci. Technol. 11, 86–93 (1974) https://doi.org/10.1116/1.1318668

Abstract

View articletitled, Analysis of thin-film structures with nuclear backscattering and x-ray diffraction

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Abstract: The capabilities and limitations of photolithography

H. O. Hook

J. Vac. Sci. Technol. 11, 94 (1974) https://doi.org/10.1116/1.1318669

View articletitled, Abstract: The capabilities and limitations of photolithography

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Abstract: Electron-sensitive resists for microfabrication

M. Hatzakis

J. Vac. Sci. Technol. 11, 95 (1974) https://doi.org/10.1116/1.1318670

View articletitled, Abstract: Electron-sensitive resists for microfabrication

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Abstract: Properties of electron-beam-fabricated Josephson microbridges

R. B. Laibowitz; M. Hatzakis; J. M. Viggiano

J. Vac. Sci. Technol. 11, 96 (1974) https://doi.org/10.1116/1.1318671

View articletitled, Abstract: Properties of electron-beam-fabricated Josephson microbridges

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Observation of switching phenomena in discontinuous gold films by liquid-crystal technique

S. K. Dey; G. D. Dick

J. Vac. Sci. Technol. 11, 97–100 (1974) https://doi.org/10.1116/1.1318672

Abstract

View articletitled, Observation of switching phenomena in discontinuous gold films by liquid-crystal technique

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Surface profile measurements — a survey of applications in the area of vacuum deposition

G. Breitweiser

J. Vac. Sci. Technol. 11, 101–105 (1974) https://doi.org/10.1116/1.1318536

Abstract

View articletitled, Surface profile measurements — a survey of applications in the area of vacuum deposition

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Thin-film adhesion

B. N. Chapman

J. Vac. Sci. Technol. 11, 106–113 (1974) https://doi.org/10.1116/1.1318537

Abstract

View articletitled, Thin-film adhesion

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Adhesion of chromium films to soda lime glass

Neil M. Poley; Howard L. Whitaker

J. Vac. Sci. Technol. 11, 114–118 (1974) https://doi.org/10.1116/1.1318538

Abstract

View articletitled, Adhesion of chromium films to soda lime glass

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The effect of substrate bias voltage on the bonding of evaporated silver coatings

P. S. McLeod; G. Mah

J. Vac. Sci. Technol. 11, 119–121 (1974) https://doi.org/10.1116/1.1318539

Abstract

View articletitled, The effect of substrate bias voltage on the bonding of evaporated silver coatings

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Electrical interface barriers

T. C. McGill; C. A. Mead

J. Vac. Sci. Technol. 11, 122–127 (1974) https://doi.org/10.1116/1.1318540

Abstract

View articletitled, Electrical interface barriers

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Abstract: Contact potential measurement of the charge distribution in thin ${SiO}_{2}$ films

M. Ohring; R. Oswald; M. Bess

J. Vac. Sci. Technol. 11, 128 (1974) https://doi.org/10.1116/1.1318541

View articletitled, Abstract: Contact potential measurement of the charge distribution in thin <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">SiO</mi><mrow><mn>2</mn></mrow></msub></math> films

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Abstract: A preliminary investigation of a 2.1-eV trap in the anodic oxide of sputtered beta-tantalum

J. H. Thomas, III

J. Vac. Sci. Technol. 11, 129 (1974) https://doi.org/10.1116/1.1318542

View articletitled, Abstract: A preliminary investigation of a 2.1-eV trap in the anodic oxide of sputtered beta-tantalum

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Abstract: Examples of constrained and metastable structures in sputtered epitaxial films of oxides and semiconductor compounds

M. H. Francombe; A. J. Noreika; W. J. Takei; S. Y. Wu

J. Vac. Sci. Technol. 11, 130 (1974) https://doi.org/10.1116/1.1318543

View articletitled, Abstract: Examples of constrained and metastable structures in sputtered epitaxial films of oxides and semiconductor compounds

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Abstract: Characteristics of metastable films

S. Mader

J. Vac. Sci. Technol. 11, 131 (1974) https://doi.org/10.1116/1.1318544

View articletitled, Abstract: Characteristics of metastable films

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Summary of in situ epitaxial nucleation and growth measurements

Helmut Poppa; R. Dale Moorhead; Klaus Heinemann

J. Vac. Sci. Technol. 11, 132–135 (1974) https://doi.org/10.1116/1.1318545

Abstract

View articletitled, Summary of in situ epitaxial nucleation and growth measurements

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Direct observations of the growth of sputtered silver and gold films on (111) silicon substrates

J. S. Maa; J. I. Lee; Thos. E. Hutchinson

J. Vac. Sci. Technol. 11, 136–139 (1974) https://doi.org/10.1116/1.1318546

Abstract

View articletitled, Direct observations of the growth of sputtered silver and gold films on (111) silicon substrates

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The initial epitaxy of Cu on (111) Ag films

