Volume 10 Issue 6 | Journal of Vacuum Science and Technology

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On Electron Projection Systems

H. Koops

J. Vac. Sci. Technol. 10, 909–912 (1973) https://doi.org/10.1116/1.1318513

Abstract

View articletitled, On Electron Projection Systems

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X-Ray Lithography: A Complementary Technique to Electron Beam Lithography

Henry I. Smith; D. L. Spears; S. E. Bernacki

J. Vac. Sci. Technol. 10, 913–917 (1973) https://doi.org/10.1116/1.1318514

Abstract

View articletitled, X-Ray Lithography: A Complementary Technique to Electron Beam Lithography

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Influence of Source Parameters on the Properties of an Ion Beam

K. Wittmaack; F. Schulz

J. Vac. Sci. Technol. 10, 918–921 (1973) https://doi.org/10.1116/1.1318515

Abstract

View articletitled, Influence of Source Parameters on the Properties of an Ion Beam

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Design and Operation of an Intense Neutral Beam Source

K. W. Ehlers; W. R. Baker; K. H. Berkner; W. S. Cooper; W. B. Kunkel; R. V. Pyle; J. W. Stearns

J. Vac. Sci. Technol. 10, 922–925 (1973) https://doi.org/10.1116/1.1318516

Abstract

View articletitled, Design and Operation of an Intense Neutral Beam Source

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Recent Advances in Electron Beam Recording

Patrick F. Grosso; Andrew A. Tarnowski

J. Vac. Sci. Technol. 10, 926–931 (1973) https://doi.org/10.1116/1.1318517

Abstract

View articletitled, Recent Advances in Electron Beam Recording

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Study of a Glow Discharge Ion Source

J. P. Flemming

J. Vac. Sci. Technol. 10, 932–935 (1973) https://doi.org/10.1116/1.1318518

Abstract

View articletitled, Study of a Glow Discharge Ion Source

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Optical Waveguides Fabricated by Ion Implantation

S. Namba; H. Aritome; T. Nishimura; K. Masuda; K. Toyoda

J. Vac. Sci. Technol. 10, 936–940 (1973) https://doi.org/10.1116/1.1318519

Abstract

View articletitled, Optical Waveguides Fabricated by Ion Implantation

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Modulation of the Optical Guided Wave by uv Light and Electron Beam Excitations

Koichi Toyoda; Susumu Namba; Toshiaki Matsui; Yoshio Suge

J. Vac. Sci. Technol. 10, 941–943 (1973) https://doi.org/10.1116/1.1318520

Abstract

View articletitled, Modulation of the Optical Guided Wave by uv Light and Electron Beam Excitations

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Ion Implanted N-Type Resistors on High-Resistivity Substrates

J. W. Hanson; R. J. Huber; J. N. Fordemwalt

J. Vac. Sci. Technol. 10, 944–947 (1973) https://doi.org/10.1116/1.1318521

Abstract

View articletitled, Ion Implanted N-Type Resistors on High-Resistivity Substrates

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Generation of Picosecond Pulse Electron Beams

K. Ura; N. Morimura

J. Vac. Sci. Technol. 10, 948–950 (1973) https://doi.org/10.1116/1.1318522

Abstract

View articletitled, Generation of Picosecond Pulse Electron Beams

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Holographic Measurements of the Plasmas in a High-Current Field Emission Diode

L. P. Mix; J. G. Kelly; G. W. Kuswa; D. W. Swain; J. N. Olsen

J. Vac. Sci. Technol. 10, 951–953 (1973) https://doi.org/10.1116/1.1318523

Abstract

View articletitled, Holographic Measurements of the Plasmas in a High-Current Field Emission Diode

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Simulation of Relativistic Electron Beam Diodes

J. W. Poukey; J. R. Freeman; G. Yonas

J. Vac. Sci. Technol. 10, 954–958 (1973) https://doi.org/10.1116/1.1318524

Abstract

View articletitled, Simulation of Relativistic Electron Beam Diodes

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Compression and Stability Studies of High ν/γ Beams

