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Volume 43, Issue 4

July 2025

All Issues

ISSN 2166-2746

EISSN 2166-2754

In this Issue

Letters
ARTICLES

Letters

Characterization of iron-based alloy catalysts for atmospheric pressure chemical vapor deposition of carbon nanofibers via in situ transmission electron microscopy

Andrew C. Meng; Peifu Cheng; Piran R. Kidambi; Nikhilendra Singh; Yuyang Song; Eric A. Stach

J. Vac. Sci. Technol. B 43, 040601 (2025) https://doi.org/10.1116/6.0004664

Abstract

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CHORUS

ARTICLES

Electronic and Optoelectronic Materials, Devices and Processing

High off-state voltage (4266 V) diamond metal oxide semiconductor field effect transistors

Niloy Chandra Saha; Masanori Eguchi; Toshiyuki Oishi; Makoto Kasu

J. Vac. Sci. Technol. B 43, 042201 (2025) https://doi.org/10.1116/6.0004552

Abstract

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Low-temperature Al_xGa_1−xN growth by combined electron cyclotron resonance sputtering and magnetron sputtering

Hironori Torii; Shinsuke Matsui

J. Vac. Sci. Technol. B 43, 042202 (2025) https://doi.org/10.1116/6.0004592

Abstract

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Resistivity improvement of flexible transparent conductive films with Cu inserted intermediate layer

Nene Yoshikawa; Yukio Yoshimura; Atsushi Nitta

J. Vac. Sci. Technol. B 43, 042203 (2025) https://doi.org/10.1116/6.0004528

Abstract

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Effect of Ag layer thickness and annealing treatment on the transmittance and conductivity of transparent antennas fabricated using ITO/Ag/ITO structures

Yoji Yasuda; Yuka Saitou; Fukuro Koshiji; Takayuki Uchida

J. Vac. Sci. Technol. B 43, 042204 (2025) https://doi.org/10.1116/6.0004573

Abstract

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Secondary ion mass spectrometry as a tool to analyze semiconductor opening switch diodes

In Special Collection: Secondary Ion Mass Spectrometry (SIMS)

Marie-Amandine Pinault-Thaury; Estelle Loire; François Jomard; Anton Gusev; Mawuena Rémi Degnon; Antoine Silvestre de Ferron; Laurent Pecastaing

J. Vac. Sci. Technol. B 43, 042205 (2025) https://doi.org/10.1116/6.0004605

Abstract

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Generalized method for optimizing impedance matching in capacitively coupled plasmas

Dehen Cao; Shimin Yu; Hongyu Wang; Zhipeng Chen; Wei Jiang; Ya Zhang

J. Vac. Sci. Technol. B 43, 042206 (2025) https://doi.org/10.1116/6.0004630

Abstract

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High threshold voltage enhancement-mode AlGaN/GaN HEMT with double barrier hybrid gate

Rukai Jiang; Xuhong Hu; Zhuokun He; Yaoze Li; Shengheng Ma; Qianyu Hou; Wenhong Sun

J. Vac. Sci. Technol. B 43, 042207 (2025) https://doi.org/10.1116/6.0004577

Abstract

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Influence of annealing on the resistive switching properties of YBa₂Cu₃O_7−x/Nb:SrTiO₃ heterostructures

Juanrong Zhang; Yulu Wang; Jianlei Zhu

J. Vac. Sci. Technol. B 43, 042208 (2025) https://doi.org/10.1116/6.0004687

Abstract

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Optimization and mechanism investigation of pulse etching modes for aluminum line patterning in CMOS image sensor chip manufacturing

Jiacheng Wang; Yongkang Cao; Zhaoyang Chen; Dongchen Che; Xiangyu Wang; Kaidong Xu; Shiwei Zhuang

J. Vac. Sci. Technol. B 43, 042209 (2025) https://doi.org/10.1116/6.0004515

Abstract

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Laser oscillation from a distributed feedback structure with a diffraction grating directly fabricated on an organic crystal surface using a focused ion beam and plasma etching

Yuhi Inada; Momonosuke Odani; Shuya Murakami; Haruki Kishimoto; Yuya Arita; Kazuo Takahashi; Takeshi Yamao

J. Vac. Sci. Technol. B 43, 042210 (2025) https://doi.org/10.1116/5.0279913

Abstract

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Lithography

Molecular dynamics simulation of the early stage of the development process of negative-type nonchemically amplified resist in electron-beam lithography

Ryuki Tanaka; Kaito Yamada; Kosei Tada; Hiroto Wakamatsu; Masaaki Yasuda

J. Vac. Sci. Technol. B 43, 042601 (2025) https://doi.org/10.1116/6.0004443

Abstract

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Nanoscale Science and Technology

Evolution of graphene nanoflake size and morphology in atmospheric pressure microwave plasma