C. T. Horng; R. W. Vook

J. Vac. Sci. Technol. 11, 140–143 (1974) https://doi.org/10.1116/1.1318547

Abstract

View articletitled, The initial epitaxy of Cu on (111) Ag films

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Abstract: Heterogeneity and dielectric properties of amorphous selenium bismuth films

I. S. Goldstein

J. Vac. Sci. Technol. 11, 144 (1974) https://doi.org/10.1116/1.1318548

View articletitled, Abstract: Heterogeneity and dielectric properties of amorphous selenium bismuth films

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rf-sputtered amorphous Si/crystalline Si junctions

L. Mei; J. E. Greene

J. Vac. Sci. Technol. 11, 145–148 (1974) https://doi.org/10.1116/1.1318549

Abstract

View articletitled, rf-sputtered amorphous Si/crystalline Si junctions

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Abstract: Crystal structures and superconducting transition temperatures of reactively sputtered tungsten carbide thin films

F. M. Kilbane

J. Vac. Sci. Technol. 11, 149 (1974) https://doi.org/10.1116/1.1318550

View articletitled, Abstract: Crystal structures and superconducting transition temperatures of reactively sputtered tungsten carbide thin films

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Optical modulation in thin films

H. F. Taylor

J. Vac. Sci. Technol. 11, 150–155 (1974) https://doi.org/10.1116/1.1318551

Abstract

View articletitled, Optical modulation in thin films

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Thin dielectric films for integrated optics

R. Ulrich

J. Vac. Sci. Technol. 11, 156–162 (1974) https://doi.org/10.1116/1.1318552

Abstract

View articletitled, Thin dielectric films for integrated optics

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Electrical and optical properties of rf triode-sputtered Au films

R. H. Cornely; N. Fuschillo

J. Vac. Sci. Technol. 11, 163–166 (1974) https://doi.org/10.1116/1.1318553

Abstract

View articletitled, Electrical and optical properties of rf triode-sputtered Au films

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Abstract: Combination moisture resistant and antireflection plasma-polymerized thin films for optical coatings

John R. Hollahan; Theodore Wydeven; Catherine C. Johnson

J. Vac. Sci. Technol. 11, 167 (1974) https://doi.org/10.1116/1.1318554

View articletitled, Abstract: Combination moisture resistant and antireflection plasma-polymerized thin films for optical coatings

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Residual gas analysis studies during sputtering of reactive metals

Donald E. Meyer

J. Vac. Sci. Technol. 11, 168–173 (1974) https://doi.org/10.1116/1.1318555

Abstract

View articletitled, Residual gas analysis studies during sputtering of reactive metals

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Abstract: Glow discharge optical spectroscopy for monitoring sputter deposition

F. Sequeda-Osorio; J. E. Greene

J. Vac. Sci. Technol. 11, 174 (1974) https://doi.org/10.1116/1.1318556

View articletitled, Abstract: Glow discharge optical spectroscopy for monitoring sputter deposition

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Analysis of an ${Ar–O}_{2} - N_{2}$ discharge for tantalum sputtering

W. D. Westwood

J. Vac. Sci. Technol. 11, 175–178 (1974) https://doi.org/10.1116/1.1318557

Abstract

View articletitled, Analysis of an <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">Ar–O</mi><mrow><mn>2</mn></mrow></msub><mi xmlns="">–</mi><msub xmlns=""><mi mathvariant="normal">N</mi><mrow><mn>2</mn></mrow></msub></math> discharge for tantalum sputtering

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Surface crystallography via elastic low-energy electron diffraction

C. B. Duke; N. O. Lipari; G. E. Laramore

J. Vac. Sci. Technol. 11, 180–187 (1974) https://doi.org/10.1116/1.1318558

Abstract

View articletitled, Surface crystallography via elastic low-energy electron diffraction

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Abstract: Dynamical LEED theory and surface geometry

J. B. Pendry

J. Vac. Sci. Technol. 11, 188 (1974) https://doi.org/10.1116/1.1318559

View articletitled, Abstract: Dynamical LEED theory and surface geometry

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Abstract: A LEED-AES study of the oxidation of Fe(100) and Fe(110)

C. Leygraf; S. Ekelund

J. Vac. Sci. Technol. 11, 189 (1974) https://doi.org/10.1116/1.1318560

View articletitled, Abstract: A LEED-AES study of the oxidation of Fe(100) and Fe(110)

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Abstract: LEED spectra analysis of $c(2×2)$ structures of oxygen, sulfur, selenium, and tellurium adsorbed an Ni(001)

J. E. Demuth; D. W. Jepsen; P. M. Marcus

J. Vac. Sci. Technol. 11, 190 (1974) https://doi.org/10.1116/1.1318561

View articletitled, Abstract: LEED spectra analysis of <math xmlns="http://www.w3.org/1998/Math/MathML"><mtext xmlns="">c(2×2)</mtext></math> structures of oxygen, sulfur, selenium, and tellurium adsorbed an Ni(001)