Charles Stallings; Richard Schneider; James Benford

J. Vac. Sci. Technol. 10, 959–960 (1973) https://doi.org/10.1116/1.1318525

Abstract

View articletitled, Compression and Stability Studies of High ν/γ Beams

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The Gamble I Pulsed Electron Beam Generator

G. Cooperstein; J. J. Condon; J. R. Boller

J. Vac. Sci. Technol. 10, 961–964 (1973) https://doi.org/10.1116/1.1318526

Abstract

View articletitled, The Gamble I Pulsed Electron Beam Generator

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The Beam Optics Design of Pulsed, Large Area Electron-Beam Accelerators in the 150–300 kV Range

W. A. Frutiger; J. R. Uglum; B. S. Quintal; S. V. Nablo

J. Vac. Sci. Technol. 10, 965–967 (1973) https://doi.org/10.1116/1.1318527

Abstract

View articletitled, The Beam Optics Design of Pulsed, Large Area Electron-Beam Accelerators in the 150–300 kV Range

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Transformer Type Accelerator—Compact Sources of Energetic Electrons

G. K. Simcox; C. J. Schubert

J. Vac. Sci. Technol. 10, 968–971 (1973) https://doi.org/10.1116/1.1318528

Abstract

View articletitled, Transformer Type Accelerator—Compact Sources of Energetic Electrons

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Optimization of the Performance of High-Brightness Electron Guns

H. Ahmed; E. Munro

J. Vac. Sci. Technol. 10, 972–974 (1973) https://doi.org/10.1116/1.1318529

Abstract

View articletitled, Optimization of the Performance of High-Brightness Electron Guns

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Potential of Field Emission Cathodes for Microfabrication

G. A. Wardly

J. Vac. Sci. Technol. 10, 975–978 (1973) https://doi.org/10.1116/1.1318530

Abstract

View articletitled, Potential of Field Emission Cathodes for Microfabrication

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A New High-Resolution Electron Probe

A. N. Broers

J. Vac. Sci. Technol. 10, 979–982 (1973) https://doi.org/10.1116/1.1318531

Abstract

View articletitled, A New High-Resolution Electron Probe

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Aberration Correction for Increased Lines per Field in Scanning Electron Beam Technology

G. Owen; W. C. Nixon

J. Vac. Sci. Technol. 10, 983–986 (1973) https://doi.org/10.1116/1.1318532

Abstract

View articletitled, Aberration Correction for Increased Lines per Field in Scanning Electron Beam Technology

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High Speed Beam Deflection and Blanking for Electron Lithography

L. H. Lin; H. L. Beauchamp

J. Vac. Sci. Technol. 10, 987–990 (1973) https://doi.org/10.1116/1.1318533

Abstract

View articletitled, High Speed Beam Deflection and Blanking for Electron Lithography

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Generation, Transport, and Compression of an Annular Intense Relativistic Electron Beam with Return Current Feedback through the Cathode

John G. Kelly

J. Vac. Sci. Technol. 10, 991–994 (1973) https://doi.org/10.1116/1.1318534

Abstract

View articletitled, Generation, Transport, and Compression of an Annular Intense Relativistic Electron Beam with Return Current Feedback through the Cathode

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Molecular Acceleration by Alternate Gradient Focusing

D. Kakati; A. Choudhury

J. Vac. Sci. Technol. 10, 995–999 (1973) https://doi.org/10.1116/1.1318535

Abstract

View articletitled, Molecular Acceleration by Alternate Gradient Focusing

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Range and Energy Deposition Enhancement of a Fast Electron Beam by External Electric Fields

C. M. Bowden; J. F. Perkins; R. A. Shatas

J. Vac. Sci. Technol. 10, 1000–1004 (1973) https://doi.org/10.1116/1.1318452

Abstract

View articletitled, Range and Energy Deposition Enhancement of a Fast Electron Beam by External Electric Fields

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Microfabrication using a Computer-Controlled Scanning Transmission

J. J. Kim; H. G. Sampson; T. E. Everhart

J. Vac. Sci. Technol. 10, 1005–1007 (1973) https://doi.org/10.1116/1.1318453

Abstract

View articletitled, Microfabrication using a Computer-Controlled Scanning Transmission

