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Machine learning driven measurement of high-aspect-ratio nanostructures using Mueller matrix spectroscopic ellipsometry
Issues
Letters
Study of fluoride-ion-assisted hydroxide catalyzed bonding of MgF2 to fused silica
J. Vac. Sci. Technol. B 43, 010601 (2025)
https://doi.org/10.1116/6.0004122
ARTICLES
Electronic and Optoelectronic Materials, Devices and Processing
Simulation investigation on the pulse/analog dual-mode electron multiplier with discrete arc-shaped dynodes
J. Vac. Sci. Technol. B 43, 012201 (2025)
https://doi.org/10.1116/6.0004105
Tapered quantum cascade lasers with isolated channel emitting at 9 μm
Chenyang Wan; Yuzhe Lin; Yuan Ma; Lijun Ge; Zixian Wang; Fengxin Dong; Xuyan Zhou; Jinchuan Zhang; Fengqi Liu; Wanhua Zheng
J. Vac. Sci. Technol. B 43, 012202 (2025)
https://doi.org/10.1116/6.0004059
Line wiggling due to plasma-induced film stress and prevention by surface roughness modification
Amelia Turnquist; Naoyuki Kofuji; Joseph Sebastian; Hiroshi Kou; Takahiro Arai; Hideaki Fukuda; Yoann Tomczak; Yiting Sun; Daniele Piumi; David De Roest
J. Vac. Sci. Technol. B 43, 012203 (2025)
https://doi.org/10.1116/6.0004116
Photoresist ashing at room temperature using a large-area, atmospheric-pressure plasma
J. Vac. Sci. Technol. B 43, 012204 (2025)
https://doi.org/10.1116/6.0004147
Cost-effective fabrication of RF AlGaN/GaN HEMTs on surface activated bonding-bonded SiC-SiC substrate
Guanjun Jing; Xiangjie Xing; Dongguo Zhang; Fengwen Mu; Sen Huang; Ke Wei; Qimeng Jiang; Xinhua Wang; Xinyu Liu
J. Vac. Sci. Technol. B 43, 012205 (2025)
https://doi.org/10.1116/6.0004066
Enhancement of performance and reliability in MOSFETs via high-pressure microwave annealing
Geonhyeong Kang; Hunbeom Shin; Seungyeob Kim; Lingwei Zhang; Giuk Kim; Sujeong Lee; Yunseok Nam; Chaeheon Kim; Hoon Kim; Jinho Ahn; Sanghun Jeon
J. Vac. Sci. Technol. B 43, 012206 (2025)
https://doi.org/10.1116/6.0004086
Lithography
Chaos-enhanced self-adaptive particle swarm optimization with simulated annealing for digital lithography mask optimization
Shengzhou Huang; Dongjie Wu; Yuanzhuo Tang; Bowen Ren; Jiani Pan; Zhaowei Tian; Yongkang Shao; Siwen He
J. Vac. Sci. Technol. B 43, 012601 (2025)
https://doi.org/10.1116/6.0004107
Nanoscale Science and Technology
Machine learning driven measurement of high-aspect-ratio nanostructures using Mueller matrix spectroscopic ellipsometry
Shiva Mudide; Nick Keller; G. Andrew Antonelli; Geraldina Cruz; Julia Hart; Alexander R. Bruccoleri; Ralf K. Heilmann; Mark L. Schattenburg
J. Vac. Sci. Technol. B 43, 012801 (2025)
https://doi.org/10.1116/6.0004058
Charge density and screened potential near a (5,5) capped carbon nanotube from density functional computation
In Special Collection:
Vacuum Nanoelectronics
J. Vac. Sci. Technol. B 43, 012802 (2025)
https://doi.org/10.1116/6.0004154
Microelectronic and Nanoelectronic Devices
Electron emission performance analysis and application of carbon nanotube cold cathode prepared by cold pressing process
J. Vac. Sci. Technol. B 43, 013201 (2025)
https://doi.org/10.1116/6.0004182
Vacuum Measurement and Technology
Modeling of water outgassing from polymers incorporating surface adsorption and desorption
J. Vac. Sci. Technol. B 43, 014201 (2025)
https://doi.org/10.1116/6.0004175
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Transferable GeSn ribbon photodetectors for high-speed short-wave infrared photonic applications
Haochen Zhao, Suho Park, et al.
Machine learning driven measurement of high-aspect-ratio nanostructures using Mueller matrix spectroscopic ellipsometry
Shiva Mudide, Nick Keller, et al.