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Abstract: Sodium adsorption on aluminum (100) and (111) surfaces: ELEED, Auger, and contact potential measurements

J. O. Porteus

J. Vac. Sci. Technol. 11, 191 (1974) https://doi.org/10.1116/1.1318562

View articletitled, Abstract: Sodium adsorption on aluminum (100) and (111) surfaces: ELEED, Auger, and contact potential measurements

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Abstract: Structure of Cu(100) from LEED

J. M. Burkstrand; G. G. Kleiman

J. Vac. Sci. Technol. 11, 192 (1974) https://doi.org/10.1116/1.1318563

View articletitled, Abstract: Structure of Cu(100) from LEED

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Abstract: Attenuation, inner potential, and lattice dynamics in LEED from Ni(001)

W. N. Unertl; M. B. Webb

J. Vac. Sci. Technol. 11, 193 (1974) https://doi.org/10.1116/1.1318564

View articletitled, Abstract: Attenuation, inner potential, and lattice dynamics in LEED from Ni(001)

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Abstract: LEED intensity measurements for oxygen on W(110)

J. C. Buchholz; M. G. Lagally

J. Vac. Sci. Technol. 11, 194 (1974) https://doi.org/10.1116/1.1318565

View articletitled, Abstract: LEED intensity measurements for oxygen on W(110)

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Surface structure determination via a transform-deconvolution method

Uzi Landman; D. L. Adams

J. Vac. Sci. Technol. 11, 195–200 (1974) https://doi.org/10.1116/1.1318566

Abstract

View articletitled, Surface structure determination via a transform-deconvolution method

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LEED from ordered overlayers: A description of the cross section in terms of substrate layer scattering matrices

A. Liebsch

J. Vac. Sci. Technol. 11, 201–204 (1974) https://doi.org/10.1116/1.1318568

Abstract

View articletitled, LEED from ordered overlayers: A description of the cross section in terms of substrate layer scattering matrices

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Abstract: Analysis of low-energy electron diffraction intensity profiles from the (100) and (111) faces of copper

G. E. Laramore

J. Vac. Sci. Technol. 11, 205 (1974) https://doi.org/10.1116/1.1318569

View articletitled, Abstract: Analysis of low-energy electron diffraction intensity profiles from the (100) and (111) faces of copper

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The crystallographic distribution of field-desorbed species

J. A. Panitz

J. Vac. Sci. Technol. 11, 206–210 (1974) https://doi.org/10.1116/1.1318570

Abstract

View articletitled, The crystallographic distribution of field-desorbed species

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Abstract: Direct visualization of adatom sites on a tungsten (111) surface

W. R. Graham; Gert Ehrlich

J. Vac. Sci. Technol. 11, 211 (1974) https://doi.org/10.1116/1.1318571

View articletitled, Abstract: Direct visualization of adatom sites on a tungsten (111) surface

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The application of electron spectroscopy to surface studies

C. R. Brundle

J. Vac. Sci. Technol. 11, 212–224 (1974) https://doi.org/10.1116/1.1318572

Abstract

View articletitled, The application of electron spectroscopy to surface studies

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Abstract: ESCA study of carbon monoxide and oxygen chemisorbed on tungsten

John T. Yates, Jr.; Theodore E. Madey; Nils E. Erickson

J. Vac. Sci. Technol. 11, 225 (1974) https://doi.org/10.1116/1.1318573

View articletitled, Abstract: ESCA study of carbon monoxide and oxygen chemisorbed on tungsten

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Abstract: ESCA study of xenon physisorbed on platinum

N. E. Erickson

J. Vac. Sci. Technol. 11, 226 (1974) https://doi.org/10.1116/1.1318574

View articletitled, Abstract: ESCA study of xenon physisorbed on platinum

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Quantitative comparison of Ti and TiO surfaces using Auger electron and soft x-ray appearance potential spectroscopies

J. T. Grant; T. W. Haas; J. E. Houston

J. Vac. Sci. Technol. 11, 227–230 (1974) https://doi.org/10.1116/1.1318575

Abstract

View articletitled, Quantitative comparison of Ti and TiO surfaces using Auger electron and soft x-ray appearance potential spectroscopies

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Surface structure analysis by ion scattering

H. H. Brongersma

J. Vac. Sci. Technol. 11, 231–235 (1974) https://doi.org/10.1116/1.1318576

Abstract

View articletitled, Surface structure analysis by ion scattering

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Clusters, chemisorption, and catalysis

K. H. Johnson; R. P. Messmer

J. Vac. Sci. Technol. 11, 236–242 (1974) https://doi.org/10.1116/1.1318577

Abstract

View articletitled, Clusters, chemisorption, and catalysis

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Abstract: Molecular beam study of CO oxidation on a (111) platinum surface

Robert L. Palmer; Joe N. Smith, Jr.