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Precision Electron Beam Microfabrication

F. S. Ozdemir; W. E. Perkins; R. Yim; E. D. Wolf

J. Vac. Sci. Technol. 10, 1008–1011 (1973) https://doi.org/10.1116/1.1318454

Abstract

View articletitled, Precision Electron Beam Microfabrication

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A High-Performance, Low-Cost Digitally Driven SEM System for Materials Studies and Microfabrication

John Pasiecznik, Jr.; Jeffrey Frey

J. Vac. Sci. Technol. 10, 1012–1015 (1973) https://doi.org/10.1116/1.1318455

Abstract

View articletitled, A High-Performance, Low-Cost Digitally Driven SEM System for Materials Studies and Microfabrication

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A Fast Turn Around Electron-Beam Pattern Generation System

B. P. Piwczyk; K. G. McQuhae

J. Vac. Sci. Technol. 10, 1016–1019 (1973) https://doi.org/10.1116/1.1318456

Abstract

View articletitled, A Fast Turn Around Electron-Beam Pattern Generation System

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An Automated Electron-Beam Mask Generator

E. B. Friedmann; W. R. Livesay; A. L. Rubiales

J. Vac. Sci. Technol. 10, 1020–1024 (1973) https://doi.org/10.1116/1.1318457

Abstract

View articletitled, An Automated Electron-Beam Mask Generator

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LSI Pattern Generation and Replication by Electron Beams

P. R. Malmberg; T. W. O'Keeffe; M. M. Sopira; M. W. Levi

J. Vac. Sci. Technol. 10, 1025–1027 (1973) https://doi.org/10.1116/1.1318458

Abstract

View articletitled, LSI Pattern Generation and Replication by Electron Beams

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Integrated Circuit Production with Electron Beams

W. R. Livesay

J. Vac. Sci. Technol. 10, 1028–1032 (1973) https://doi.org/10.1116/1.1318459

Abstract

View articletitled, Integrated Circuit Production with Electron Beams

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Relativistic Electron-Beam Pumped uv Gas Lasers

R. W. Dreyfus; R. T. Hodgson

J. Vac. Sci. Technol. 10, 1033–1036 (1973) https://doi.org/10.1116/1.1318460

Abstract

View articletitled, Relativistic Electron-Beam Pumped uv Gas Lasers

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Laser Generated Thermoelastic Shock Waves in Liquid

Gangadaran Siva Bushanam; Frank S. Barnes

J. Vac. Sci. Technol. 10, 1037–1038 (1973) https://doi.org/10.1116/1.1318461

Abstract

View articletitled, Laser Generated Thermoelastic Shock Waves in Liquid

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Lasers for the Cleaning of Statuary: Initial Results and Potentialities

L. Lazzarini; L. Marchesini; J. F. Asmus

J. Vac. Sci. Technol. 10, 1039–1043 (1973) https://doi.org/10.1116/1.1318462

Abstract

View articletitled, Lasers for the Cleaning of Statuary: Initial Results and Potentialities

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Design and Analysis of a Laser Oriented, Automatic Dimensional Inspection System for High-Speed Process Control

Steven M. Ward; Patrick H. Brew

J. Vac. Sci. Technol. 10, 1044–1047 (1973) https://doi.org/10.1116/1.1318463

Abstract

View articletitled, Design and Analysis of a Laser Oriented, Automatic Dimensional Inspection System for High-Speed Process Control

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E-Beam Writing Techniques for Semiconductor Device Fabrication

G. L. Varnell; D. F. Spicer; A. C. Rodger

J. Vac. Sci. Technol. 10, 1048–1051 (1973) https://doi.org/10.1116/1.1318464

Abstract

View articletitled, E-Beam Writing Techniques for Semiconductor Device Fabrication

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Computer Controlled Pattern Generating System for use with Electron-Beam Writing Instruments

D. F. Spicer; A. C. Rodger; G. L. Varnell

J. Vac. Sci. Technol. 10, 1052–1055 (1973) https://doi.org/10.1116/1.1318465

Abstract

View articletitled, Computer Controlled Pattern Generating System for use with Electron-Beam Writing Instruments