Parker Hays; Dhruval Patel; Michael Stowell; Dren Qerimi; David Ruzic

J. Vac. Sci. Technol. B 43, 042801 (2025) https://doi.org/10.1116/6.0004741

Abstract

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MEMS and NEMS

Evolution of water layers on wafer surfaces during bond chamber evacuation

Max Huber; Andreas Zienert; Jörg Schuster

J. Vac. Sci. Technol. B 43, 043001 (2025) https://doi.org/10.1116/6.0004331

Abstract

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Microelectronic and Nanoelectronic Devices

Development of two-stage amplifier and Wien-bridge oscillator using field emitter array-based vacuum transistors

Ryosuke Hori; Tomoaki Osumi; Masayoshi Nagao; Hiromasa Murata; Yasuhito Gotoh

J. Vac. Sci. Technol. B 43, 043201 (2025) https://doi.org/10.1116/6.0004635

Abstract

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Measurement and Characterization

KTaO₃(001) preparation methods in vacuum: Effects on surface stoichiometry, crystallography, and in-gap states

In Special Collection: Secondary Ion Mass Spectrometry (SIMS)

Andrea M. Lucero Manzano; Esteban D. Cantero; Emanuel A. Martínez; F. Y. Bruno; Esteban A. Sánchez; Oscar Grizzi

J. Vac. Sci. Technol. B 43, 044001 (2025) https://doi.org/10.1116/6.0004608

Abstract

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Effect of glow cleaning bias voltage on microstructure and properties of ion nitriding/multiarc ion plating CrTiAlN composite coatings

Yuanhao Qi; Xiao Nan; Qiaoqin Guo; Zhong Yang

J. Vac. Sci. Technol. B 43, 044002 (2025) https://doi.org/10.1116/6.0004631

Abstract

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Cryomicroscopy of low melting point metals

Michael Colletta; Jamie Ford; Joseph R. Michael; David A. Muller; Lucille A. Giannuzzi

J. Vac. Sci. Technol. B 43, 044003 (2025) https://doi.org/10.1116/6.0004361

Abstract

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Compositionally graded Ba_1−xSr_xTiO₃ thin film for SIMS applications

In Special Collection: Secondary Ion Mass Spectrometry (SIMS)

J. Scola; J. Garcia; F. Jomard; E. Loire; J. Wolfman; B. Negulescu; G. Z. Liu; M.-A. Pinault-Thaury

J. Vac. Sci. Technol. B 43, 044004 (2025) https://doi.org/10.1116/6.0004549

Abstract

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“Canode”: A conical partially magnetic anode for efficient negative ion extraction from duoplasmatron ion sources

In Special Collection: Secondary Ion Mass Spectrometry (SIMS)

Peter Williams; Maitrayee Bose; Richard L. Hervig; Larry Nittler; Lynda B. Williams

J. Vac. Sci. Technol. B 43, 044005 (2025) https://doi.org/10.1116/6.0004627

Abstract

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CHORUS

ToF-SIMS and XPS coupled characterization of HgCdTe surface oxides for infrared detection applications

In Special Collection: Secondary Ion Mass Spectrometry (SIMS)

Steven Bel; Clément Lobre; Sarah Petit; Marc Veillerot; Giacomo Badano; Philippe Ballet

J. Vac. Sci. Technol. B 43, 044006 (2025) https://doi.org/10.1116/6.0004626

Abstract

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Molecular weight dependence of molecular damage to polyethylene glycol (PEG) molecules by sputtering with Ar gas cluster ion beam

In Special Collection: Celebrating the Career of Prof. Jiro Matsuo and his Leadership in Gas Cluster Ion Beam Technologies and Secondary Ion Mass Spectrometry (SIMS)

Yuri Mizutani; Makiko Fujii; Toshio Seki; Jiro Matsuo

J. Vac. Sci. Technol. B 43, 044007 (2025) https://doi.org/10.1116/6.0004662

Abstract

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Vacuum Measurement and Technology

Characteristics of inductively coupled plasma radio frequency ion sources in commercial ion implanters

Jong Jin Hwang; Hyo Jun Sim; Seung Jae Moon

J. Vac. Sci. Technol. B 43, 044201 (2025) https://doi.org/10.1116/6.0004560

Abstract

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Method for monitoring high aspect ratio contact dry etching process using calibration and normalization method for optical emission spectroscopy

Jitae Park; Sejin Oh; Sung-Ho Jang; Dougyong Sung; Jin-Young Bang; Sung-Il Cho

J. Vac. Sci. Technol. B 43, 044202 (2025) https://doi.org/10.1116/6.0004477

Abstract

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Study of the UHV compatibility of selected ferritic stainless steels for application in vacuum systems of future gravitational wave detectors

Carlo Scarcia; Giuseppe Bregliozzi; Paolo Chiggiato; Ivo Wevers

J. Vac. Sci. Technol. B 43, 044203 (2025) https://doi.org/10.1116/6.0004698

Abstract

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Electronic and Optoelectronic Materials, Devices and Processing

Lithography

Nanoscale Science and Technology

MEMS and NEMS

Microelectronic and Nanoelectronic Devices

Measurement and Characterization

Vacuum Measurement and Technology

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