J. Vac. Sci. Technol. 11, 243 (1974) https://doi.org/10.1116/1.1318579

View articletitled, Abstract: Molecular beam study of CO oxidation on a (111) platinum surface

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The interaction of hydrogen with Ni(110)

T. N. Taylor; P. J. Estrup

J. Vac. Sci. Technol. 11, 244–247 (1974) https://doi.org/10.1116/1.1318580

Abstract

View articletitled, The interaction of hydrogen with Ni(110)

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Abstract: Oxidation of carbon monoxide on palladium

Robert L. Park; D. G. Schreiner

J. Vac. Sci. Technol. 11, 248 (1974) https://doi.org/10.1116/1.1318581

View articletitled, Abstract: Oxidation of carbon monoxide on palladium

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Abstract: Structure sensitivity, steric hindrance, and surface chemistry

Robert L. Burwell, Jr.; Harold H. Kung; Donald Barry

J. Vac. Sci. Technol. 11, 249 (1974) https://doi.org/10.1116/1.1318582

View articletitled, Abstract: Structure sensitivity, steric hindrance, and surface chemistry

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Abstract: Correlation between the catalytic activity and the surface structure of platinum crystals

G. A. Somorjai

J. Vac. Sci. Technol. 11, 250 (1974) https://doi.org/10.1116/1.1318583

View articletitled, Abstract: Correlation between the catalytic activity and the surface structure of platinum crystals

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Abstract: The role of steric, overlap, and correlation effects in chemisorption theory

J. Robert Schrieffer

J. Vac. Sci. Technol. 11, 251 (1974) https://doi.org/10.1116/1.1318584

View articletitled, Abstract: The role of steric, overlap, and correlation effects in chemisorption theory

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Catalysis and surfaces

T. E. Fischer

J. Vac. Sci. Technol. 11, 252–260 (1974) https://doi.org/10.1116/1.1318585

Abstract

View articletitled, Catalysis and surfaces

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Abstract: Chemisorption of $H_{2}$ on W(211)

R. R. Rye; B. D. Barford; P. G. Cartier

J. Vac. Sci. Technol. 11, 261 (1974) https://doi.org/10.1116/1.1318586

View articletitled, Abstract: Chemisorption of <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">H</mi><mrow><mn>2</mn></mrow></msub></math> on W(211)

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Inelastic electron tunneling spectroscopy of phenol and hydroquinone chemisorbed on alumina

B. F. Lewis; W. M. Bowser; J. L. Horn, Jr.; T. Luu; W. H. Weinberg

J. Vac. Sci. Technol. 11, 262–265 (1974) https://doi.org/10.1116/1.1318587

Abstract

View articletitled, Inelastic electron tunneling spectroscopy of phenol and hydroquinone chemisorbed on alumina

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Abstract: Surface microcatalysis: the HCOOH decomposition on Ni(110) and Ni(110) $C (4×5)$

J. McCarty; J. Falconer; R. J. Madix

J. Vac. Sci. Technol. 11, 266 (1974) https://doi.org/10.1116/1.1318588

View articletitled, Abstract: Surface microcatalysis: the HCOOH decomposition on Ni(110) and Ni(110) <math xmlns="http://www.w3.org/1998/Math/MathML"><mi mathvariant="normal" xmlns="">C</mi><mtext xmlns="">(4×5)</mtext></math>

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Abstract: Energy dissipation in catalysis

Ch. Steinbrüchel; L. D. Schmidt

J. Vac. Sci. Technol. 11, 267–270 (1974) https://doi.org/10.1116/1.1493053

Abstract

View articletitled, Abstract: Energy dissipation in catalysis

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Abstract: Surface reflectance spectroscopy (SRS) studies of chemisorption on W(100)

J. Anderson; G. W. Rubloff; M. A. Passler; P. J. Stiles

J. Vac. Sci. Technol. 11, 271 (1974) https://doi.org/10.1116/1.1318590

View articletitled, Abstract: Surface reflectance spectroscopy (SRS) studies of chemisorption on W(100)

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Abstract: Surface electronic structure via generalized Wannier functions

J. R. Smith; J. G. Gay

J. Vac. Sci. Technol. 11, 272 (1974) https://doi.org/10.1116/1.1318591

View articletitled, Abstract: Surface electronic structure via generalized Wannier functions

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Abstract: Application of ultraviolet photoemission spectroscopy to surface studies

D. E. Eastman; J. E. Demuth; J. M. Baker

J. Vac. Sci. Technol. 11, 273–274 (1974) https://doi.org/10.1116/1.1318592

View articletitled, Abstract: Application of ultraviolet photoemission spectroscopy to surface studies

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Abstract: Chemisorption bond geometry determined by photoemission

J. W. Gadzuk

J. Vac. Sci. Technol. 11, 275 (1974) https://doi.org/10.1116/1.1318593

View articletitled, Abstract: Chemisorption bond geometry determined by photoemission