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Model for Exposure of Electron-Sensitive Resists

J. S. Greeneich; T. Van Duzer

J. Vac. Sci. Technol. 10, 1056–1059 (1973) https://doi.org/10.1116/1.1318466

Abstract

View articletitled, Model for Exposure of Electron-Sensitive Resists

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Electron Beam Testing of Circuit Interconnections using Collector Stabilized Conductor Charging

J. M. Sebeson

J. Vac. Sci. Technol. 10, 1060–1063 (1973) https://doi.org/10.1116/1.1318467

Abstract

View articletitled, Electron Beam Testing of Circuit Interconnections using Collector Stabilized Conductor Charging

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Coates–Kikuchi Patterns and Electron-Spectroscopy from Single Crystals

E. D. Wolf; P. J. Coane

J. Vac. Sci. Technol. 10, 1064–1067 (1973) https://doi.org/10.1116/1.1318468

Abstract

View articletitled, Coates–Kikuchi Patterns and Electron-Spectroscopy from Single Crystals

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Investigation of Soft X-Ray Absorption Edge Structure using an Energy Modulated Electron Beam

K. N. Ramachandran; C. D. Cox

J. Vac. Sci. Technol. 10, 1068–1071 (1973) https://doi.org/10.1116/1.1318469

Abstract

View articletitled, Investigation of Soft X-Ray Absorption Edge Structure using an Energy Modulated Electron Beam

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Use of an Ion Microprobe in Semiconductor Failure Analysis

R. M. Gerber; J. W. Dzimianski

J. Vac. Sci. Technol. 10, 1072–1073 (1973) https://doi.org/10.1116/1.1318470

Abstract

View articletitled, Use of an Ion Microprobe in Semiconductor Failure Analysis

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The Fabrication of IGFETS using Electron-Beam Technology

K. A. Pickar; L. R. Thibault

J. Vac. Sci. Technol. 10, 1074–1077 (1973) https://doi.org/10.1116/1.1318471

Abstract

View articletitled, The Fabrication of IGFETS using Electron-Beam Technology

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IGFET Inverter Circuits made with Electron Lithography

R. F. W. Pease; R. C. Henderson; J. V. Dalton

J. Vac. Sci. Technol. 10, 1078–1081 (1973) https://doi.org/10.1116/1.1318472

Abstract

View articletitled, IGFET Inverter Circuits made with Electron Lithography

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Electron-Beam Fabrication of Ion Implanted High-Performance FET Circuits

F. Fang; M. Hatzakis; C. H. Ting

J. Vac. Sci. Technol. 10, 1082–1085 (1973) https://doi.org/10.1116/1.1318473

Abstract

View articletitled, Electron-Beam Fabrication of Ion Implanted High-Performance FET Circuits

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Fabrication of Integrated CMOS Transistors using Electron Lithography and Ion Implantation

M. M. Sopira; P. R. Malmberg; Z. H. Meiksin

J. Vac. Sci. Technol. 10, 1086–1089 (1973) https://doi.org/10.1116/1.1318474

Abstract

View articletitled, Fabrication of Integrated CMOS Transistors using Electron Lithography and Ion Implantation

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The Fabrication of Bipolar Transistors using Electron Lithography, Ion Implantation, and Nickel-Masked Gold Metallization

P. W. Shackle; R. S. Payne

J. Vac. Sci. Technol. 10, 1090–1093 (1973) https://doi.org/10.1116/1.1318475

Abstract

View articletitled, The Fabrication of Bipolar Transistors using Electron Lithography, Ion Implantation, and Nickel-Masked Gold Metallization

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Selective Area Metallization by Electron-Beam Controlled Direct Metallic Deposition

J. P. Ballantyne; W. C. Nixon

J. Vac. Sci. Technol. 10, 1094–1097 (1973) https://doi.org/10.1116/1.1318476

Abstract

View articletitled, Selective Area Metallization by Electron-Beam Controlled Direct Metallic Deposition

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Theory of Aberration Mixing in Electron-Optical Systems

