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Electronic and Optoelectronic Materials, Devices and Processing
Study on geometry-dependent n+-InGaN regrowth via MOCVD for AlN/GaN ohmic contact application
Yu-Xi Zhou; Jie-Jie Zhu; Jing-Shu Guo; Ling-Jie Qin; Bo-Wen Zhang; Meng-Di Li; Ming-Chen Zhang; Xiao-Hua Ma
J. Vac. Sci. Technol. B 42, 052201 (2024)
https://doi.org/10.1116/6.0003690
Interface chemistry, band alignment, and thermal stability study of Sn metal contact on bulk and monolayer MoS2
In Special Collection:
Physics and Chemistry of Surfaces and Interfaces
J. Vac. Sci. Technol. B 42, 052202 (2024)
https://doi.org/10.1116/6.0003845
Effects of athermal carrier injection on Co-60 gamma-ray damage in SiC merged-PiN Schottky diodes
In Special Collection:
Celebrating the Achievements and Life of Paul H. Holloway
Jian-Sian Li; Chao-Ching Chiang; Hsiao-Hsuan Wan; Sergei P. Stepanoff; Fan Ren; Aman Haque; Douglas Wolfe; S. J. Pearton
J. Vac. Sci. Technol. B 42, 052203 (2024)
https://doi.org/10.1116/6.0003819
Remote plasma-enhanced chemical vapor deposition of GeSn on Si (100), Si (111), sapphire, and fused silica substrates
In Special Collection:
Developing SiGeSn Technology: Materials and Devices
J. Vac. Sci. Technol. B 42, 052204 (2024)
https://doi.org/10.1116/6.0003689
Near zero-field magnetoresistance and defects in gallium nitride pn junctions
In Special Collection:
Physics and Chemistry of Surfaces and Interfaces
M. J. Elko; D. T. Hassenmayer; A. A. Higgins; P. M. Lenahan; M. E. Flatté; D. Fehr; M. D. Craven; T. D. Larsen
J. Vac. Sci. Technol. B 42, 052205 (2024)
https://doi.org/10.1116/6.0003855
MeV proton and neutron damage effects on deep-ultraviolet light-emitting diodes
In Special Collection:
Celebrating the Achievements and Life of Paul H. Holloway
Jian-Sian Li; Chao-Ching Chiang; Hsiao-Hsuan Wan; Jihyun Kim; Simon Barke; Peter Wass; Fan Ren; John W. Conklin; S. J. Pearton
J. Vac. Sci. Technol. B 42, 052206 (2024)
https://doi.org/10.1116/6.0003818
Dynamic switching operation of diamond MOSFETs with NO2 p-type doping and Al2O3 gate insulation and passivation
J. Vac. Sci. Technol. B 42, 052207 (2024)
https://doi.org/10.1116/5.0218780
Optical and electronic properties of Ge1−xSnx/Si alloys grown by remote plasma-enhanced chemical vapor deposition
In Special Collection:
Developing SiGeSn Technology: Materials and Devices
J. Vac. Sci. Technol. B 42, 052208 (2024)
https://doi.org/10.1116/6.0003759
Infrared optical properties of SiGeSn and GeSn layers grown by molecular beam epitaxy
In Special Collection:
Developing SiGeSn Technology: Materials and Devices
Glenn G. Jernigan; John P. Murphy; Nadeemullah A. Mahadik; Alex J. Grede; Eric M. Jackson; Jill A. Nolde
J. Vac. Sci. Technol. B 42, 052209 (2024)
https://doi.org/10.1116/6.0003585
Development of GeSn epitaxial films with strong direct bandgap luminescence in the mid-wave infrared region using a commercial chemical vapor deposition reactor
In Special Collection:
Developing SiGeSn Technology: Materials and Devices
Nicholas Rosson; Sudip Acharya; Alec M. Fischer; Bria Collier; Abdulla Ali; Ali Torabi; Wei Du; Shui-Qing Yu; Robin C. Scott
J. Vac. Sci. Technol. B 42, 052210 (2024)
https://doi.org/10.1116/6.0003798
Lithography
Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications
In Special Collection:
CHIPS: Future of Semiconductor Processing and Devices
J. Vac. Sci. Technol. B 42, 052601 (2024)
https://doi.org/10.1116/6.0003701
Numerical investigation of flow and particles contamination in reticle mini environment for extreme ultraviolet lithography
J. Vac. Sci. Technol. B 42, 052602 (2024)
https://doi.org/10.1116/6.0003791
Efficient mask optimization for enhanced digital maskless lithography quality by improved particle swarm optimization algorithm
Shengzhou Huang; Dongjie Wu; Yuanzhuo Tang; Bowen Ren; Jiani Pan; Zhaowei Tian; Zhi Li; Jinjin Huang
J. Vac. Sci. Technol. B 42, 052603 (2024)
https://doi.org/10.1116/6.0003919
Nanoscale Science and Technology
Radio frequency side-gate nanoscale vacuum channel triode
J. Vac. Sci. Technol. B 42, 052801 (2024)
https://doi.org/10.1116/6.0003823
MEMS and NEMS
Fabrication of hollow silicon microneedles using grayscale lithography and deep reactive ion etching
J. Vac. Sci. Technol. B 42, 053001 (2024)
https://doi.org/10.1116/6.0003711
Effect of Triton X-100 surfactant and agitation on tetramethylammonium hydroxide wet etching for microneedle fabrication
J. Vac. Sci. Technol. B 42, 053002 (2024)
https://doi.org/10.1116/6.0003852
Microelectronic and Nanoelectronic Devices
Is the linear relationship between the slope and intercept observed in field emission S-K plots an artifact?
J. Vac. Sci. Technol. B 42, 053201 (2024)
https://doi.org/10.1116/6.0003828
Measurement and Characterization
Effect of sputter power on red-shifted optoelectronic properties in magnetron sputtered Ag/ZnO thin films
GuruSampath Kumar A.; Mahender C.; Mahesh Kumar U.; Obulapathi L.; HemaChandra Rao B.; Yamuna P.; Thirupathi A.; SomaSundar L. N. V. H.; Venkata Ramana G.
J. Vac. Sci. Technol. B 42, 054002 (2024)
https://doi.org/10.1116/6.0003813
Structural, surface, and upconversion luminescence properties of pulsed laser-deposited Y2O3:Ho3+,Yb3+ thin films
In Special Collection:
Celebrating the Achievements and Life of Paul H. Holloway
J. Vac. Sci. Technol. B 42, 054004 (2024)
https://doi.org/10.1116/6.0003880
Current–voltage characteristics of Ag/Nb:SrTiO3/Ag and Au/Nb:SrTiO3/Ag heterostructures
J. Vac. Sci. Technol. B 42, 054005 (2024)
https://doi.org/10.1116/6.0003843
Vacuum Measurement and Technology
Design of plasma strip chamber for uniform gas supply with fluid flow simulation
J. Vac. Sci. Technol. B 42, 054201 (2024)
https://doi.org/10.1116/6.0003782
Study of selected mild steels for application in vacuum systems of future gravitational wave detectors
Carlo Scarcia; Giuseppe Bregliozzi; Paolo Chiggiato; Alice Ingrid Michet; Ana Teresa Perez Fontenla; Martino Rimoldi; Mauro Taborelli; Ivo Wevers
J. Vac. Sci. Technol. B 42, 054202 (2024)
https://doi.org/10.1116/6.0003820
Interfacial reaction between the nickel-based superalloy and the Al2O3 crucible during vacuum induction melting
J. Vac. Sci. Technol. B 42, 054203 (2024)
https://doi.org/10.1116/6.0003860
Technical Notes
Membrane-electrode junction properties for optimum potentiometric hydrogen sensor response
J. Vac. Sci. Technol. B 42, 055001 (2024)
https://doi.org/10.1116/6.0003829
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications
A. S. Stodolna, T. W. Mechielsen, et al.
Infrared optical properties of SiGeSn and GeSn layers grown by molecular beam epitaxy
Glenn G. Jernigan, John P. Murphy, et al.