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Abstract: Photo-stimulated field emission from a metal

Ruichen Liu; Gert Ehrlich; Richard S. Polizzotti

J. Vac. Sci. Technol. 11, 276–277 (1974) https://doi.org/10.1116/1.1318594

View articletitled, Abstract: Photo-stimulated field emission from a metal

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Abstract: Determination of Auger electron excitation cross sections and ranges using proton-excited x-rays

P. B. Needham, Jr.; T. J. Driscoll

J. Vac. Sci. Technol. 11, 278 (1974) https://doi.org/10.1116/1.1318595

View articletitled, Abstract: Determination of Auger electron excitation cross sections and ranges using proton-excited x-rays

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Abstract: Electronic states of oxygen adsorbed on clean silicon (111) and (100) surfaces

H. Ibach; J. E. Rowe

J. Vac. Sci. Technol. 11, 279 (1974) https://doi.org/10.1116/1.1318596

View articletitled, Abstract: Electronic states of oxygen adsorbed on clean silicon (111) and (100) surfaces

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Abstract: Electron escape depths in aluminum

J. C. Tracy

J. Vac. Sci. Technol. 11, 280 (1974) https://doi.org/10.1116/1.1318597

View articletitled, Abstract: Electron escape depths in aluminum

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The role of Coster-Kronig transitions in the ionization of surface atoms

A. R. DuCharme; R. L. Gerlach

J. Vac. Sci. Technol. 11, 281–283 (1974) https://doi.org/10.1116/1.1318598

Abstract

View articletitled, The role of Coster-Kronig transitions in the ionization of surface atoms

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Diffraction peaks in secondary-electron energy spectra

G. E. Becker; H. D. Hagstrum

J. Vac. Sci. Technol. 11, 284–287 (1974) https://doi.org/10.1116/1.1318599

Abstract

View articletitled, Diffraction peaks in secondary-electron energy spectra

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Ion scattering for analysis of surfaces and surface layers

T. M. Buck; J. M. Poate

J. Vac. Sci. Technol. 11, 289–296 (1974) https://doi.org/10.1116/1.1318600

Abstract

View articletitled, Ion scattering for analysis of surfaces and surface layers

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Abstract: Surface, in-depth, and quantitative analysis by secondary ion mass spectrometry (SIMS)

J. M. Morabito

J. Vac. Sci. Technol. 11, 297 (1974) https://doi.org/10.1116/1.1318601

View articletitled, Abstract: Surface, in-depth, and quantitative analysis by secondary ion mass spectrometry (SIMS)

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Abstract: Surface analysis by proton-induced x-rays (PIX)

R. G. Musket; Walter Bauer

J. Vac. Sci. Technol. 11, 298 (1974) https://doi.org/10.1116/1.1318602

View articletitled, Abstract: Surface analysis by proton-induced x-rays (PIX)

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Surface characterization by Auger electron spectrometry

E. N. Sickafus

J. Vac. Sci. Technol. 11, 299–311 (1974) https://doi.org/10.1116/1.1318603

Abstract

View articletitled, Surface characterization by Auger electron spectrometry

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Composition profile of ion-plated Au film on Cu analyzed by AES and SIMS during Xe ion bombardment

Tadashi Narusawa; Souji Komiya

J. Vac. Sci. Technol. 11, 312–316 (1974) https://doi.org/10.1116/1.1318605

Abstract

View articletitled, Composition profile of ion-plated Au film on Cu analyzed by AES and SIMS during Xe ion bombardment

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Occupational safety and health: the new federal-state partnership

Louis L. Levine

J. Vac. Sci. Technol. 11, 317–322 (1974) https://doi.org/10.1116/1.1318606

Abstract

View articletitled, Occupational safety and health: the new federal-state partnership

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OSHA and its relation to risk

Roy Reider

J. Vac. Sci. Technol. 11, 323–327 (1974) https://doi.org/10.1116/1.1318607

Abstract

View articletitled, OSHA and its relation to risk

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OSHA standards for the product manufacturer

John A. Proctor

J. Vac. Sci. Technol. 11, 328–330 (1974) https://doi.org/10.1116/1.1318608

Abstract

View articletitled, OSHA standards for the product manufacturer

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Abstract: Pumping mechanisms of sputter-ion pumps

D. J. Harra

J. Vac. Sci. Technol. 11, 331 (1974) https://doi.org/10.1116/1.1318609

View articletitled, Abstract: Pumping mechanisms of sputter-ion pumps

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Abstract: Some applications of large sorption pumps

William Wheeler

J. Vac. Sci. Technol. 11, 332 (1974) https://doi.org/10.1116/1.1318610

View articletitled, Abstract: Some applications of large sorption pumps

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Measurements of adsorption isotherms and pumping speed of helium on molecular sieve in the $10^{−11} {−10}^{−7} Torr$ range at 4.2 K