K. J. Harte

J. Vac. Sci. Technol. 10, 1098–1101 (1973) https://doi.org/10.1116/1.1318477

Abstract

View articletitled, Theory of Aberration Mixing in Electron-Optical Systems

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Electron Optics of an Off-Axis Solid-State Light Valve

D. Casasent; F. Caimi

J. Vac. Sci. Technol. 10, 1102–1105 (1973) https://doi.org/10.1116/1.1318478

Abstract

View articletitled, Electron Optics of an Off-Axis Solid-State Light Valve

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The Design of Double Focusing Wien Filters

R. E. Collins

J. Vac. Sci. Technol. 10, 1106–1109 (1973) https://doi.org/10.1116/1.1318479

Abstract

View articletitled, The Design of Double Focusing Wien Filters

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Computer-Aided Design and Experimental Investigation of an Electron–Optical Collimating Lens

C. C. T. Wang; K. J. Harte; N. Curland; R. K. Likuski; E. C. Dougherty

J. Vac. Sci. Technol. 10, 1110–1113 (1973) https://doi.org/10.1116/1.1318480

Abstract

View articletitled, Computer-Aided Design and Experimental Investigation of an Electron–Optical Collimating Lens

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Representation of Focal Properties of the Equal-Diameter Two-Tube Electrostatic Lens for Computer Calculations

A. Galejs; C. E. Kuyatt

J. Vac. Sci. Technol. 10, 1114–1117 (1973) https://doi.org/10.1116/1.1318481

Abstract

View articletitled, Representation of Focal Properties of the Equal-Diameter Two-Tube Electrostatic Lens for Computer Calculations

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Focal Properties of the Two-Tube Electrostatic Lens for Large Voltage Ratios

C. E. Kuyatt; D. DiChio; S. V. Natali

J. Vac. Sci. Technol. 10, 1118–1119 (1973) https://doi.org/10.1116/1.1318482

Abstract

View articletitled, Focal Properties of the Two-Tube Electrostatic Lens for Large Voltage Ratios

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Digital Computer Simulation of Charged Particle Beams and Electrostatic Lenses

J. E. Boers

J. Vac. Sci. Technol. 10, 1120–1123 (1973) https://doi.org/10.1116/1.1318483

Abstract

View articletitled, Digital Computer Simulation of Charged Particle Beams and Electrostatic Lenses

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Third-Order Aberration Coefficients of Electron Lenses. II

C. E. Kuyatt; D. DiChio; S. V. Natali

J. Vac. Sci. Technol. 10, 1124–1126 (1973) https://doi.org/10.1116/1.1318484

Abstract

View articletitled, Third-Order Aberration Coefficients of Electron Lenses. II

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Abstracts from the Symposium Proceedings

J. Vac. Sci. Technol. 10, 1127–1132 (1973) https://doi.org/10.1116/1.1318485

View articletitled, Abstracts from the Symposium Proceedings

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Abstract: Focused Ion Beams in Microfabrication

R. L. Seliger; W. P. Fleming

J. Vac. Sci. Technol. 10, 1127 (1973) https://doi.org/10.1116/1.1318486

View articletitled, Abstract: Focused Ion Beams in Microfabrication

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Abstract: Ion Beam Etching of Surface Gratings

Henry I. Smith; J. Melngailis; R. C. Williamson; W. T. Brogan

J. Vac. Sci. Technol. 10, 1127 (1973) https://doi.org/10.1116/1.1318487

View articletitled, Abstract: Ion Beam Etching of Surface Gratings

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Abstract: Ion-Beam Milling of Insulators using Broad Neutralized Beams

G. W. Monk

J. Vac. Sci. Technol. 10, 1128 (1973) https://doi.org/10.1116/1.1318488

View articletitled, Abstract: Ion-Beam Milling of Insulators using Broad Neutralized Beams

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Abstract: Resumé of the U.S.-Japan Seminar on the Fundamentals of Scanning Electron Microscopy

T. E. Everhart

J. Vac. Sci. Technol. 10, 1128 (1973) https://doi.org/10.1116/1.1318489

View articletitled, Abstract: Resumé of the U.S.-Japan Seminar on the Fundamentals of Scanning Electron Microscopy

