Simple, low cost, and highly stable Pd evaporation source for use in UHV

De Cooman, B. C.; Vook, R. W.

doi:10.1116/1.571846

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Letter| September 01 1982

Simple, low cost, and highly stable Pd evaporation source for use in UHV

B. C. De Cooman;

B. C. De Cooman

Department of Chemical Engineering and Materials Science, Syracuse University, Syracuse, New York 13210

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R. W. Vook

Department of Chemical Engineering and Materials Science, Syracuse University, Syracuse, New York 13210

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J. Vac. Sci. Technol. 21, 899–900 (1982)

https://doi.org/10.1116/1.571846

The design of a source for the thermal evaporation of Pd from a resistively heated W filament in UHV is presented. The source’s main advantages are its simplicity, low cost, long lifetime, and stability at low deposition rates.

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1982

American Vacuum Society

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Simple, low cost, and highly stable Pd evaporation source for use in UHV

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