H. J. Halama; J. R. Aggus

J. Vac. Sci. Technol. 11, 333–336 (1974) https://doi.org/10.1116/1.1318611

Abstract

View articletitled, Measurements of adsorption isotherms and pumping speed of helium on molecular sieve in the <math xmlns="http://www.w3.org/1998/Math/MathML"><msup xmlns=""><mn>10</mn><mrow><mtext>−11</mtext></mrow></msup><msup xmlns=""><mtext>−10</mtext><mrow><mtext>−7</mtext></mrow></msup><mi xmlns=""> </mi><mi mathvariant="normal" xmlns="">Torr</mi></math> range at 4.2 K

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A comparison of pumping speed measurement methods

D. R. Denison; E. S. McKee

J. Vac. Sci. Technol. 11, 337–339 (1974) https://doi.org/10.1116/1.1318612

Abstract

View articletitled, A comparison of pumping speed measurement methods

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Evaluation of a liquid-helium cryopumping system operating with an electron beam gun

G. Mongodin; V. R. Piacentini; W. Sajnacki

J. Vac. Sci. Technol. 11, 340–343 (1974) https://doi.org/10.1116/1.1318614

Abstract

View articletitled, Evaluation of a liquid-helium cryopumping system operating with an electron beam gun

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A high vacuum valve with a programmed opening rate

M. H. Hablanian; A. A. Landfors

J. Vac. Sci. Technol. 11, 344–346 (1974) https://doi.org/10.1116/1.1318615

Abstract

View articletitled, A high vacuum valve with a programmed opening rate

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Purification of rare gases and the measurement of low residual impurity levels

L. Rosai; M. Borghi

J. Vac. Sci. Technol. 11, 347–349 (1974) https://doi.org/10.1116/1.1318616

Abstract

View articletitled, Purification of rare gases and the measurement of low residual impurity levels

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Abstract: Total pressure variation determination of reaction rates at constant reactant pressure: catalytic decomposition of ammonia by tungsten

P. T. Dawson

J. Vac. Sci. Technol. 11, 350 (1974) https://doi.org/10.1116/1.1318618

View articletitled, Abstract: Total pressure variation determination of reaction rates at constant reactant pressure: catalytic decomposition of ammonia by tungsten

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High-resolution residual gas analysis (HRRGA)

Wade L. Fite; Philip Irving

J. Vac. Sci. Technol. 11, 351–356 (1974) https://doi.org/10.1116/1.1318619

Abstract

View articletitled, High-resolution residual gas analysis (HRRGA)

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A new mass-selective evaporation rate monitor

P. Genequand

J. Vac. Sci. Technol. 11, 357–360 (1974) https://doi.org/10.1116/1.1318620

Abstract

View articletitled, A new mass-selective evaporation rate monitor

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Thick ion-vapor-deposited aluminum coatings for irregularly shaped aircraft and spacecraft parts

K. E. Steube; L. E. McCrary

J. Vac. Sci. Technol. 11, 362–365 (1974) https://doi.org/10.1116/1.1318621

Abstract

View articletitled, Thick ion-vapor-deposited aluminum coatings for irregularly shaped aircraft and spacecraft parts

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Thickness distribution of a metal-alloy from a high-rate electron-beam source

E. Darrell Erikson

J. Vac. Sci. Technol. 11, 366–370 (1974) https://doi.org/10.1116/1.1318622

Abstract

View articletitled, Thickness distribution of a metal-alloy from a high-rate electron-beam source

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Structure and properties of sputtered titanium carbide and titanium nitride coatings

G. Mah; C. W. Nordin; J. F. Fuller

J. Vac. Sci. Technol. 11, 371–373 (1974) https://doi.org/10.1116/1.1318623

Abstract

View articletitled, Structure and properties of sputtered titanium carbide and titanium nitride coatings

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Vacuum coating with a hollow cathode source

Duane G. Williams

J. Vac. Sci. Technol. 11, 374–376 (1974) https://doi.org/10.1116/1.1318624

Abstract

View articletitled, Vacuum coating with a hollow cathode source

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Abstract: Evaporation variables in gas scattering plating processes

H. A. Beale; F. Weiler; R. F. Bunshah

J. Vac. Sci. Technol. 11, 377 (1974) https://doi.org/10.1116/1.1318625

View articletitled, Abstract: Evaporation variables in gas scattering plating processes

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Abstract: Structure and property relationships of Ni-20Cr produced by high rate physical vapor deposition

N. K. Agarwal; N. F. Kane; R. F. Bunshah

J. Vac. Sci. Technol. 11, 378 (1974) https://doi.org/10.1116/1.1318626

View articletitled, Abstract: Structure and property relationships of Ni-20Cr produced by high rate physical vapor deposition

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Abstract: Effects of process variables on the structure of ion-plated coatings