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Abstract: Electron-Beam Spreading and its Effect on Sustainer Current and Field Distribution

J. H. Jacob; J. P. Reilly; E. R. Pugh

J. Vac. Sci. Technol. 10, 1128 (1973) https://doi.org/10.1116/1.1318490

View articletitled, Abstract: Electron-Beam Spreading and its Effect on Sustainer Current and Field Distribution

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Abstract: Emission Characteristics of a ${LaB}_{6}$ Electron Gun

W. Stickel; H. C. Pfeiffer

J. Vac. Sci. Technol. 10, 1128 (1973) https://doi.org/10.1116/1.1318491

View articletitled, Abstract: Emission Characteristics of a <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">LaB</mi><mrow><mn>6</mn></mrow></msub></math> Electron Gun

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Abstract: Laboratory Measurements of the Effectiveness of a Magnetic Shield

Herbert A. Cohen; Paul S. Wilson

J. Vac. Sci. Technol. 10, 1128 (1973) https://doi.org/10.1116/1.1318492

View articletitled, Abstract: Laboratory Measurements of the Effectiveness of a Magnetic Shield

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Abstract: Generation of Self Focusing ${MA/ cm}^{2}$ Electron Beams

D. G. Pellinen; S. E. Heurlin

J. Vac. Sci. Technol. 10, 1128–1129 (1973) https://doi.org/10.1116/1.1318493

View articletitled, Abstract: Generation of Self Focusing <math xmlns="http://www.w3.org/1998/Math/MathML"><msup xmlns=""><mi mathvariant="normal">MA/ cm</mi><mrow><mn>2</mn></mrow></msup></math> Electron Beams

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Abstract: Electron Beam Utilization for the Dissociation of Fluorine

Roger Little; Robert Lowell

J. Vac. Sci. Technol. 10, 1129 (1973) https://doi.org/10.1116/1.1318494

View articletitled, Abstract: Electron Beam Utilization for the Dissociation of Fluorine

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Abstract: An Electron Detection System for Microfabrication Registration

T. H. P. Chang

J. Vac. Sci. Technol. 10, 1129 (1973) https://doi.org/10.1116/1.1318495

View articletitled, Abstract: An Electron Detection System for Microfabrication Registration

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Abstract: The Relationship Between Self-Focusing and Optical Bulk Damage and the Measurement of Self-Focusing Parameters

D. W. Fradin

J. Vac. Sci. Technol. 10, 1129 (1973) https://doi.org/10.1116/1.1318496

View articletitled, Abstract: The Relationship Between Self-Focusing and Optical Bulk Damage and the Measurement of Self-Focusing Parameters

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Abstract: Effects of Crystallinity and Lattice Disorder on the Intrinsic Optical Breakdown Strength of Transparent Solids

D. W. Fradin; M. Bass

J. Vac. Sci. Technol. 10, 1130 (1973) https://doi.org/10.1116/1.1318497

View articletitled, Abstract: Effects of Crystallinity and Lattice Disorder on the Intrinsic Optical Breakdown Strength of Transparent Solids

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Abstract: Dependence of Laser Induced Breakdown Field Strength on Pulse Duration

D. W. Fradin; N. Bloembergen; J. P. Letellier

J. Vac. Sci. Technol. 10, 1130 (1973) https://doi.org/10.1116/1.1318498

View articletitled, Abstract: Dependence of Laser Induced Breakdown Field Strength on Pulse Duration

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Abstract: Transient Thermal Profile in Optically Pumped Laser Rods

W. Koechner

J. Vac. Sci. Technol. 10, 1130 (1973) https://doi.org/10.1116/1.1318499

View articletitled, Abstract: Transient Thermal Profile in Optically Pumped Laser Rods

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Abstract: Paper-Tape Controlled Electron Probe Exposure of Resist for Microelectronic Applications

C. Dix; W. C. Nixon

J. Vac. Sci. Technol. 10, 1131 (1973) https://doi.org/10.1116/1.1318500

View articletitled, Abstract: Paper-Tape Controlled Electron Probe Exposure of Resist for Microelectronic Applications