C. T. Wan; D. L. Chambers; D. C. Carmichael

J. Vac. Sci. Technol. 11, 379 (1974) https://doi.org/10.1116/1.1318627

View articletitled, Abstract: Effects of process variables on the structure of ion-plated coatings

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Abstract: Fabrication of thin metal foils by vacuum deposition

G. N. Steele

J. Vac. Sci. Technol. 11, 380 (1974) https://doi.org/10.1116/1.1318628

View articletitled, Abstract: Fabrication of thin metal foils by vacuum deposition

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Effect of pressure on the properties of reactively sputtered ${Ta}_{2} O_{5}$

W. D. Westwood; R. J. Boynton; S. J. Ingrey

J. Vac. Sci. Technol. 11, 381–384 (1974) https://doi.org/10.1116/1.1318629

Abstract

View articletitled, Effect of pressure on the properties of reactively sputtered <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">Ta</mi><mrow><mn>2</mn></mrow></msub><msub xmlns=""><mi mathvariant="normal">O</mi><mrow><mn>5</mn></mrow></msub></math>

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Vacuum arc melting of tungsten-hafnium-carbon alloy

R. L. Ammon; R. W. Buckman, Jr.

J. Vac. Sci. Technol. 11, 385–388 (1974) https://doi.org/10.1116/1.1318630

Abstract

View articletitled, Vacuum arc melting of tungsten-hafnium-carbon alloy

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Abstract: The growth and characterization of high-purity rhodium single crystals

J. J. Rubin; D. L. Malm

J. Vac. Sci. Technol. 11, 389 (1974) https://doi.org/10.1116/1.1318631

View articletitled, Abstract: The growth and characterization of high-purity rhodium single crystals

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Abstract: Magnetic field effects in consumable remelting

F. W. Thomas; E. Weingaertner; E. Becht

J. Vac. Sci. Technol. 11, 390 (1974) https://doi.org/10.1116/1.1318632

View articletitled, Abstract: Magnetic field effects in consumable remelting

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Plasma hardening of high-chromium-alloy steel containing distributed titanium carbide

Fay E. Gifford; Keith W. Cooley

J. Vac. Sci. Technol. 11, 391–394 (1974) https://doi.org/10.1116/1.1318633

Abstract

View articletitled, Plasma hardening of high-chromium-alloy steel containing distributed titanium carbide

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Abstract: The simultaneous measurement of mass and other parameters

W. Kollen

J. Vac. Sci. Technol. 11, 396 (1974) https://doi.org/10.1116/1.1318634

View articletitled, Abstract: The simultaneous measurement of mass and other parameters

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A bakeable vacuum microbalance for determining metal oxidation kinetics

R. J. Hussey; M. J. Graham; M. Cohen

J. Vac. Sci. Technol. 11, 397–399 (1974) https://doi.org/10.1116/1.1318635

Abstract

View articletitled, A bakeable vacuum microbalance for determining metal oxidation kinetics

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A dynamic Knudsen-effusion-torsion balance

Jimmie G. Edwards

J. Vac. Sci. Technol. 11, 400–403 (1974) https://doi.org/10.1116/1.1318636

Abstract

View articletitled, A dynamic Knudsen-effusion-torsion balance

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Improved thermogravimetric magnetic susceptibility apparatus

R. T. Lewis

J. Vac. Sci. Technol. 11, 404–407 (1974) https://doi.org/10.1116/1.1318637

Abstract

View articletitled, Improved thermogravimetric magnetic susceptibility apparatus

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Sputtering measurements with the double resonator technique

E. P. EerNisse

J. Vac. Sci. Technol. 11, 408–410 (1974) https://doi.org/10.1116/1.1318638

Abstract

View articletitled, Sputtering measurements with the double resonator technique

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Condensation coefficient measurements of $H_{2} O$ ⁠, $N_{2} O$ ⁠, and ${CO}_{2}$

C. E. Bryson, III; V. Cazcarra; L. L. Levenson

J. Vac. Sci. Technol. 11, 411–416 (1974) https://doi.org/10.1116/1.1318639

Abstract

View articletitled, Condensation coefficient measurements of <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">H</mi><mrow><mn>2</mn></mrow></msub><mi mathvariant="normal" xmlns="">O</mi></math>⁠, <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">N</mi><mrow><mn>2</mn></mrow></msub><mi mathvariant="normal" xmlns="">O</mi></math>⁠, and <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">CO</mi><mrow><mn>2</mn></mrow></msub></math>

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Abstract: Application of the vacuum microbalance

S. P. Wolsky

J. Vac. Sci. Technol. 11, 417 (1974) https://doi.org/10.1116/1.1318640

View articletitled, Abstract: Application of the vacuum microbalance

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Abstract: New concepts of automatic control in the field of vacuum ultramicrobalances

Th. Gast

J. Vac. Sci. Technol. 11, 418 (1974) https://doi.org/10.1116/1.1318641

View articletitled, Abstract: New concepts of automatic control in the field of vacuum ultramicrobalances