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Abstract: A Phenomenological Optimization of Negative-Electron Resist Exposure Conditions

J. L. Bartelt; J. P. Ballantyne

J. Vac. Sci. Technol. 10, 1131 (1973) https://doi.org/10.1116/1.1318501

View articletitled, Abstract: A Phenomenological Optimization of Negative-Electron Resist Exposure Conditions

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Abstract: Electron Sensitive Resists—Present and Future

M. Hatzakis

J. Vac. Sci. Technol. 10, 1131 (1973) https://doi.org/10.1116/1.1318502

View articletitled, Abstract: Electron Sensitive Resists—Present and Future

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Abstract: Image Tube Operation of the Scanning Electron Microscope using Insulating Specimens as Floating Targets

H. Ahmed; W. C. Nixon

J. Vac. Sci. Technol. 10, 1131 (1973) https://doi.org/10.1116/1.1318503

View articletitled, Abstract: Image Tube Operation of the Scanning Electron Microscope using Insulating Specimens as Floating Targets

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Abstract: A Practical Approach to Automated Image Analysis

Jack D. Hutchison

J. Vac. Sci. Technol. 10, 1131 (1973) https://doi.org/10.1116/1.1318504

View articletitled, Abstract: A Practical Approach to Automated Image Analysis

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Abstract: Nanoelectronic Project and Astec Logic

J. E. Picquendar

J. Vac. Sci. Technol. 10, 1132 (1973) https://doi.org/10.1116/1.1318505

View articletitled, Abstract: Nanoelectronic Project and Astec Logic

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Abstract: Electron-Beam Microfabrication: The Prospects for a Practical System

Peter A. Charman

J. Vac. Sci. Technol. 10, 1132 (1973) https://doi.org/10.1116/1.1318506

View articletitled, Abstract: Electron-Beam Microfabrication: The Prospects for a Practical System

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Abstract: Dense Space-Charge Beams Analyzed on a Deformable Relaxation Mesh

Richard True

J. Vac. Sci. Technol. 10, 1132 (1973) https://doi.org/10.1116/1.1318507

View articletitled, Abstract: Dense Space-Charge Beams Analyzed on a Deformable Relaxation Mesh

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Investigation of the Sensitivity of Ionization-Type Vacuum Gauges

Raymond Holanda

J. Vac. Sci. Technol. 10, 1133–1139 (1973) https://doi.org/10.1116/1.1318508

Abstract

View articletitled, Investigation of the Sensitivity of Ionization-Type Vacuum Gauges

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A Simple Method of Calculating the Effectiveness of High Temperature Radiation Heat Shields

Kimo M. Welch

J. Vac. Sci. Technol. 10, 1140–1143 (1973) https://doi.org/10.1116/1.1318509

Abstract

View articletitled, A Simple Method of Calculating the Effectiveness of High Temperature Radiation Heat Shields

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Glow Discharge Optical Spectroscopy for Monitoring Sputter Deposited Film Thickness

J. E. Greene; F. Sequeda-Osorio

J. Vac. Sci. Technol. 10, 1144–1149 (1973) https://doi.org/10.1116/1.1318510

Abstract

View articletitled, Glow Discharge Optical Spectroscopy for Monitoring Sputter Deposited Film Thickness

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Analysis of Gas Mixtures Using Data from Pulsed Vacuum Networks

Robert Pulfrey; B. R. F. Kendall

J. Vac. Sci. Technol. 10, 1150–1152 (1973) https://doi.org/10.1116/1.1318511

Abstract

View articletitled, Analysis of Gas Mixtures Using Data from Pulsed Vacuum Networks

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The Deposition of Single Crystal ${CaF}_{2}$ Films on Rocksalt Substrates in Various Orientations

K. Reichelt; M. Rey

J. Vac. Sci. Technol. 10, 1153 (1973) https://doi.org/10.1116/1.1318512

View articletitled, The Deposition of Single Crystal <math xmlns="http://www.w3.org/1998/Math/MathML"><msub xmlns=""><mi mathvariant="normal">CaF</mi><mrow><mn>2</mn></mrow></msub></math> Films on Rocksalt Substrates in Various Orientations

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