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Electrostatic effects in microbalances. I. General considerations of the effectiveness of a radioactive ionizing source under ambient conditions

Robert E. Hawley; Colin J. Williams

J. Vac. Sci. Technol. 11, 419–422 (1974) https://doi.org/10.1116/1.1318642

Abstract

View articletitled, Electrostatic effects in microbalances. I. General considerations of the effectiveness of a radioactive ionizing source under ambient conditions

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Abstract: Kinetic study of the process of diamond growth from vapor at subatmospheric pressures using an automatic recording microbalance

Satya P. Chauhan; John C. Angus; Nelson C. Gardner

J. Vac. Sci. Technol. 11, 423 (1974) https://doi.org/10.1116/1.1318644

View articletitled, Abstract: Kinetic study of the process of diamond growth from vapor at subatmospheric pressures using an automatic recording microbalance

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Vacuum microbalance investigations on heterogeneous surface reaction mechanisms

M. Grunze; W. Hirschwald

J. Vac. Sci. Technol. 11, 424–428 (1974) https://doi.org/10.1116/1.1318645

Abstract

View articletitled, Vacuum microbalance investigations on heterogeneous surface reaction mechanisms

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Adsorption properties of surface modified silica

G. Erdel; K. Unger

J. Vac. Sci. Technol. 11, 429–432 (1974) https://doi.org/10.1116/1.1318646

Abstract

View articletitled, Adsorption properties of surface modified silica

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Abstract: Coupling of thermogravimetric and x-ray diffraction methods

N. Gerard

J. Vac. Sci. Technol. 11, 433 (1974) https://doi.org/10.1116/1.1318648

View articletitled, Abstract: Coupling of thermogravimetric and x-ray diffraction methods

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Novel uses of the thermo-microbalance in the determination of nonstoichiometry in complex oxide systems

Robert L. Holman

J. Vac. Sci. Technol. 11, 434–439 (1974) https://doi.org/10.1116/1.1318649

Abstract

View articletitled, Novel uses of the thermo-microbalance in the determination of nonstoichiometry in complex oxide systems

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Intensity singularities in the soft x-ray appearance potential spectra of the samarium $N_{5}$ and $M_{5}$ levels

M. B. Chamberlain; W. L. Baun

J. Vac. Sci. Technol. 11, 441–445 (1974) https://doi.org/10.1116/1.1318651

Abstract

View articletitled, Intensity singularities in the soft x-ray appearance potential spectra of the samarium <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">N</mi><mrow><mn>5</mn></mrow></msub></math> and <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">M</mi><mrow><mn>5</mn></mrow></msub></math> levels

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The physical interaction of nitrogen with Pyrex, stainless steel, and nickel at very low pressure

R. A. Outlaw; F. J. Brock; J. P. Wightman

J. Vac. Sci. Technol. 11, 446–454 (1974) https://doi.org/10.1116/1.1318652

Abstract

View articletitled, The physical interaction of nitrogen with Pyrex, stainless steel, and nickel at very low pressure

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Properties of molybdenum films prepared by decomposition of the carbonyl

A. I. DeRosa; D. B. Dove; R. E. Loehman

J. Vac. Sci. Technol. 11, 455–457 (1974) https://doi.org/10.1116/1.1318653

Abstract

View articletitled, Properties of molybdenum films prepared by decomposition of the carbonyl

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Masking of deposited thin films by means of an aluminum-photoresist composite

K. Grebe; I. Ames; A. Ginzberg

J. Vac. Sci. Technol. 11, 458–460 (1974) https://doi.org/10.1116/1.1318654

Abstract

View articletitled, Masking of deposited thin films by means of an aluminum-photoresist composite

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The tungsten evaporation limit of hot-cathode ionization gauges

B. Angerth; Z. Hulek

J. Vac. Sci. Technol. 11, 461–465 (1974) https://doi.org/10.1116/1.1318655

Abstract

View articletitled, The tungsten evaporation limit of hot-cathode ionization gauges

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Porosity in sputtered platinum films

W. D. Westwood

J. Vac. Sci. Technol. 11, 466–471 (1974) https://doi.org/10.1116/1.1318656

Abstract

View articletitled, Porosity in sputtered platinum films

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High-voltage vacuum insulation with epoxy-coated cathodes

L. Jedynak; S. Y. Towliati

J. Vac. Sci. Technol. 11, 472–473 (1974) https://doi.org/10.1116/1.1318657

View articletitled, High-voltage vacuum insulation with epoxy-coated cathodes

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Surface cleaning by ultraviolet radiation

R. R. Sowell; R. E. Cuthrell; D. M. Mattox; R. D. Bland

J. Vac. Sci. Technol. 11, 474–475 (1974) https://doi.org/10.1116/1.1318658

View articletitled, Surface cleaning by ultraviolet radiation

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